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STB60N55F3

STMicroelectronics

STB60N55F3 by STMicroelectronics

STB60N55F3 from STMicroelectronics is a high-performance N-channel FET designed for efficient switching applications. It features a max drain current of 80 A, a breakdown voltage of 55 V, and operates at up to 175 °C. Ideal for power management in compact designs, it ensures reliable performance with low on-resistance.

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Lifecycle Status

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9

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Avnet

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Digiode

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Vyrian

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EMSNET

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Connector Distribution Corp

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Right Parts Inc.

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Anansix

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Inventory MP

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Bristol Electronics

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Advanced Electronics

New Zealand . 100 parts In-Stock

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$1.141

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IDEA Electronic Components Group

UK . 28 parts In-Stock

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MKK Technologies

India . 1,423 parts In-Stock

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DigiPath Technology Company

USA . 1,423 parts In-Stock

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AZTECH Wire

Italy . 434 parts In-Stock

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RC Electronics

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Alle Elektronik GmbH

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Corphita

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Parana Technologies

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Perfect Parts

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Overview

Elevate your designs with the STB60N55F3 from STMicroelectronics, a leader in semiconductor solutions. This N-channel power FET combines exceptional efficiency and reliability, perfect for demanding switching applications. With advanced thermal performance and robust design, it ensures longevity and optimal power management in various industries, from automotive to industrial automation. Experience unparalleled quality and innovation that drive your projects forward!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy in the package body ensures durability and resistance to environmental factors, making this FET suitable for a wide range of applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs are known for their superior conductivity, which makes them efficient for high-performance applications.

Configuration: SINGLE WITH BUILT-IN DIODE

Having a built-in diode enhances protection against reverse polarity, improving reliability in circuit designs.

Transistor Application: SWITCHING

Optimized for switching applications, this FET is excellent for rapid ON/OFF control, essential for modern electronic devices.

Surface Mount: YES

Surface mount capability allows for a compact design, making it convenient for high-density circuit layouts.

Minimum DS Breakdown Voltage: 55 V

A breakdown voltage of 55V provides significant operational headroom, enhancing circuit reliability under high voltage conditions.

Package Shape: RECTANGULAR

The rectangular shape facilitates efficient use of space on PCBs, making it versatile for different layouts.

Terminal Form: GULL WING

Gull wing terminals ensure stable mechanical connection and ease of soldering, leading to improved assembly reliability.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation provides better control over device functionality, making it ideal for applications requiring precise switching.

Maximum Pulsed Drain Current (IDM): 320 A

The ability to handle high pulsed currents makes this FET suitable for demanding applications such as power amplifiers and inverters.

Avalanche Energy Rating (EAS): 390 mJ

A high avalanche energy rating indicates the device can withstand transient conditions, ensuring durability in protective circuits.

Maximum Drain Current (Abs) (ID): 80 A

A maximum drain current of 80 A allows this FET to support high load applications, making it ideal for power management.

No. of Terminals: 2

With only 2 terminals, this FET simplifies circuit design while maintaining functionality, making it a cost-effective choice.

Maximum Power Dissipation (Abs): 110 W

High power dissipation capability ensures effective thermal management, allowing the component to operate efficiently without overheating.

Package Style (Meter): SMALL OUTLINE

A small outline package saves board space, which is crucial for compact electronic devices.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology enables faster switching speeds and reduced power consumption, enhancing the performance of electronic circuits.

Maximum Operating Temperature: 175 °C

A high operating temperature of 175 °C ensures reliability and performance in high-heat environments.

Transistor Element Material: SILICON

Silicon as the element material provides robustness and stability, essential for long-term device operation.

Terminal Finish: Matte Tin (Sn) - annealed

The matte tin finish provides excellent solderability, ensuring reliable connections and overall increased product longevity.

Maximum Drain Current (ID): 80 A

Repeat of max drain current emphasizes the FET's ability to handle substantial power levels efficiently.

Maximum Drain-Source On Resistance: 0.0085 ohm

Low on-resistance minimizes power loss during operation, which increases overall efficiency and reduces heat generation.

Terminal Position: SINGLE

Single terminal position simplifies integration into designs, making it easy to use in various applications.

Case Connection: DRAIN

A dedicated drain connection ensures efficient current flow and reliability in circuits where maintaining output is critical.

Maximum Time At Peak Reflow Temperature (s): 30

The specified reflow time helps prevent damage during soldering processes, ensuring the integrity of the FET.

Peak Reflow Temperature °C: 245

High peak reflow temperature tolerance allows compatibility with a wide range of assembly processes, improving manufacturing flexibility.

Technical Specifications

Power Field Effect Transistors (FET) STB60N55F3 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

390 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

55 V

Maximum Drain Current (Abs) (ID):

80 A

Maximum Drain Current (ID):

80 A

Maximum Drain-Source On Resistance:

.0085 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-263AB

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

245

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

320 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

Matte Tin (Sn) - annealed

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STB60N55F3 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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