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NTB70N08

Onsemi

NTB70N08 by Onsemi

The Onsemi NTB70N08 is a N-CHANNEL FET with 80V DS Breakdown Voltage, ideal for SWITCHING applications. It features GULL WING terminals and operates in ENHANCEMENT MODE. This SMALL OUTLINE transistor uses METAL-OXIDE SEMICONDUCTOR tech and SILICON material, suitable for surface mount designs.

Median Price

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Lifecycle Status

Suppliers In-Stock

2

In-Stock Inventory

1k+

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Digiode

USA . 2,036 parts In-Stock

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Vyrian

USA . 431 parts In-Stock

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SupplyDigital Components

Austria . 7,244 parts In-Stock

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TANS Electronics

Latvia . 4,404 parts In-Stock

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Problanco Electronics

Mexico . 4,094 parts In-Stock

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Corphita

USA . 1,898 parts In-Stock

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Kulean Microsystems

USA . 1,866 parts In-Stock

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UHIMA Technologies

Türkiye . 842 parts In-Stock

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842

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Corohmni

South Africa . 427 parts In-Stock

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Overview

Experience the next level of power management with the NTB70N08 by Onsemi. As a leading manufacturer in the industry, Onsemi guarantees top-notch quality and reliability in their Power Field Effect Transistors (FET). Ideal for switching applications, this N-CHANNEL transistor offers enhanced performance in a compact package. Say goodbye to power inefficiency and hello to seamless operation with the NTB70N08. Upgrade your systems today and witness the difference that Onsemi's technology can make in your projects.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

This material provides good insulation and protection for the FET, ensuring reliable performance and durability.

Polarity or Channel Type: N-CHANNEL

N-channel FETs are commonly used for switching applications due to their higher mobility of electrons, making them efficient for power handling.

Configuration: SINGLE

Singe configuration FETs are easier to use and control in circuit designs, making them a preferred choice for simplicity and reliability.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET can efficiently control power flow, making it suitable for various electrical and electronic systems.

Surface Mount: YES

Surface mount technology allows for easy and compact integration of the FET onto circuit boards, saving space and simplifying assembly processes.

Minimum DS Breakdown Voltage: 80 V

With a minimum breakdown voltage of 80V, this FET can handle high voltage applications with ease, providing a safety margin for reliable operation.

Package Shape: RECTANGULAR

Rectangular package shape offers better compatibility with standard PCB layouts and facilitates efficient placement and soldering during assembly.

Terminal Form: GULL WING

Gull wing terminals provide secure and reliable connections, ensuring stable electrical conductivity and mechanical strength in various operating conditions.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs can be easily turned on or off, making them ideal for switching applications where precise control over power flow is required.

No. of Terminals: 2

Having only 2 terminals simplifies circuit connections and reduces complexity in design, making it easier to integrate into various electronic systems.

Package Style (Meter): SMALL OUTLINE

Small outline package style offers compact size and lightweight design, suitable for space-constrained applications and portable electronics.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Metal-oxide semiconductor technology provides high performance and reliability, allowing efficient control of power flow with low power consumption and heat dissipation.

Transistor Element Material: SILICON

Silicon-based FETs offer high efficiency and reliability in switching applications, providing stable performance over a wide range of operating conditions.

Terminal Finish: TIN LEAD

Tin lead terminal finish ensures good solderability and corrosion resistance, extending the lifespan of the FET and maintaining stable electrical connections.

Terminal Position: SINGLE

Single terminal position simplifies circuit connections and enhances reliability, ensuring consistent performance and ease of integration in various electronic systems.

Case Connection: DRAIN

Drain terminal connection provides efficient power handling and control, making this FET suitable for use in applications requiring high current switching capabilities.

Technical Specifications

Power Field Effect Transistors (FET) NTB70N08 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Case Connection:

DRAIN

Configuration:

Minimum DS Breakdown Voltage:

80 V

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e0

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

TIN LEAD

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTB70N08 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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