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NTD4909N-35G

Onsemi

NTD4909N-35G by Onsemi

NTD4909N-35G by Onsemi is a Power FET with 30V DS Breakdown Voltage, 41A Drain Current, and 0.012 ohm On Resistance. Ideal for SWITCHING applications due to its 167A Pulsed Drain Current and 29.4W Power Dissipation capabilities in ENHANCEMENT MODE operation.

Median Price

$0.216

Lifecycle Status

Suppliers In-Stock

4

In-Stock Inventory

1k+

Distributors (Authorized)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Rochester

USA . 19,225 parts In-Stock

1+ parts

-

100+ parts

$0.225

1k+ parts

$0.186

10k+ parts

$0.166

19,225

-

$0.225

$0.186

$0.166

Verical

USA . 13,725 parts In-Stock

1+ parts

-

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10k+ parts

$0.208

13,725

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-

-

$0.208

Distributors (In-Stock)

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Digiode

USA . 1,247 parts In-Stock

1+ parts

$0.175

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1,247

$0.175

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Vyrian

USA . 4,605 parts In-Stock

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4,605

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Distributors (Availability)

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Corphita

USA . 780 parts In-Stock

1+ parts

$0.166

100+ parts

-

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780

$0.166

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Corohmni

South Africa . 315 parts In-Stock

1+ parts

$0.184

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-

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315

$0.184

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AZTECH Wire

Italy . 463 parts In-Stock

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$20.540

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463

$20.540

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Continental Prestige Electronics

USA . 19,225 parts In-Stock

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100+ parts

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$0.169

10k+ parts

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19,225

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-

$0.169

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Kepictronics

USA . 15,000 parts In-Stock

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15,000

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Authorized Procurement Solutions

USA . 5,000 parts In-Stock

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5,000

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Kulean Microsystems

USA . 3,480 parts In-Stock

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3,480

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SupplyDigital Components

Austria . 2,058 parts In-Stock

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2,058

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Problanco Electronics

Mexico . 1,920 parts In-Stock

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1,920

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A-Z Elektronik GmbH

Germany . 1,710 parts In-Stock

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1,710

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TANS Electronics

Latvia . 809 parts In-Stock

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UHIMA Technologies

Türkiye . 470 parts In-Stock

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470

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Overview

Experience the power of innovation with the NTD4909N-35G by Onsemi. As a leading manufacturer in the industry, Onsemi delivers top-quality Power Field Effect Transistors that are ideal for a variety of switching applications. With its N-channel configuration and built-in diode, this transistor offers superior performance and reliability. Trust Onsemi to provide you with a cutting-edge solution that maximizes efficiency and functionality. Upgrade your systems today with the NTD4909N-35G and experience the difference in power and performance.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy body material helps to provide durability and protection for the FET, making it suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically have lower on-resistance compared to P-channel FETs, making them more efficient for switching applications.

Minimum DS Breakdown Voltage: 30 V

The high breakdown voltage allows for safe operation in high voltage circuits, ensuring reliability.

Maximum Pulsed Drain Current (IDM): 167 A

The high pulsed drain current rating enables the FET to handle large current spikes, making it suitable for high-power applications.

Maximum Drain Current (Abs) (ID): 41 A

With a high maximum drain current rating, this FET can reliably handle continuous current flow in various applications.

Max Power Dissipation (Abs): 29.4 W

The high power dissipation rating ensures that the FET can handle high power levels without overheating, making it reliable for demanding applications.

Transistor Element Material: SILICON

Silicon is a common and reliable material for FETs, providing good performance and efficiency in various applications.

Terminal Finish: TIN

The tin terminal finish helps to ensure good electrical conductivity and reliable connections.

Maximum Drain-Source On Resistance: 0.012 ohm

The low on-resistance of the FET results in minimal power loss and heat generation, making it efficient for switching applications.

Technical Specifications

Power Field Effect Transistors (FET) NTD4909N-35G attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

28 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

30 V

Maximum Drain Current (Abs) (ID):

41 A

Maximum Drain Current (ID):

8.8 A

Maximum Drain-Source On Resistance:

.012 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSIP-T3

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

IN-LINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

167 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

TIN

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTD4909N-35G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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