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PTVA120501EAV1R0

Infineon Technologies

PTVA120501EAV1R0 by Infineon Technologies

Infineon's PTVA120501EAV1R0 is an N-CHANNEL RF Power FET with 105V DS Breakdown Voltage and 16.5dB Power Gain, ideal for AMPLIFIER applications in L BAND frequencies. It features a CERAMIC/METAL-SEALED COFIRED package, SINGLE configuration, and operates in ENHANCEMENT MODE at up to 225°C.

Median Price

$48.215

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Nova Conductors

Japan . 630 parts In-Stock

1+ parts

$48.215

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630

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Vyrian

USA . 6,972 parts In-Stock

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6,972

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Digiode

USA . 344 parts In-Stock

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344

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Distributors (Availability)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Modulus Dynamics

Lithuania . 11,715 parts In-Stock

1+ parts

$0.355

100+ parts

$0.341

1k+ parts

$0.327

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11,715

$0.355

$0.341

$0.327

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AZTECH Wire

Italy . 1,256 parts In-Stock

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$16.558

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1,256

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Netroflash

USA . 1,500 parts In-Stock

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$48.215

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1,500

$48.215

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Ampacity Inc.

Singapore . 317 parts In-Stock

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$63.050

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317

$63.050

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Microchip USA

USA . 449 parts In-Stock

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$127.549

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449

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Authorized Procurement Solutions

USA . 5,000 parts In-Stock

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Corphita

USA . 32 parts In-Stock

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Overview

Unleash the power of cutting-edge technology with the PTVA120501EAV1R0 by Infineon Technologies. Crafted with precision and expertise, this RF Power FET offers unparalleled performance in amplifier applications. Its ceramic, metal-sealed co-fired package ensures durability and reliability, making it perfect for a wide range of uses. With a minimum DS breakdown voltage of 105V and a power gain of 16.5dB, this transistor delivers exceptional results. Experience the value and benefits that only Infineon Technologies can provide, revolutionizing your projects with top-of-the-line quality and innovation.

Feature Benefit Bullets

Package Body Material: CERAMIC, METAL-SEALED COFIRED

This material composition provides excellent thermal conductivity and durability, ensuring stable and reliable performance in various operating conditions.

Polarity or Channel Type: N-CHANNEL

N-Channel FETs typically have higher electron mobility and lower ON-state resistance, making them efficient for amplifier applications.

Configuration: SINGLE

Single configuration simplifies circuit design and reduces complexity, making it suitable for straightforward amplifier setups.

Transistor Application: AMPLIFIER

Designed specifically for amplifier applications, offering high power gain and excellent performance in amplifying signals.

Surface Mount: YES

Surface mount capability allows for easy and efficient integration on printed circuit boards, saving space and improving assembly processes.

Minimum DS Breakdown Voltage: 105 V

With a minimum breakdown voltage of 105V, this FET can handle high voltage levels, ensuring robust and reliable operation in high-power applications.

Minimum Power Gain (Gp): 16.5 dB

The minimum power gain of 16.5 dB indicates strong signal amplification capability, making it suitable for applications that require high gain.

Package Shape: SQUARE

Square package shape allows for efficient placement on the circuit board, optimizing space utilization and ease of mounting.

Terminal Form: FLAT

Flat terminal form simplifies soldering and connection processes, ensuring secure and reliable electrical connections.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation provides better control over the transistor's conductivity, offering flexibility and precision in signal amplification.

Highest Frequency Band: L BAND

Designed for operation in the L Band frequency range, making it suitable for applications requiring high-frequency performance in communication systems.

No. of Terminals: 2

Having 2 terminals simplifies circuit connectivity and reduces complexity, making it ideal for basic amplifier designs.

Package Style (Meter): FLANGE MOUNT

Flange mount package style provides secure mechanical mounting, ensuring stability and durability in demanding environmental conditions.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Metal-Oxide Semiconductor technology offers low input capacitance and high input impedance, improving overall performance and efficiency.

Maximum Operating Temperature: 225 °C

With a maximum operating temperature of 225°C, this FET can withstand high-temperature environments, ensuring reliable operation under thermal stress.

Transistor Element Material: SILICON

Silicon-based transistor element provides good thermal conductivity and high electron mobility, enhancing overall device performance and efficiency.

Terminal Position: DUAL

Dual terminal position allows for easy connection and soldering, improving overall installation efficiency and reliability.

Case Connection: SOURCE

Source connection simplifies circuit design and offers a common reference point for electrical signals, ensuring consistent and stable performance.

Technical Specifications

RF Power Field Effect Transistors (FET) PTVA120501EAV1R0 attributes and parameters. Explore more RF Power Field Effect Transistors (FET) devices from Infineon Technologies

Specs

Case Connection:

SOURCE

Configuration:

Minimum DS Breakdown Voltage:

105 V

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Highest Frequency Band:

L BAND

JESD-30 Code:

S-CDFM-F2

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

225 Cel

Package Body Material:

CERAMIC, METAL-SEALED COFIRED

Package Shape:

SQUARE

Package Style (Meter):

FLANGE MOUNT

Peak Reflow Temperature (C):

NOT SPECIFIED

Polarity or Channel Type:

Minimum Power Gain (Gp):

16.5 dB

Surface Mount:

YES

Terminal Form:

FLAT

Terminal Position:

DUAL

Maximum Time At Peak Reflow Temperature (s):

NOT SPECIFIED

Transistor Application:

AMPLIFIER

Transistor Element Material:

SILICON

Trade Compliance

PTVA120501EAV1R0 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Infineon Technologies

Infineon Technologies AG is a leading global semiconductor manufacturer and provider of comprehensive solutions for automotive, industrial, and consumer applications. Founded in 1999, the company has grown to become one of the largest semiconductor manufacturers in Europe. Infineon is headquartered in Neubiberg, Germany with operations across countries in Europe and Asia Pacific. Infineon provides microelectronics products that address many of today's societal challenges affecting energy efficiency, mobility, security and connectivity. Over the past two decades Infineon has become a major player in the semiconductor industry with an impressive portfolio of innovative technologies. As one of only four companies that produce DRAM chips for automobiles, Infineon produces cutting-edge processors for use in advanced driver assistance systems (ADAS). Likewise, they specialize in providing advanced embedded secure microcontrollers that are essential for connected devices. Furthermore, they offer integrated circuit solutions for industrial power control such as motor controllers and embedded gate drivers.

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Management team

CEO

Jochen Hanebeck

Chief Financial Officer

Sven Schneider

Chief Marketing Officer

Andreas Urschitz

Manufacturer fab locations 19

Fab name Location Fab Initiation Wafer Capacity

Villach 300mm

Fabrication

Fab Initiation

2011

Austria

Villach

Wafer Capacity

11,000

2011

11,000

Kulim 2

Fabrication

Fab Initiation

2016

Malaysia

Kulim

Wafer Capacity

79,500

2016

79,500

Dresden - Module 3

Fabrication

Fab Initiation

1999

Germany

Dresden

Wafer Capacity

58,000

1999

58,000

Villach Building

Fabrication

Fab Initiation

2016

Austria

Villach

Wafer Capacity

2,000

2016

2,000

Regensburg

Fabrication

Fab Initiation

1986

Germany

Regensburg

Wafer Capacity

60,000

1986

60,000

Dresden 200 - Module 1

Fabrication

Fab Initiation

1995

Germany

Dresden

Wafer Capacity

28,000

1995

28,000

Dresden 200 - Module 2

Fabrication

Fab Initiation

1996

Germany

Dresden

Wafer Capacity

28,000

1996

28,000

Building 38

Fabrication

Fab Initiation

2005

Germany

Dresden

Wafer Capacity

500

2005

500

Building 47

Fabrication

Fab Initiation

2005

Germany

Dresden

Wafer Capacity

500

2005

500

Kulim 1

Fabrication

Fab Initiation

2006

Malaysia

Kulim

Wafer Capacity

110,000

2006

110,000

Mesa Facility

Fabrication

Fab Initiation

1990

USA

Mesa

Wafer Capacity

3,000

1990

3,000

Villach 150mm

Fabrication

Fab Initiation

1981

Austria

Villach

Wafer Capacity

35,000

1981

35,000

Villach 200mm

Fabrication

Fab Initiation

1995

Austria

Villach

Wafer Capacity

68,000

1995

68,000

Temecula

Fabrication

Fab Initiation

1995

USA

Temecula

Wafer Capacity

30,000

1995

30,000

Villach 300mm

Fabrication

Fab Initiation

2021

Austria

Villach

Wafer Capacity

2021

Villach 150mm

Fabrication

Fab Initiation

2018

Austria

Villach

Wafer Capacity

5,000

2018

5,000

Kulim 3

Fabrication

Fab Initiation

2024

Malaysia

Kulim

Wafer Capacity

2024

Fab 25

Fabrication

Fab Initiation

1995

USA

Austin

Wafer Capacity

31,000

1995

31,000

Dresden - Module 4

Fabrication

Fab Initiation

2026

Germany

Dresden

Wafer Capacity

2026

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