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3SK264-6

Onsemi

3SK264-6 by Onsemi

3SK264-6 by Onsemi is a N-CHANNEL FET with 0.03A max drain current and 0.2W power dissipation. Ideal for applications requiring DUAL GATE, ENHANCEMENT MODE operation in surface mount configurations at up to 125 °C.

Median Price

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Lifecycle Status

Suppliers In-Stock

2

In-Stock Inventory

1k+

Distributors (In-Stock)

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Vyrian

USA . 1,203 parts In-Stock

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Digiode

USA . 625 parts In-Stock

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625

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Native Components

USA . 92 parts In-Stock

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$1.910

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Northwest PG Solutions

USA . 1,894 parts In-Stock

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$2.101

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SupplyDigital Components

Austria . 8,172 parts In-Stock

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Kulean Microsystems

USA . 3,300 parts In-Stock

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Problanco Electronics

Mexico . 3,110 parts In-Stock

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TANS Electronics

Latvia . 2,917 parts In-Stock

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Corphita

USA . 936 parts In-Stock

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UHIMA Technologies

Türkiye . 426 parts In-Stock

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Corohmni

South Africa . 91 parts In-Stock

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Overview

Unleash the power of innovation with Onsemi's 3SK264-6 Power Field Effect Transistor. Designed with precision and excellence in mind, this N-CHANNEL FET offers unparalleled performance and reliability. Whether in automotive, industrial or consumer electronics applications, this product delivers superior efficiency and functionality. Trust Onsemi's expertise and experience to bring your projects to the next level with the 3SK264-6.

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-Channel FETs are known for their high input impedance and fast switching speeds, making them ideal for applications requiring efficient switching and low power consumption.

Configuration: SINGLE

A single configuration simplifies circuit design and reduces component count, making the product more cost-effective and easier to use.

Surface Mount: YES

Surface mount FETs are compact and allow for higher component density on a PCB, making them suitable for space-constrained applications.

Operating Mode: DUAL GATE, ENHANCEMENT MODE

Dual gate enhancement mode FETs offer precise control over the conduction channel, enabling efficient power management and optimal performance in various applications.

Maximum Drain Current (Abs) (ID): 0.03 A

The maximum drain current capacity of 0.03 A ensures reliable operation under specified load conditions, providing a safety margin for the application.

Maximum Power Dissipation (Abs): 0.2 W

With a maximum power dissipation of 0.2 W, the FET can handle heat dissipation effectively, ensuring long-term reliability and preventing overheating issues in the circuit.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Metal-oxide semiconductor technology offers low leakage current and high efficiency, making the FET suitable for low-power applications where energy efficiency is crucial.

Maximum Operating Temperature: 125 °C

The maximum operating temperature of 125 °C allows the FET to withstand high-temperature environments, ensuring stable performance and reliability in harsh operating conditions.

Technical Specifications

Power Field Effect Transistors (FET) 3SK264-6 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Configuration:

Maximum Drain Current (Abs) (ID):

.03 A

Maximum Drain Current (ID):

.03 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

No. of Elements:

1

Operating Mode:

DUAL GATE, ENHANCEMENT MODE

Maximum Operating Temperature:

125 Cel

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Trade Compliance

3SK264-6 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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