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FDP8896_F085

Onsemi

FDP8896_F085 by Onsemi

FDP8896_F085 by Onsemi is a N-CHANNEL Power FET with 30V DS Breakdown Voltage and 16A Drain Current. Ideal for SWITCHING applications, it features a SINGLE configuration with BUILT-IN DIODE in a PLASTIC/EPOXY package. Operating in ENHANCEMENT MODE, it has an 80W Power Dissipation and can withstand up to 175 °C temperature.

Median Price

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Lifecycle Status

Suppliers In-Stock

2

In-Stock Inventory

1k+

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Vyrian

USA . 1,500 parts In-Stock

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Digiode

USA . 1,366 parts In-Stock

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Metaverse IC Inc.

Canada . 56,986 parts In-Stock

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A-Z Elektronik GmbH

Germany . 5,250 parts In-Stock

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SupplyDigital Components

Austria . 5,034 parts In-Stock

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Kulean Microsystems

USA . 4,765 parts In-Stock

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TANS Electronics

Latvia . 3,002 parts In-Stock

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Supply Digital

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Northwest PG Solutions

USA . 1,725 parts In-Stock

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Corphita

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UHIMA Technologies

Türkiye . 724 parts In-Stock

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Problanco Electronics

Mexico . 487 parts In-Stock

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Corohmni

South Africa . 300 parts In-Stock

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Native Components

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Overview

Unleash the power of your electronics with the FDP8896_F085 by Onsemi! Crafted with precision and expertise, this Power Field Effect Transistor is designed to deliver unmatched performance in a variety of switching applications. The N-CHANNEL configuration, along with its built-in diode, offers seamless operation and reliability. From enhancing efficiency to increasing power dissipation, this transistor is a game-changer for any electronic project. Trust Onsemi's reputation for quality and innovation to take your designs to the next level.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy package body material provides durability and protection, making this FET suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically have lower on-state resistance and faster switching speeds compared to P-channel FETs, making this product efficient for switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

Having a built-in diode simplifies circuit design and can help protect against reverse current flow, enhancing the overall performance of the FET.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET can efficiently control power flow in various electronic circuits.

Minimum DS Breakdown Voltage: 30 V

The minimum breakdown voltage of 30V ensures the FET can handle high voltage applications with reliability.

Maximum Drain Current (ID): 16 A

With a high maximum drain current rating of 16A, this FET can handle heavy loads and provide consistent performance under demanding conditions.

Maximum Power Dissipation (Abs): 80 W

The maximum power dissipation rating of 80W ensures the FET can handle high power applications without overheating.

Maximum Drain-Source On Resistance: 0.007 ohm

The low on-resistance of 0.007 ohm results in reduced power losses and improved efficiency in the FET's operation.

Maximum Operating Temperature: 175 °C

With a high maximum operating temperature of 175 °C, this FET can withstand elevated temperatures, making it suitable for a wide range of environments.

Technical Specifications

Power Field Effect Transistors (FET) FDP8896_F085 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

74 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

30 V

Maximum Drain Current (Abs) (ID):

16 A

Maximum Drain Current (ID):

16 A

Maximum Drain-Source On Resistance:

.007 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-220AB

JESD-30 Code:

R-PSFM-T3

JESD-609 Code:

e3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

MATTE TIN

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

FDP8896_F085 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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