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NTD4815NH-1G

Onsemi

NTD4815NH-1G by Onsemi

NTD4815NH-1G by Onsemi is a N-channel power FET with 30V DS breakdown voltage and 87A pulsed drain current. Ideal for switching applications, it features a single configuration with built-in diode and 0.015 ohm max drain-source resistance.

Median Price

$0.114

Lifecycle Status

Suppliers In-Stock

4

In-Stock Inventory

1k+

Distributors (Authorized)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Rochester

USA . 64,240 parts In-Stock

1+ parts

-

100+ parts

$0.119

1k+ parts

$0.099

10k+ parts

$0.088

64,240

-

$0.119

$0.099

$0.088

Verical

USA . 63,975 parts In-Stock

1+ parts

-

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-

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10k+ parts

$0.110

63,975

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-

$0.110

Distributors (In-Stock)

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Digiode

USA . 316 parts In-Stock

1+ parts

$0.093

100+ parts

-

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316

$0.093

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Vyrian

USA . 6,869 parts In-Stock

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6,869

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Distributors (Availability)

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Corphita

USA . 1,875 parts In-Stock

1+ parts

$0.088

100+ parts

-

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1,875

$0.088

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Corohmni

South Africa . 69 parts In-Stock

1+ parts

$0.098

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-

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69

$0.098

-

-

-

Advanced Electronics

New Zealand . 10 parts In-Stock

1+ parts

$2.003

100+ parts

$1.983

1k+ parts

$1.902

10k+ parts

-

10

$2.003

$1.983

$1.902

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AZTECH Wire

Italy . 1,166 parts In-Stock

1+ parts

$9.270

100+ parts

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1,166

$9.270

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Continental Prestige Electronics

USA . 64,240 parts In-Stock

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$0.089

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64,240

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$0.089

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Kulean Microsystems

USA . 6,728 parts In-Stock

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6,728

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TANS Electronics

Latvia . 5,783 parts In-Stock

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5,783

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Problanco Electronics

Mexico . 5,464 parts In-Stock

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5,464

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SupplyDigital Components

Austria . 3,869 parts In-Stock

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3,869

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UHIMA Technologies

Türkiye . 211 parts In-Stock

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211

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Overview

Elevate your power management systems with the NTD4815NH-1G by Onsemi. Crafted with precision and quality, this N-channel Power FET offers enhanced performance in switching applications. With a maximum operating temperature of 175 °C and a minimum DS breakdown voltage of 30V, this transistor ensures reliable operation even in the most demanding conditions. Whether you're looking to optimize your power distribution or enhance your circuit design, the NTD4815NH-1G delivers unmatched value and efficiency. Experience innovation at its finest with Onsemi's cutting-edge technology.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Plastic/epoxy material provides durability and protection for the internal components of the FET, ensuring longevity and reliability in various operating conditions.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically offer lower ON-resistance and higher current carrying capability compared to P-channel FETs, making them more efficient for switching applications.

Minimum DS Breakdown Voltage: 30 V

With a minimum breakdown voltage of 30V, this FET can handle higher voltages without risking damage, making it suitable for a wide range of applications.

Maximum Pulsed Drain Current (IDM): 87 A

High pulsed drain current rating of 87A allows the FET to handle large current spikes during switching operations, making it reliable for demanding applications.

Maximum Power Dissipation (Abs): 32.6 W

With a high power dissipation rating of 32.6W, this FET can effectively dissipate heat generated during operation, ensuring stable performance under heavy loads.

Maximum Operating Temperature: 175 °C

The FET is rated to operate at a high temperature of 175 °C, making it suitable for applications where elevated temperatures are present, ensuring reliability in harsh environments.

Maximum Drain-Source On Resistance: 0.015 ohm

Low drain-source ON resistance of 0.015 ohms reduces power losses and improves efficiency in conduction mode, making this FET ideal for high-current switching applications.

Technical Specifications

Power Field Effect Transistors (FET) NTD4815NH-1G attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

35.6 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

30 V

Maximum Drain Current (Abs) (ID):

8.5 A

Maximum Drain Current (ID):

6.9 A

Maximum Drain-Source On Resistance:

.015 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSIP-T3

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

IN-LINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

87 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

TIN

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTD4815NH-1G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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