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STD50NH02L-1

STMicroelectronics

STD50NH02L-1 by STMicroelectronics

STD50NH02L-1 by STMicroelectronics is an N-channel MOSFET designed for efficient switching applications. It features a max drain current of 50 A, a breakdown voltage of 24 V, and operates at up to 175 °C. Ideal for high-power circuits, it ensures reliable performance with low on-resistance.

Median Price

$1.920

Lifecycle Status

Suppliers In-Stock

4

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Component Electronics Inc.

Canada . 90 parts In-Stock

1+ parts

$1.920

100+ parts

$1.440

1k+ parts

$1.250

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90

$1.920

$1.440

$1.250

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Vyrian

USA . 7,980 parts In-Stock

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7,980

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Digiode

USA . 3,262 parts In-Stock

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3,262

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Anansix

USA . 1,579 parts In-Stock

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1,579

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Distributors (Availability)

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IDEA Electronic Components Group

UK . 1,344 parts In-Stock

1+ parts

$0.585

100+ parts

-

1k+ parts

$0.527

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-

1,344

$0.585

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$0.527

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MKK Technologies

India . 111 parts In-Stock

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$1.100

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111

$1.100

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DigiPath Technology Company

USA . 111 parts In-Stock

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$1.100

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111

$1.100

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AZTECH Wire

Italy . 571 parts In-Stock

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$11.510

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571

$11.510

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Authorized Procurement Solutions

USA . 5,000 parts In-Stock

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5,000

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Alle Elektronik GmbH

Germany . 3,472 parts In-Stock

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3,472

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Corphita

USA . 1,812 parts In-Stock

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1,812

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Parana Technologies

USA . 154 parts In-Stock

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$0.700

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154

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$0.700

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Overview

Unlock exceptional performance with the STD50NH02L-1 from STMicroelectronics, a trusted leader in power solutions. This N-channel FET excels in switching applications, delivering robust efficiency and reliability for your designs. With its superior thermal capabilities and built-in diode, it ensures optimal operation even under demanding conditions. Elevate your projects with this powerhouse that promises durability and unmatched value, making it the smart choice for engineers seeking quality and innovation.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy for the package body provides durability and resistance to environmental factors, making it suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs are generally more efficient than their P-channel counterparts, offering lower on-resistance and higher current carrying capability.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode enhances circuit reliability by providing protection and allowing for easier integration into switching applications.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET offers fast switching speeds and efficient operation, making it ideal for modern electronic circuits.

Minimum DS Breakdown Voltage: 24 V

A minimum breakdown voltage of 24 V ensures functionality in a wide range of applications, providing robustness against voltage spikes.

Package Shape: RECTANGULAR

The rectangular shape allows for efficient space utilization on circuit boards, making it easy to implement in compact designs.

Terminal Form: THROUGH-HOLE

Through-hole terminals provide strong mechanical connections, making them suitable for high-stress environments and ensuring reliability in connections.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation allows for better control over the device, resulting in improved efficiency and performance in switching applications.

Maximum Pulsed Drain Current (IDM): 200 A

A high pulsed drain current capability of 200 A makes this FET suitable for applications requiring significant bursts of current.

Avalanche Energy Rating (EAS): 280 mJ

With an avalanche energy rating of 280 mJ, the device can withstand energy transients, improving reliability in protective circuit designs.

Maximum Drain Current (Abs) (ID): 50 A

A maximum absolute drain current of 50 A makes this FET versatile for a variety of power handling applications.

No. of Terminals: 3

The standard three-terminal configuration simplifies circuit design and makes it easier to integrate into existing layouts.

Maximum Power Dissipation (Abs): 60 W

With an ability to dissipate up to 60 W of power, this FET is designed for high-performance applications where thermal management is critical.

Package Style (Meter): IN-LINE

The in-line package style enables easy placement on standard circuit boards, facilitating convenient assembly and reducing production costs.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

As a MOSFET, this device offers high input impedance and fast switching capabilities, making it ideal for digital and analog applications.

Maximum Operating Temperature: 175 °C

A maximum operating temperature of 175 °C ensures reliability even in demanding thermal environments, allowing for longer product lifespans.

Transistor Element Material: SILICON

Silicon as the semiconductor material provides excellent electronic properties, balancing performance and cost effectively.

Maximum Drain Current (ID): 50 A

The maximum drain current of 50 A ensures this FET can handle significant power levels, making it suitable for high-output applications.

Maximum Drain-Source On Resistance: 0.0105 ohm

A low on-resistance of 0.0105 ohm enhances efficiency by reducing power loss and heat generation during operation.

Terminal Position: SINGLE

The single terminal position allows for straightforward layout designs and compatibility with various PCB setups.

Case Connection: DRAIN

DRAIN connection simplifies circuit design while ensuring effective heat dissipation during operation.

Peak Reflow Temperature °C: 260

The peak reflow temperature of 260 °C indicates compatibility with modern surface-mount soldering techniques, facilitating easy integration into assemblies.

Technical Specifications

Power Field Effect Transistors (FET) STD50NH02L-1 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Additional Features:

LOW THRESHOLD

Avalanche Energy Rating (EAS):

280 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

24 V

Maximum Drain Current (Abs) (ID):

50 A

Maximum Drain Current (ID):

50 A

Maximum Drain-Source On Resistance:

.0105 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-251

JESD-30 Code:

R-PSIP-T3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

IN-LINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

200 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

NOT SPECIFIED

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STD50NH02L-1 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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