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STD5N20

STMicroelectronics

STD5N20 by STMicroelectronics

STD5N20 by STMicroelectronics is an N-channel FET designed for efficient switching applications. It features a max drain current of 5 A, a breakdown voltage of 200 V, and operates at up to 150 °C. Ideal for power management in compact electronic devices.

Median Price

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Lifecycle Status

Suppliers In-Stock

7

In-Stock Inventory

1k+

Distributors (In-Stock)

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Digiode

USA . 4,500 parts In-Stock

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4,500

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PC Components Company LLC

USA . 2,200 parts In-Stock

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2,200

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Bristol Electronics

USA . 2,200 parts In-Stock

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2,200

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Vyrian

USA . 1,382 parts In-Stock

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1,382

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Diverse Electronics

Canada . 1,373 parts In-Stock

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1,373

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Anansix

USA . 451 parts In-Stock

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451

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ACDS - Activité Composants Distribution Service

France . 450 parts In-Stock

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450

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Distributors (Availability)

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IDEA Electronic Components Group

UK . 239 parts In-Stock

1+ parts

$0.305

100+ parts

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$0.275

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239

$0.305

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$0.275

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MKK Technologies

India . 745 parts In-Stock

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$0.574

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745

$0.574

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DigiPath Technology Company

USA . 745 parts In-Stock

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$0.574

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745

$0.574

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Kepictronics

USA . 20,000 parts In-Stock

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Parana Technologies

USA . 2,062 parts In-Stock

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$0.365

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$0.365

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Perfect Parts

USA . 1,091 parts In-Stock

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1,091

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Corphita

USA . 721 parts In-Stock

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721

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Cyclops Electronics Ltd (Excess)

UK . 450 parts In-Stock

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450

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Overview

Unlock unparalleled efficiency with the STD5N20 from STMicroelectronics, your go-to solution for robust power management. Crafted for durability and reliability, this N-channel FET excels in switching applications while ensuring excellent thermal performance. Ideal for everything from consumer electronics to industrial systems, it delivers outstanding value, helping you achieve superior energy savings and performance. Choose quality, choose STMicroelectronics!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy provides a lightweight and durable package, enhancing reliability in various operating environments.

Polarity or Channel Type: N-CHANNEL

N-channel FETs are typically preferred for their higher efficiency and faster switching capabilities, making them ideal for digital and analog applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode allows for freewheeling effect in inductive applications, improving circuit performance and reducing additional component requirements.

Transistor Application: SWITCHING

Designed for switching applications, this FET can efficiently control large amounts of power with minimal losses, suitable for modern electronic devices.

Surface Mount: YES

Surface mount technology facilitates automated assembly and helps in achieving compact design layouts, ideal for high-density circuit boards.

Minimum DS Breakdown Voltage: 200 V

With a high breakdown voltage, this FET can safely operate in high-voltage applications, providing reliability in harsh electrical environments.

Package Shape: RECTANGULAR

The rectangular shape of the package allows for efficient space utilization on PCBs and compatibility with various placement equipment.

Terminal Form: GULL WING

Gull wing terminals facilitate easy soldering and improve conductivity, making assembly and integration into circuits more efficient.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs provide excellent control over conductivity, allowing for low power consumption in 'off' states and responsive switching.

Maximum Pulsed Drain Current (IDM): 20 A

This high pulsed drain current capability enables the FET to handle dynamic loads effectively, useful in power applications that require rapid changes.

Avalanche Energy Rating (EAS): 130 mJ

A high avalanche energy rating indicates robustness against voltage transients, ensuring reliability in critical applications.

Maximum Drain Current (Abs) (ID): 5 A

The maximum current rating ensures that this FET can efficiently handle moderate loads without overheating, making it suitable for a range of applications.

No. of Terminals: 2

With a simple 2-terminal configuration, this FET simplifies design and minimizes space requirements in circuit layouts.

Maximum Power Dissipation (Abs): 50 W

High power dissipation capability allows for efficient handling of power without thermal issues, crucial for high-performance applications.

Package Style (Meter): SMALL OUTLINE

Small outline packaging is advantageous for compact designs, saving space on PCBs and contributing to miniaturization trends in electronics.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOSFET technology provides higher efficiency, better performance, and improved thermal handling compared to traditional transistors.

Maximum Operating Temperature: 150 °C

The ability to operate at high temperatures ensures reliability in demanding environments, suitable for automotive and industrial applications.

Transistor Element Material: SILICON

Silicon is a standard material for FETs, offering high performance, good thermal stability, and cost-effectiveness in manufacturing.

Terminal Finish: MATTE TIN

Matte tin terminal finish improves solderability and corrosion resistance, enhancing the longevity and reliability of connections.

Maximum Drain Current (ID): 5 A

This ensures that the FET can effectively manage currents prevalent in most consumer and industrial applications without risking damage.

Maximum Drain-Source On Resistance: 0.8 ohm

Low on-resistance translates to lower power loss during operation, enhancing overall efficiency in power electronic circuits.

Terminal Position: SINGLE

Single terminal positioning facilitates simple integration into various circuit configurations and reduces the complexity of layout designs.

Technical Specifications

Power Field Effect Transistors (FET) STD5N20 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

130 mJ

Minimum DS Breakdown Voltage:

200 V

Maximum Drain Current (Abs) (ID):

5 A

Maximum Drain Current (ID):

5 A

Maximum Drain-Source On Resistance:

.8 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-252AA

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

20 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

MATTE TIN

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STD5N20 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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