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STU10NC70Z

STMicroelectronics

STU10NC70Z by STMicroelectronics

STU10NC70Z from STMicroelectronics is a powerful N-channel FET designed for switching applications. It features a 700V breakdown voltage, 37.6A pulsed drain current, and operates at up to 150 °C. Ideal for high-efficiency power management in various electronic devices.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Vyrian

USA . 3,803 parts In-Stock

1+ parts

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3,803

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Digiode

USA . 3,756 parts In-Stock

1+ parts

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3,756

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Anansix

USA . 1,745 parts In-Stock

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1,745

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Distributors (Availability)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

IDEA Electronic Components Group

UK . 17 parts In-Stock

1+ parts

$0.445

100+ parts

-

1k+ parts

$0.401

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17

$0.445

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$0.401

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MKK Technologies

India . 2,117 parts In-Stock

1+ parts

$0.837

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2,117

$0.837

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DigiPath Technology Company

USA . 2,117 parts In-Stock

1+ parts

$0.837

100+ parts

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2,117

$0.837

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Parana Technologies

USA . 1,984 parts In-Stock

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$0.532

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1,984

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$0.532

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Corphita

USA . 254 parts In-Stock

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254

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Overview

Elevate your designs with the STU10NC70Z from STMicroelectronics—a trusted name in power solutions. This robust N-channel FET delivers unmatched quality and reliability, perfect for demanding switching applications. With its high breakdown voltage and built-in diode, it ensures optimal performance while minimizing power loss. Experience enhanced efficiency and durability, making it an ideal choice for industrial, automotive, and renewable energy sectors. Choose STMicroelectronics for innovative technology that empowers your projects!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy body material ensures durability and a lightweight design, making it suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs provide better efficiency and faster switching speeds, enhancing performance in power management applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode configuration simplifies circuit design and provides protection against potential over-voltage conditions.

Transistor Application: SWITCHING

Designed for switching applications, this FET can efficiently control power delivery, making it ideal for a wide range of electronics.

Minimum DS Breakdown Voltage: 700 V

A high breakdown voltage allows for safe operation in high-voltage environments, increasing the versatility of this FET.

Package Shape: RECTANGULAR

The rectangular package shape aids in space-efficient circuit design and easy mounting on PCBs.

Terminal Form: THROUGH-HOLE

Through-hole terminals provide secure mechanical and electrical connections, enhancing reliability in installation.

Operating Mode: ENHANCEMENT MODE

The enhancement mode allows for improved efficiency and performance in various applications, particularly in amplifying signals.

Maximum Pulsed Drain Current (IDM): 37.6 A

This high pulsed drain current rating allows the FET to handle quick bursts of energy, beneficial for transient conditions.

Avalanche Energy Rating (EAS): 400 mJ

The avalanche energy rating indicates robustness against destructive avalanche effects, ensuring reliability under unexpected conditions.

Maximum Drain Current (Abs) (ID): 9.4 A

With a maximum drain current of 9.4 A, this FET can handle substantial continuous currents, making it suitable for high-power applications.

No. of Terminals: 3

Having three terminals simplifies circuit design while maintaining effective control and functionality.

Maximum Power Dissipation (Abs): 160 W

A high power dissipation capability ensures the FET can operate efficiently without overheating, enhancing long-term reliability.

Package Style (Meter): IN-LINE

The in-line package style allows for easy integration into existing designs and helps in maintaining a clean layout.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology offers high input resistance and low power consumption, making it ideal for modern electronics.

Maximum Operating Temperature: 150 °C

A maximum operating temperature of 150 °C permits usage in demanding environments, expanding its application range.

Transistor Element Material: SILICON

Silicon offers excellent semiconductor properties and has a well-established manufacturing process, ensuring reliability and availability.

Terminal Finish: TIN LEAD

Tin-lead termination provides good solderability and electrical conductivity, enhancing the part's performance in various applications.

Maximum Drain Current (ID): 9.4 A (duplicate)

Reiterating a maximum drain current of 9.4 A highlights the reliability and functionality of this FET in power applications.

Maximum Drain-Source On Resistance: 0.75 ohm

Low on-resistance decreases power loss and heat generation during operation, improving overall efficiency.

Terminal Position: SINGLE

A single terminal position enhances the simplicity of design and allows for easier PCB footprint integration.

Technical Specifications

Power Field Effect Transistors (FET) STU10NC70Z attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

400 mJ

Minimum DS Breakdown Voltage:

700 V

Maximum Drain Current (Abs) (ID):

9.4 A

Maximum Drain Current (ID):

9.4 A

Maximum Drain-Source On Resistance:

.75 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSIP-T3

JESD-609 Code:

e0

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

IN-LINE

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

37.6 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

TIN LEAD

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STU10NC70Z Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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