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3SK264-5

Onsemi

3SK264-5 by Onsemi

3SK264-5 by Onsemi is a N-CHANNEL FET with 0.03A max drain current and 0.2W power dissipation. Ideal for applications requiring DUAL GATE, ENHANCEMENT MODE operation in temperatures up to 125 °C. Suitable for surface mount configurations in various electronic devices.

Median Price

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Lifecycle Status

Suppliers In-Stock

2

In-Stock Inventory

1k+

Distributors (In-Stock)

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Vyrian

USA . 2,055 parts In-Stock

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Digiode

USA . 79 parts In-Stock

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Native Components

USA . 580 parts In-Stock

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$0.581

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580

$0.581

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Northwest PG Solutions

USA . 405 parts In-Stock

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$0.639

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Problanco Electronics

Mexico . 8,045 parts In-Stock

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TANS Electronics

Latvia . 3,653 parts In-Stock

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SupplyDigital Components

Austria . 2,155 parts In-Stock

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Kulean Microsystems

USA . 1,946 parts In-Stock

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Corphita

USA . 1,253 parts In-Stock

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Corohmni

South Africa . 426 parts In-Stock

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UHIMA Technologies

Türkiye . 98 parts In-Stock

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Overview

Unleash the power of innovation with the 3SK264-5 by Onsemi. As a leading manufacturer in the industry, Onsemi delivers top-quality Power Field Effect Transistors that are perfect for a wide range of applications. Offering unmatched reliability and efficiency, this N-CHANNEL FET is designed for optimal performance. Experience the benefits of its dual gate, enhancement mode operation and surface mount configuration. Trust Onsemi to provide you with cutting-edge technology that exceeds your expectations. Elevate your projects with the 3SK264-5 and unlock endless possibilities.

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-CHANNEL FETs are commonly used in high-power applications, making this product suitable for applications requiring high performance.

Configuration: SINGLE

A single configuration simplifies the design and implementation process, suitable for straightforward applications where only one FET is needed.

Surface Mount: YES

Surface mount FETs are compact and easy to install, perfect for space-constrained applications and mass production.

Operating Mode: DUAL GATE, ENHANCEMENT MODE

Dual gate FETs provide improved control over the flow of current, while enhancement mode enhances the conductivity, making this product versatile for various applications.

Maximum Drain Current (Abs) (ID): 0.03 A

With a maximum drain current of 0.03 A, this FET can handle moderate power loads effectively, suitable for applications with medium power requirements.

Maximum Power Dissipation (Abs): 0.2 W

The low power dissipation of 0.2 W ensures high efficiency and minimal heat generation, making this FET energy-efficient and reliable for extended use.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Metal-oxide semiconductor technology offers high performance and reliability, making this FET ideal for demanding applications where stable operation is crucial.

Maximum Operating Temperature: 125 °C

With a maximum operating temperature of 125 °C, this FET can withstand high-temperature environments, ensuring reliable performance in challenging conditions.

Technical Specifications

Power Field Effect Transistors (FET) 3SK264-5 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Configuration:

Maximum Drain Current (Abs) (ID):

.03 A

Maximum Drain Current (ID):

.03 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

No. of Elements:

1

Operating Mode:

DUAL GATE, ENHANCEMENT MODE

Maximum Operating Temperature:

125 Cel

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Trade Compliance

3SK264-5 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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