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STD5NK52ZD-1

STMicroelectronics

STD5NK52ZD-1 by STMicroelectronics

STD5NK52ZD-1 by STMicroelectronics is an N-channel FET designed for efficient switching applications. It features a max drain current of 4.4 A, a breakdown voltage of 520 V, and operates at up to 150 °C. Ideal for power management in various electronic devices.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Vyrian

USA . 6,838 parts In-Stock

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6,838

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Digiode

USA . 2,643 parts In-Stock

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2,643

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Anansix

USA . 2,131 parts In-Stock

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2,131

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Distributors (Availability)

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IDEA Electronic Components Group

UK . 1,731 parts In-Stock

1+ parts

$1.560

100+ parts

-

1k+ parts

$1.404

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1,731

$1.560

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$1.404

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MKK Technologies

India . 1,760 parts In-Stock

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$2.934

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1,760

$2.934

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DigiPath Technology Company

USA . 1,760 parts In-Stock

1+ parts

$2.934

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1,760

$2.934

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AZTECH Wire

Italy . 452 parts In-Stock

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$13.910

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452

$13.910

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Kepictronics

USA . 5,000 parts In-Stock

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5,000

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Alle Elektronik GmbH

Germany . 3,204 parts In-Stock

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3,204

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Parana Technologies

USA . 2,260 parts In-Stock

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$1.866

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2,260

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$1.866

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Corphita

USA . 691 parts In-Stock

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691

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Overview

Unlock unparalleled performance with the STD5NK52ZD-1 from STMicroelectronics, a trusted leader in innovative semiconductor solutions. This N-channel Power FET is designed for seamless switching applications, delivering exceptional efficiency and reliability. With its robust construction, it excels in high-voltage environments, ensuring your projects run smoothly. Choose STMicroelectronics for superior quality and unmatched support—experience the advantage today!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The durable plastic/epoxy material ensures high reliability and protection against environmental factors, making this FET suitable for diverse applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs generally have lower on-resistance and higher electron mobility, offering superior performance for various switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode increases versatility and provides protection against reverse voltage, improving the reliability of the circuit.

Transistor Application: SWITCHING

Optimized for switching applications, this FET can efficiently control power in circuits, making it an excellent choice for power management.

Minimum DS Breakdown Voltage: 520 V

A high breakdown voltage ensures the FET can operate safely under high-voltage conditions, ideal for industrial applications.

Package Shape: RECTANGULAR

The rectangular package shape allows for effective space utilization on PCBs, facilitating compact designs.

Terminal Form: THROUGH-HOLE

Through-hole terminals provide secure mounting and stable electrical connections, essential for reliable operation in demanding applications.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation allows for lower power consumption and improved efficiency in electronic devices.

Maximum Pulsed Drain Current (IDM): 17.6 A

With a high pulsed drain current capability, this FET can handle transient loads efficiently, making it suitable for high-performance applications.

Avalanche Energy Rating (EAS): 170 mJ

A rated avalanche energy capacity indicates enhanced reliability in handling energy transients without failure, a crucial feature for robust applications.

Maximum Drain Current (Abs) (ID): 4.4 A

The maximum drain current specification allows for effective current management within circuits, crucial for preventing overloads.

No. of Terminals: 3

The 3-terminal design simplifies circuit design while offering the necessary connections for efficient functionality.

Maximum Power Dissipation (Abs): 70 W

A high power dissipation rating enables the FET to operate under high load conditions without overheating, ensuring long-term reliability.

Package Style (Meter): IN-LINE

The in-line package style is common in various applications, making it easy to integrate into existing designs.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology provides high input impedance and low power requirements, which are favorable for battery-operated and low-power devices.

Maximum Operating Temperature: 150 °C

A maximum operating temperature of 150 °C allows this component to function in extreme thermal environments, enhancing versatility in various applications.

Transistor Element Material: SILICON

Silicon is a well-established and reliable semiconductor material, ensuring consistent performance and availability in the market.

Terminal Finish: MATTE TIN

Matte tin finish provides excellent solderability and corrosion resistance, ensuring reliable long-term connections.

Maximum Drain Current (ID): 4.4 A

This specification indicates the device can handle significant current without performance degradation, important for high-demand applications.

Maximum Drain-Source On Resistance: 1.5 ohm

Low on-resistance minimizes power loss during operation, enhancing energy efficiency and performance in switching circuits.

Terminal Position: SINGLE

Single terminal positioning simplifies board layout and design, making it easier to integrate into various electronic applications.

Maximum Time At Peak Reflow Temperature (s): 30

This specification ensures the FET can withstand soldering processes without damage, critical for mass production assembly.

Peak Reflow Temperature °C: 260

A high peak reflow temperature indicates the FET can handle modern manufacturing practices without risk of thermal degradation.

Technical Specifications

Power Field Effect Transistors (FET) STD5NK52ZD-1 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Additional Features:

AVALANCHE RATED

Avalanche Energy Rating (EAS):

170 mJ

Minimum DS Breakdown Voltage:

520 V

Maximum Drain Current (Abs) (ID):

4.4 A

Maximum Drain Current (ID):

4.4 A

Maximum Drain-Source On Resistance:

1.5 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-251AA

JESD-30 Code:

R-PSIP-T3

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

IN-LINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

17.6 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

MATTE TIN

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STD5NK52ZD-1 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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