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STB25NM50N-1

STMicroelectronics

STB25NM50N-1 by STMicroelectronics

STB25NM50N-1 by STMicroelectronics is an N-channel MOSFET ideal for switching applications, featuring a 500V breakdown voltage and 22A max drain current. It offers a low on-resistance of 0.14Ω and operates at up to 150 °C. This versatile FET is packaged in a through-hole format for easy integration.

Median Price

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Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

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Vyrian

USA . 4,853 parts In-Stock

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4,853

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Anansix

USA . 2,093 parts In-Stock

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2,093

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Digiode

USA . 887 parts In-Stock

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887

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Distributors (Availability)

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IDEA Electronic Components Group

UK . 299 parts In-Stock

1+ parts

$1.459

100+ parts

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$1.313

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299

$1.459

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$1.313

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MKK Technologies

India . 680 parts In-Stock

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$2.744

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680

$2.744

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DigiPath Technology Company

USA . 680 parts In-Stock

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$2.744

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680

$2.744

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AZTECH Wire

Italy . 1,119 parts In-Stock

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$16.600

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1,119

$16.600

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Component Stockers USA

USA . 222 parts In-Stock

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$99.990

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222

$99.990

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Metaverse IC Inc.

Canada . 56,986 parts In-Stock

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Authorized Procurement Solutions

USA . 32,000 parts In-Stock

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QUARKTWIN TECHNOLOGY LTD

USA . 18,402 parts In-Stock

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Kepictronics

USA . 13,000 parts In-Stock

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A-Z Elektronik GmbH

Germany . 6,762 parts In-Stock

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Alle Elektronik GmbH

Germany . 4,566 parts In-Stock

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Corphita

USA . 2,388 parts In-Stock

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Parana Technologies

USA . 615 parts In-Stock

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$1.745

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615

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$1.745

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Perfect Parts

USA . 250 parts In-Stock

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250

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Overview

Elevate your power management solutions with the STB25NM50N-1 from STMicroelectronics. Renowned for their commitment to quality and innovation, STMicroelectronics delivers this high-performance N-channel FET designed for efficient switching applications. With impressive durability and reliability, it operates seamlessly in demanding environments, ensuring optimal performance for industrial automation, renewable energy systems, and consumer electronics. Experience excellence that powers your projects forward!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy material ensures durability and resistance to environmental factors, making the FET suitable for a variety of applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs generally offer higher electron mobility, resulting in better performance and efficiency in various switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode configuration simplifies circuit design and provides enhanced protection against reverse voltage, increasing reliability.

Transistor Application: SWITCHING

Designed for switching applications, this FET allows for efficient and speedy control of electrical power, essential for modern electronic devices.

Minimum DS Breakdown Voltage: 500 V

A high breakdown voltage indicates robust performance under high-voltage conditions, ideal for applications requiring voltage endurance.

Package Shape: RECTANGULAR

The rectangular package shape allows for efficient space utilization on PCBs, aiding in compact design implementations.

Terminal Form: THROUGH-HOLE

Through-hole terminals provide strong mechanical support and are easier to solder, ensuring reliability in physical connections.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation enables efficient control of current flow, offering lower power consumption in active circuits.

Maximum Pulsed Drain Current (IDM): 88 A

A high pulsed drain current capability makes this FET suitable for high-demand applications where brief spikes in current are common.

Avalanche Energy Rating (EAS): 350 mJ

A high avalanche energy rating allows for safe operation during transient events, adding to the operational reliability of the device.

Maximum Drain Current (Abs) (ID): 22 A

The FET's ability to handle up to 22 A contributes to its versatility in various high-power applications.

No. of Terminals: 3

With three terminals, this FET is straightforward to integrate into various circuits, simplifying design and assembly processes.

Maximum Power Dissipation (Abs): 160 W

A maximum power dissipation of 160 W allows the FET to effectively manage heat and operate efficiently even under high loads.

Package Style (Meter): IN-LINE

In-line package style enables easy integration into printed circuit boards, facilitating automated manufacturing processes.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology provides high input impedance and low power consumption, making this FET ideal for battery-operated devices.

Maximum Operating Temperature: 150 °C

A high operating temperature rating ensures reliable performance in demanding environments and helps to prolong the device's lifespan.

Transistor Element Material: SILICON

Silicon as a semiconductor material offers excellent thermal and electrical performance, ensuring efficient operation and durability.

Terminal Finish: Matte Tin (Sn)

Matte tin plating on terminals enhances solderability and corrosion resistance, ensuring long-lasting performance in various conditions.

Maximum Drain-Source On Resistance: 0.14 ohm

A low on-resistance of 0.14 ohm minimizes power loss during operation, improving overall efficiency in power management.

Terminal Position: SINGLE

A single terminal position simplifies layout design on PCBs, providing flexibility in circuit arrangement and integration.

Technical Specifications

Power Field Effect Transistors (FET) STB25NM50N-1 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

350 mJ

Minimum DS Breakdown Voltage:

500 V

Maximum Drain Current (Abs) (ID):

22 A

Maximum Drain Current (ID):

22 A

Maximum Drain-Source On Resistance:

.14 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-262AA

JESD-30 Code:

R-PSIP-T3

JESD-609 Code:

e3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

IN-LINE

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

88 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

Matte Tin (Sn)

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STB25NM50N-1 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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