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STU9NC80ZI

STMicroelectronics

STU9NC80ZI by STMicroelectronics

STU9NC80ZI by STMicroelectronics is an N-channel FET ideal for switching applications, featuring a max drain current of 8.6 A and a breakdown voltage of 800 V. It operates in enhancement mode with a power dissipation of up to 55 W. This robust transistor is suitable for high-temperature environments, reaching up to 150 °C.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Digiode

USA . 3,624 parts In-Stock

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3,624

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Vyrian

USA . 1,487 parts In-Stock

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1,487

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Anansix

USA . 1,469 parts In-Stock

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1,469

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Distributors (Availability)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

IDEA Electronic Components Group

UK . 444 parts In-Stock

1+ parts

$0.329

100+ parts

-

1k+ parts

$0.296

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444

$0.329

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$0.296

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MKK Technologies

India . 1,276 parts In-Stock

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$0.619

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1,276

$0.619

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DigiPath Technology Company

USA . 1,276 parts In-Stock

1+ parts

$0.619

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1,276

$0.619

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Corphita

USA . 3,436 parts In-Stock

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3,436

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Parana Technologies

USA . 85 parts In-Stock

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$0.394

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85

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$0.394

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Overview

Unlock the power of innovation with the STU9NC80ZI from STMicroelectronics, a trusted leader in advanced semiconductor solutions. This N-channel power FET delivers exceptional performance for your switching applications, ensuring reliability and efficiency. With built-in diode protection and robust durability, it excels in high-voltage environments, making it ideal for industrial, automotive, and consumer electronics. Choose STMicroelectronics for unparalleled quality and empower your projects today!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy material offers robust protection, allowing for better durability and reliability in various operating conditions.

Polarity or Channel Type: N-CHANNEL

N-channel FETs generally have lower on-resistance and higher efficiency, making them ideal for high-speed switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode provides additional protection and enables easy integration in circuits requiring flyback protection.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET can efficiently handle on-off performance, ideal for power management.

Minimum DS Breakdown Voltage: 800 V

The high breakdown voltage enhances circuit protection, making the FET suitable for high-voltage applications.

Package Shape: RECTANGULAR

The rectangular shape facilitates efficient layout and integration on PCBs, optimizing space and performance.

Terminal Form: THROUGH-HOLE

Through-hole mounting ensures better mechanical stability and connection reliability, especially in high-vibration environments.

Operating Mode: ENHANCEMENT MODE

Enhancement mode offers more efficient operation in low-power applications, suitable for modern energy-saving designs.

Maximum Pulsed Drain Current (IDM): 34.4 A

The capability to handle high pulsed currents allows this FET to manage power surges effectively, ensuring operational resilience.

Avalanche Energy Rating (EAS): 400 mJ

A high avalanche energy rating indicates robustness against transient events, providing added circuit protection.

Maximum Drain Current (Abs) (ID): 8.6 A

This current rating allows for a significant load-driving capability, making it suitable for various application needs.

No. of Terminals: 3

Three terminals provide simple configuration options, allowing easy integration into diverse circuit designs.

Maximum Power Dissipation (Abs): 55 W

The high power dissipation capability aids in effective heat management, enhancing component longevity and performance.

Package Style (Meter): IN-LINE

The in-line package style allows for efficient space utilization on the PCB, improving layout flexibility.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology provides high input impedance and low power dissipation, making this FET ideal for low-power applications.

Maximum Operating Temperature: 150 °C

The high operating temperature increase reliability in demanding environments, allowing for diverse applications.

Transistor Element Material: SILICON

Silicon as an element material contributes to high performance and reliability, standard in the industry for power electronics.

Terminal Finish: TIN LEAD

The tin lead finish provides excellent solderability and reliability, ensuring stable connections in electronic circuits.

Maximum Drain Current (ID): 8.6 A

This specification indicates strong capability for current handling, suitable for a variety of high-performance applications.

Maximum Drain-Source On Resistance: 0.9 ohm

Low on-resistance minimizes energy loss during operation, improving efficiency in power conversion applications.

Terminal Position: SINGLE

Having a single terminal position simplifies the design and layout of circuits, making integration easier.

Case Connection: ISOLATED

Isolated connections ensure safety and prevent unwanted interference, critical for reliable operation in sensitive applications.

Technical Specifications

Power Field Effect Transistors (FET) STU9NC80ZI attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

400 mJ

Case Connection:

ISOLATED

Minimum DS Breakdown Voltage:

800 V

Maximum Drain Current (Abs) (ID):

8.6 A

Maximum Drain Current (ID):

8.6 A

Maximum Drain-Source On Resistance:

.9 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSIP-T3

JESD-609 Code:

e0

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

IN-LINE

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

34.4 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

TIN LEAD

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STU9NC80ZI Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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