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PD20010STR-E

STMicroelectronics

PD20010STR-E by STMicroelectronics

PD20010STR-E by STMicroelectronics is an N-channel RF power FET designed for amplifier applications. It features a max drain current of 5 A, a breakdown voltage of 40 V, and operates in the L band. This surface-mount transistor ensures efficient performance with a max power dissipation of 59 W.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

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Vyrian

USA . 8,491 parts In-Stock

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Digiode

USA . 4,422 parts In-Stock

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Anansix

USA . 2,574 parts In-Stock

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2,574

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IDEA Electronic Components Group

UK . 873 parts In-Stock

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$1.241

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$1.117

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873

$1.241

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$1.117

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MKK Technologies

India . 666 parts In-Stock

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$2.334

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666

$2.334

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DigiPath Technology Company

USA . 666 parts In-Stock

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$2.334

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666

$2.334

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AZTECH Wire

Italy . 792 parts In-Stock

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$20.950

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792

$20.950

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QUARKTWIN TECHNOLOGY LTD

USA . 3,460 parts In-Stock

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Corphita

USA . 1,340 parts In-Stock

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Perfect Parts

USA . 963 parts In-Stock

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Parana Technologies

USA . 161 parts In-Stock

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$1.484

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$1.484

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Overview

Unlock exceptional performance in your RF applications with the PD20010STR-E from STMicroelectronics, a leader in innovative semiconductor solutions. This N-channel FET delivers outstanding power amplification while ensuring reliability and efficiency. Its compact flatpack design is perfect for modern electronics, making it ideal for telecommunications, broadcasting, and more. Experience superior quality and commitment to excellence from STMicroelectronics—your trusted partner in technological advancement!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy ensures durability and resistance to environmental factors, making it suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs offer higher electron mobility, resulting in better performance in amplification applications.

Configuration: SINGLE

A single configuration simplifies design and integration into circuits.

Transistor Application: AMPLIFIER

Specifically designed for amplifier applications, ensuring optimal performance in signal amplification.

Surface Mount: YES

Surface mount capability enables compact designs and efficient manufacturing processes.

Minimum DS Breakdown Voltage: 40 V

A minimum breakdown voltage of 40 V provides reliable operation under various voltage conditions, enhancing its robustness.

Package Shape: RECTANGULAR

The rectangular shape aids in space-efficient layout designs on PCB, facilitating better integration.

Terminal Form: FLAT

Flat terminal design promotes ease of soldering and provides a stable electrical connection.

Operating Mode: ENHANCEMENT MODE

Enhancement mode ensures that the transistor operates efficiently at lower voltages, increasing overall circuit performance.

Highest Frequency Band: L BAND

Operating in the L band allows for applications in radar and communication systems, meeting industry demands.

Maximum Drain Current (Abs) (ID): 5 A

A high maximum drain current capacity ensures versatility in applications requiring significant power handling.

No. of Terminals: 2

The simplicity of a two-terminal design streamlines connections, making integration easier.

Maximum Power Dissipation (Abs): 59 W

A maximum power dissipation rating of 59 W allows for high-performance applications without overheating.

Package Style (Meter): FLATPACK

The flatpack style can enhance thermal performance and support miniaturized designs.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology contributes to high input impedance and low power consumption, making this FET energy-efficient.

Maximum Operating Temperature: 165 °C

A maximum operating temperature of 165 °C indicates reliable performance in high-temperature environments.

Transistor Element Material: SILICON

Silicon as the semiconductor material provides excellent electrical properties and reliability.

Maximum Drain Current (ID): 5 A

This value reiterates the capacity for handling substantial current without performance degradation.

Terminal Position: DUAL

Dual terminal positions enhance layout flexibility and integration within devices.

Case Connection: SOURCE

The source connection facilitates effective thermal management and simplifies circuit design.

Technical Specifications

RF Power Field Effect Transistors (FET) PD20010STR-E attributes and parameters. Explore more RF Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Additional Features:

ESD PROTECTION, HIGH RELIABILITY

Case Connection:

SOURCE

Configuration:

Minimum DS Breakdown Voltage:

40 V

Maximum Drain Current (Abs) (ID):

5 A

Maximum Drain Current (ID):

5 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Highest Frequency Band:

L BAND

JESD-30 Code:

R-PDFP-F2

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

165 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

FLATPACK

Peak Reflow Temperature (C):

NOT SPECIFIED

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Form:

FLAT

Terminal Position:

DUAL

Maximum Time At Peak Reflow Temperature (s):

NOT SPECIFIED

Transistor Application:

AMPLIFIER

Transistor Element Material:

SILICON

Trade Compliance

PD20010STR-E Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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