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NTB75N03-006

Onsemi

NTB75N03-006 by Onsemi

NTB75N03-006 by Onsemi is a N-channel Power FET with 30V DS breakdown voltage, 225A IDM, and 0.0065 ohm max RDS(on). Ideal for switching applications, it features a built-in diode, operates in enhancement mode, and has a peak reflow temp of 235 °C.

Median Price

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Lifecycle Status

Suppliers In-Stock

2

In-Stock Inventory

1k+

Distributors (In-Stock)

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Digiode

USA . 2,028 parts In-Stock

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Vyrian

USA . 1,254 parts In-Stock

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Ampacity Inc.

Singapore . 1,448 parts In-Stock

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$24.050

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$24.050

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Component Stockers USA

USA . 458 parts In-Stock

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$99.990

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458

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SupplyDigital Components

Austria . 7,058 parts In-Stock

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TANS Electronics

Latvia . 3,662 parts In-Stock

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Problanco Electronics

Mexico . 3,559 parts In-Stock

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Kulean Microsystems

USA . 1,901 parts In-Stock

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Corphita

USA . 1,075 parts In-Stock

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Corohmni

South Africa . 368 parts In-Stock

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UHIMA Technologies

Türkiye . 260 parts In-Stock

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Overview

Discover the NTB75N03-006 by Onsemi, a high-quality Power FET that delivers exceptional performance in switching applications. With its N-CHANNEL configuration and built-in diode, this transistor offers unmatched efficiency and reliability. Perfect for a variety of electronic projects, this transistor is a game-changer in the field of power management. Trust the expertise of Onsemi to provide cutting-edge technology that meets your needs. Upgrade your designs today with the NTB75N03-006 and experience the difference.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Provides durability and protection for the internal components, ensuring long-lasting performance.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically have better performance characteristics compared to P-channel FETs, making them a preferred choice for many applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode allows for efficient switching and protection against reverse current flow, enhancing overall performance.

Transistor Application: SWITCHING

Optimized for switching applications, providing fast and efficient performance in power control circuits.

Surface Mount: YES

Suitable for modern PCB designs, making it easy to integrate into compact electronic devices.

Minimum DS Breakdown Voltage: 30 V

With a high breakdown voltage, this FET can handle higher voltages, making it suitable for a wide range of applications.

Max Pulsed Drain Current (IDM): 225 A

Capable of handling high peak currents, making it suitable for applications requiring high power handling capacities.

Avalanche Energy Rating (EAS): 1500 mJ

With a high avalanche energy rating, this FET can withstand high energy spikes, ensuring reliability in rugged operating conditions.

Maximum Drain-Source On Resistance: 0.0065 ohm

Low on-resistance allows for efficient power flow and minimal voltage drop across the FET, resulting in improved performance and energy efficiency.

Technical Specifications

Power Field Effect Transistors (FET) NTB75N03-006 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Additional Features:

ULTRA LOW RESISTANCE

Avalanche Energy Rating (EAS):

1500 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

30 V

Maximum Drain Current (ID):

75 A

Maximum Drain-Source On Resistance:

.0065 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e0

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

235

Polarity or Channel Type:

Maximum Pulsed Drain Current (IDM):

225 A

Surface Mount:

YES

Terminal Finish:

TIN LEAD

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTB75N03-006 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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