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MCH3312

Onsemi

MCH3312 by Onsemi

MCH3312 by Onsemi is a P-CHANNEL FET with 30V DS breakdown voltage and 2A max drain current. Ideal for switching applications, it features a built-in diode, 0.145 ohm RDS(on), and operates in enhancement mode. This small outline transistor has a max power dissipation of 1W and can withstand up to 150 °C operating temperature.

Median Price

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Lifecycle Status

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< 1k

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Digiode

USA . 434 parts In-Stock

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Vyrian

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Kepictronics

USA . 90,000 parts In-Stock

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SupplyDigital Components

Austria . 7,616 parts In-Stock

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TANS Electronics

Latvia . 5,167 parts In-Stock

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Kulean Microsystems

USA . 4,008 parts In-Stock

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Corphita

USA . 2,157 parts In-Stock

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Problanco Electronics

Mexico . 1,726 parts In-Stock

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Corohmni

South Africa . 333 parts In-Stock

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UHIMA Technologies

Türkiye . 53 parts In-Stock

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Overview

Unleash the power of innovation with the MCH3312 by Onsemi, a high-quality P-CHANNEL Small Signal Field Effect Transistor with built-in diode. Ideal for switching applications, this transistor offers a maximum drain current of 2A and a minimum DS breakdown voltage of 30V. With its compact design and advanced technology, the MCH3312 provides customers with reliable performance and efficient operation. Upgrade your electronic projects with this versatile component and experience the difference in quality and value that Onsemi delivers.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy package body material provides strong durability and protection for the transistor, ensuring longevity and reliability in various operating conditions.

Polarity or Channel Type: P-CHANNEL

The P-channel type offers lower conduction losses and higher efficiency compared to N-channel counterparts, making it suitable for certain applications like switching circuits.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode simplifies circuit design and offers protection against reverse voltage, enhancing the overall performance and reliability of the transistor.

Transistor Application: SWITCHING

Designed specifically for switching applications, this transistor provides fast switching speeds and low power dissipation, making it ideal for efficient power management.

Surface Mount: YES

The surface-mount capability allows for easy and compact integration into circuit boards, saving space and simplifying the manufacturing process.

Minimum DS Breakdown Voltage: 30 V

The high breakdown voltage ensures reliable operation and protection against voltage spikes, contributing to the robustness and safety of the transistor.

Package Shape: RECTANGULAR

The rectangular package shape offers convenient mounting and handling, making it suitable for automated manufacturing processes and space-constrained applications.

Terminal Form: FLAT

The flat terminal form provides easy soldering and secure connection, facilitating the assembly process and ensuring a stable electrical connection.

Operating Mode: ENHANCEMENT MODE

The enhancement mode operation allows for precise control of the transistor's conductivity, enabling efficient power management and enhanced performance in various applications.

Maximum Drain Current (Abs) (ID): 2 A

The high maximum drain current rating ensures the transistor can handle high-power applications with ease, providing reliable performance under demanding conditions.

No. of Terminals: 3

The three terminals enable versatile connectivity options and circuit configurations, enhancing the transistor's compatibility and applicability in a wide range of circuit designs.

Maximum Power Dissipation (Abs): 1 W

The maximum power dissipation rating of 1W indicates the transistor's ability to handle heat dissipation effectively, ensuring stable operation and longevity.

Package Style (Meter): SMALL OUTLINE

The small outline package style offers a compact footprint and efficient use of board space, making it suitable for miniaturized electronic devices and densely packed PCBs.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

The metal-oxide semiconductor technology provides high efficiency, low operating voltages, and fast switching speeds, making the transistor suitable for high-performance applications.

Maximum Operating Temperature: 150 °C

The high maximum operating temperature of 150 °C ensures reliable performance in a wide range of environmental conditions, offering versatility and durability in various applications.

Transistor Element Material: SILICON

The silicon material used in the transistor element provides excellent conductivity, reliability, and temperature stability, ensuring consistent performance over time.

Maximum Drain-Source On Resistance: 0.145 ohm

The low drain-source on resistance minimizes power losses and improves efficiency, making the transistor suitable for high-frequency switching and power conversion applications.

Terminal Position: DUAL

The dual terminal position offers flexibility in circuit design and connectivity, allowing for various configuration options and adaptability to different system requirements.

Technical Specifications

Small Signal Field Effect Transistors (FET) MCH3312 attributes and parameters. Explore more Small Signal Field Effect Transistors (FET) devices from Onsemi

Specs

Minimum DS Breakdown Voltage:

30 V

Maximum Drain Current (Abs) (ID):

2 A

Maximum Drain Current (ID):

2 A

Maximum Drain-Source On Resistance:

.145 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PDSO-F3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

1 W

Qualification:

Not Qualified

Sub-Category:

Other Transistors

Surface Mount:

YES

Terminal Form:

FLAT

Terminal Position:

DUAL

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

MCH3312 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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