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STD90N4F3

STMicroelectronics

STD90N4F3 by STMicroelectronics

STD90N4F3 by STMicroelectronics is an N-channel MOSFET designed for efficient switching applications. It features a max drain current of 80 A, a breakdown voltage of 40 V, and operates at up to 175 °C. Ideal for high-performance power management in compact designs.

Median Price

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Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

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Vyrian

USA . 7,493 parts In-Stock

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7,493

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Digiode

USA . 4,216 parts In-Stock

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Anansix

USA . 1,103 parts In-Stock

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IDEA Electronic Components Group

UK . 2,128 parts In-Stock

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$0.341

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$0.307

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2,128

$0.341

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$0.307

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MKK Technologies

India . 1,004 parts In-Stock

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$0.642

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$0.642

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DigiPath Technology Company

USA . 1,004 parts In-Stock

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$0.642

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$0.642

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AZTECH Wire

Italy . 1,187 parts In-Stock

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$21.950

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$21.950

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Component Stockers USA

USA . 269 parts In-Stock

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$99.990

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Metaverse IC Inc.

Canada . 56,986 parts In-Stock

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Authorized Procurement Solutions

USA . 20,000 parts In-Stock

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QUARKTWIN TECHNOLOGY LTD

USA . 17,406 parts In-Stock

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Kepictronics

USA . 10,065 parts In-Stock

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A-Z Elektronik GmbH

Germany . 5,408 parts In-Stock

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Alle Elektronik GmbH

Germany . 4,366 parts In-Stock

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Corphita

USA . 1,120 parts In-Stock

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Parana Technologies

USA . 609 parts In-Stock

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$0.408

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Overview

Elevate your designs with the STD90N4F3 from STMicroelectronics, a top-tier N-channel Power FET engineered for optimal efficiency and reliability. This advanced component excels in switching applications, ensuring rapid performance while handling high currents effortlessly. Backed by ST's renowned quality and innovation, it delivers unmatched power management solutions that enhance system durability and reduce energy consumption, making it an essential choice for modern electronics.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy material provides durability and resistance to environmental factors, making the product reliable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs generally offer better efficiency and higher electron mobility than their P-channel counterparts, making them a preferred choice for fast switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode provides protection against inductive kickback, hence enhancing the overall reliability in switching applications.

Transistor Application: SWITCHING

Designed specifically for switching, this FET can handle rapid on-off operations, ideal for power management applications.

Surface Mount: YES

Surface mount technology facilitates compact designs and improves manufacturability, making the product suitable for modern electronic devices.

Minimum DS Breakdown Voltage: 40 V

A minimum breakdown voltage of 40 V ensures that the device can operate safely in a variety of voltage conditions, enhancing reliability.

Package Shape: RECTANGULAR

The rectangular package shape is optimized for space efficiency and heat dissipation, improving performance in tight spaces.

Terminal Form: GULL WING

Gull wing terminals provide good mechanical strength and ease of soldering, ensuring a reliable connection during operation.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs offer better control and lower power consumption compared to depletion mode devices, making them ideal for energy-efficient applications.

Maximum Pulsed Drain Current (IDM): 320 A

A high maximum pulsed drain current of 320 A makes this FET suitable for applications requiring significant current surges.

Avalanche Energy Rating (EAS): 400 mJ

The high avalanche energy rating indicates robustness against transient voltage spikes, enhancing the component's reliability.

Maximum Drain Current (Abs) (ID): 80 A

With an absolute maximum drain current of 80 A, this device is capable of handling substantial loads in demanding applications.

No. of Terminals: 2

The simple two-terminal design simplifies circuit design and integration, making it user-friendly for engineers.

Maximum Power Dissipation (Abs): 110 W

A maximum power dissipation rating of 110 W means the transistor can handle significant power, thus suitable for high-power applications.

Package Style (Meter): SMALL OUTLINE

The small outline package style minimizes footprint in circuit layouts, optimizing space usage in modern electronic designs.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology provides high input impedance and low power consumption, ideal for battery-operated and low-energy devices.

Maximum Operating Temperature: 175 °C

A high maximum operating temperature of 175 °C allows for reliable operation in challenging thermal environments.

Transistor Element Material: SILICON

Silicon is a well-known material for semiconductors, ensuring stability and reliability in performance across various conditions.

Maximum Drain Current (ID): 80 A

A maximum drain current of 80 A enables the FET to be used in high-performance applications, ensuring it meets demanding power requirements.

Maximum Drain-Source On Resistance: 0.0065 ohm

Low on-resistance improves efficiency by reducing heat generation, making this product ideal for power-sensitive applications.

Terminal Position: SINGLE

A single terminal position simplifies board layout design, facilitating easier circuit integration.

Case Connection: DRAIN

Having the case connection at the drain optimizes thermal dissipation, enhancing overall reliability and performance.

Technical Specifications

Power Field Effect Transistors (FET) STD90N4F3 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

400 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

40 V

Maximum Drain Current (Abs) (ID):

80 A

Maximum Drain Current (ID):

80 A

Maximum Drain-Source On Resistance:

.0065 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

NOT SPECIFIED

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

320 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

NOT SPECIFIED

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STD90N4F3 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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