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STD50N03L-1

STMicroelectronics

STD50N03L-1 by STMicroelectronics

STD50N03L-1 by STMicroelectronics is an N-channel MOSFET designed for efficient switching applications. It features a max drain current of 40 A, a breakdown voltage of 30 V, and operates at up to 175 °C. Ideal for power management in various electronic devices.

Median Price

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Lifecycle Status

Suppliers In-Stock

5

In-Stock Inventory

1k+

Distributors (In-Stock)

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Vyrian

USA . 8,812 parts In-Stock

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Digiode

USA . 4,527 parts In-Stock

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4,527

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Anansix

USA . 1,167 parts In-Stock

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PC Components Company LLC

USA . 50 parts In-Stock

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Bristol Electronics

USA . 50 parts In-Stock

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50

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Distributors (Availability)

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IDEA Electronic Components Group

UK . 2,037 parts In-Stock

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$1.588

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$1.429

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$1.588

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$1.429

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MKK Technologies

India . 1,698 parts In-Stock

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$2.986

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DigiPath Technology Company

USA . 1,698 parts In-Stock

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$2.986

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AZTECH Wire

Italy . 742 parts In-Stock

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$9.540

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Metaverse IC Inc.

Canada . 56,986 parts In-Stock

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QUARKTWIN TECHNOLOGY LTD

USA . 4,484 parts In-Stock

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Alle Elektronik GmbH

Germany . 4,230 parts In-Stock

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Corphita

USA . 3,725 parts In-Stock

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Parana Technologies

USA . 1,832 parts In-Stock

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Overview

Experience the unparalleled performance of the STD50N03L-1 from STMicroelectronics, a leader in innovation and quality. This N-channel power FET excels in efficiency and reliability, perfect for demanding switching applications across various industries. With built-in diode functionality and robust thermal management, it ensures optimal operation even in extreme conditions. Elevate your designs with ST's trusted technology and enjoy enhanced durability, reduced energy loss, and seamless integration to maximize your project's potential.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

This material ensures durability and resistance to environmental factors, making the device reliable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs generally offer lower on-resistance and higher efficiency, making them ideal for switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode provides enhanced protection and simplifies circuit design, making it a versatile choice for power applications.

Transistor Application: SWITCHING

Optimized for high-speed switching applications, this FET is capable of handling demanding tasks efficiently.

Minimum DS Breakdown Voltage: 30 V

This voltage rating allows the device to operate safely in various circuits without the risk of breakdown.

Package Shape: RECTANGULAR

Rectangular packaging provides efficient space utilization on PCBs and simplifies mounting processes.

Terminal Form: THROUGH-HOLE

Through-hole terminals enhance mechanical stability and are ideal for applications requiring strong connections.

Operating Mode: ENHANCEMENT MODE

Enhancement-mode FETs possess high input impedance and lower power consumption, making them suitable for low-power applications.

Maximum Pulsed Drain Current (IDM): 160 A

This high pulsed current capability allows for dynamic performance in high-demand scenarios.

Avalanche Energy Rating (EAS): 230 mJ

A high avalanche energy rating indicates robustness against transient voltage conditions, ensuring reliability in harsh environments.

Maximum Drain Current (Abs) (ID): 40 A

The ability to safely handle up to 40 A enables the FET to be used in high-power applications.

No. of Terminals: 3

Three terminals provide straightforward connectivity and facilitate easy integration into various circuit designs.

Maximum Power Dissipation (Abs): 60 W

A maximum power dissipation rating helps ensure performance without overheating, making this FET reliable during operation.

Package Style (Meter): IN-LINE

In-line packages allow for efficient space utilization in designs and easier thermal management.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology provides high scalability and efficiency, ideal for modern applications that require fast switching.

Maximum Operating Temperature: 175 °C

A high operating temperature rating enables the FET to function reliably in demanding environments.

Transistor Element Material: SILICON

Silicon material offers excellent performance characteristics and reliability for power electronics.

Maximum Drain Current (ID): 40 A

Repeated specification underscores the robustness of the FET in handling continuous operations efficiently.

Maximum Drain-Source On Resistance: 0.019 ohm

Low on-resistance translates to lower power losses, which is critical for improving overall system efficiency.

Terminal Position: SINGLE

Single terminal position simplifies circuit design and layout, making assembly easier.

Case Connection: ISOLATED

Isolation of the case connection enhances safety and prevents undesired current paths.

Technical Specifications

Power Field Effect Transistors (FET) STD50N03L-1 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

230 mJ

Case Connection:

ISOLATED

Minimum DS Breakdown Voltage:

30 V

Maximum Drain Current (Abs) (ID):

40 A

Maximum Drain Current (ID):

40 A

Maximum Drain-Source On Resistance:

.019 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-251AB

JESD-30 Code:

R-PSIP-T3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

IN-LINE

Peak Reflow Temperature (C):

NOT SPECIFIED

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

160 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

NOT SPECIFIED

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STD50N03L-1 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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