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STD55NH02L

STMicroelectronics

STD55NH02L by STMicroelectronics

STD55NH02L by STMicroelectronics is an N-channel FET designed for efficient switching applications. It features a max drain current of 55 A, a breakdown voltage of 24 V, and operates at up to 175 °C. Ideal for high-performance power management in compact designs.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Digiode

USA . 4,277 parts In-Stock

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4,277

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Anansix

USA . 450 parts In-Stock

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450

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Vyrian

USA . 114 parts In-Stock

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114

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Distributors (Availability)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

IDEA Electronic Components Group

UK . 303 parts In-Stock

1+ parts

$0.329

100+ parts

-

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$0.296

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303

$0.329

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$0.296

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MKK Technologies

India . 669 parts In-Stock

1+ parts

$0.619

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669

$0.619

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DigiPath Technology Company

USA . 669 parts In-Stock

1+ parts

$0.619

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669

$0.619

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Corphita

USA . 741 parts In-Stock

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741

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Parana Technologies

USA . 64 parts In-Stock

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$0.394

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64

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$0.394

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Overview

Elevate your designs with the STD55NH02L from STMicroelectronics, a leader in innovative semiconductor solutions. This N-channel power FET excels in efficiency and reliability, making it perfect for high-performance applications like power management and automotive systems. With a compact surface mount design and exceptional heat resistance, it ensures optimal performance while minimizing energy loss. Choose STMicroelectronics for unparalleled quality and support, empowering your projects to reach new heights!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy ensures durability and resistance to environmental factors, making the product suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel transistors are known for higher efficiency and lower on-resistance, enhancing overall performance.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode provides additional protection and functionality, simplifying circuit design.

Transistor Application: SWITCHING

Designed specifically for switching, this FET ensures rapid response times, ideal for power management applications.

Surface Mount: YES

Surface mount technology allows for compact designs and efficient manufacturing processes.

Minimum DS Breakdown Voltage: 24 V

A minimum breakdown voltage of 24 V offers robust performance in high-voltage applications.

Package Shape: RECTANGULAR

The rectangular shape contributes to space efficiency on PCB layouts, optimizing design.

Terminal Form: GULL WING

Gull wing terminals provide excellent soldering capabilities, enhancing reliability in assembly.

Operating Mode: ENHANCEMENT MODE

Enhancement mode design ensures that the FET operates effectively in low-power applications.

Maximum Pulsed Drain Current (IDM): 220 A

A high maximum pulsed drain current enables the transistor to handle short bursts of high current, making it suitable for power applications.

No. of Terminals: 2

The two-terminal design simplifies integration into circuits while maintaining functionality.

Package Style (Meter): SMALL OUTLINE

A small outline package style minimizes space requirements on PCBs, ideal for compact designs.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology provides superior switching speed and efficiency, enhancing overall device performance.

Maximum Operating Temperature: 175 °C

A high operating temperature capability makes this FET reliable in demanding environments.

Transistor Element Material: SILICON

Silicon is a standard material for transistors, offering a good balance of performance, cost, and reliability.

Maximum Drain Current (ID): 55 A

The ability to support a maximum drain current of 55 A makes this FET effective for high-power applications.

Maximum Drain-Source On Resistance: 0.014 ohm

Low on-resistance minimizes power losses during operation, contributing to high efficiency.

Terminal Position: SINGLE

A single terminal position simplifies circuit layout and integration into designs.

Case Connection: DRAIN

DRAIN case connection allows for straightforward integration into circuit designs, optimizing performance.

Technical Specifications

Power Field Effect Transistors (FET) STD55NH02L attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

24 V

Maximum Drain Current (ID):

55 A

Maximum Drain-Source On Resistance:

.014 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-252

JESD-30 Code:

R-PSSO-G2

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Maximum Pulsed Drain Current (IDM):

220 A

Qualification:

Not Qualified

Surface Mount:

YES

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STD55NH02L Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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