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STU10NM65N

STMicroelectronics

STU10NM65N by STMicroelectronics

STU10NM65N by STMicroelectronics is an N-channel MOSFET ideal for switching applications, featuring a 650V breakdown voltage and 36A pulsed drain current. It operates in enhancement mode with a max power dissipation of 90W. This versatile FET is suitable for high-efficiency power management.

Median Price

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Lifecycle Status

Suppliers In-Stock

4

In-Stock Inventory

1k+

Distributors (In-Stock)

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Vyrian

USA . 5,574 parts In-Stock

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5,574

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Anansix

USA . 1,149 parts In-Stock

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1,149

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Digiode

USA . 616 parts In-Stock

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616

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Bristol Electronics

USA . 50 parts In-Stock

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50

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IDEA Electronic Components Group

UK . 2,378 parts In-Stock

1+ parts

$1.809

100+ parts

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$1.628

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2,378

$1.809

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$1.628

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MKK Technologies

India . 2,044 parts In-Stock

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$3.401

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$3.401

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DigiPath Technology Company

USA . 2,044 parts In-Stock

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$3.401

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$3.401

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AZTECH Wire

Italy . 962 parts In-Stock

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$21.150

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962

$21.150

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Alle Elektronik GmbH

Germany . 3,407 parts In-Stock

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Corphita

USA . 3,075 parts In-Stock

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3,075

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Authorized Procurement Solutions

USA . 2,000 parts In-Stock

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2,000

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Parana Technologies

USA . 1,840 parts In-Stock

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$2.163

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1,840

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$2.163

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Overview

Unlock the power of efficiency with the STU10NM65N from STMicroelectronics, a leader in semiconductor innovation. This N-channel Power FET ensures reliable switching for various applications, delivering high performance and durability. With superior quality and robust design, it offers low on-resistance and exceptional breakdown voltage, making it perfect for energy-conscious projects. Elevate your designs with this trusted component that combines reliability, performance, and value.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy body material provides a good balance of durability and weight, making this FET suitable for various applications while ensuring reliable performance.

Polarity or Channel Type: N-CHANNEL

The N-channel configuration allows for higher efficiency and better performance in switching applications, making it ideal for power management.

Configuration: SINGLE WITH BUILT-IN DIODE

Having a built-in diode enhances the device's versatility, enabling it to efficiently manage reverse currents and improve circuit protection.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET excels in controlling power flow in various electronic devices.

Minimum DS Breakdown Voltage: 650 V

A high breakdown voltage gives this component the ability to handle high-voltage applications, ensuring safety and reliability in demanding environments.

Package Shape: RECTANGULAR

The rectangular package shape facilitates easier PCB layout and assembly, optimizing space utilization in circuit designs.

Terminal Form: THROUGH-HOLE

Through-hole terminals provide better mechanical stability and ease of soldering, making this FET user-friendly in prototyping and production.

Operating Mode: ENHANCEMENT MODE

The enhancement mode operation allows for efficient control of the FET's conduction channel, enhancing switching performance and reducing power loss.

Maximum Pulsed Drain Current (IDM): 36 A

The ability to handle high pulsed currents makes this FET suitable for applications requiring brief surges of power, improving its adaptability.

Avalanche Energy Rating (EAS): 300 mJ

A high avalanche energy rating ensures protection against voltage spikes, making this device reliable in transient voltage scenarios.

Maximum Drain Current (Abs) (ID): 9 A

A maximum drain current rating of 9 A provides flexibility in design for a variety of applications, supporting both low and moderate current specifications.

No. of Terminals: 3

Having three terminals simplifies the connection while still providing essential operational flexibility for circuit designs.

Maximum Power Dissipation (Abs): 90 W

A high power dissipation capability allows this FET to manage thermal issues effectively, ensuring durability in high-power applications.

Package Style (Meter): IN-LINE

The in-line package style enhances mounting flexibility and is well-suited for various circuit configurations, enhancing overall design efficiency.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology enhances voltage control and switching speeds, making this FET highly efficient and effective for modern electronic applications.

Maximum Operating Temperature: 150 °C

The high maximum operating temperature allows the FET to function reliably in harsh environments, thus expanding its application range.

Transistor Element Material: SILICON

Silicon as the element material ensures compatibility with a broad range of electronic components and devices, promoting design versatility.

Terminal Finish: Matte Tin (Sn) - annealed

Matte tin terminal finish enhances solderability and prevents oxidization, ensuring long-term reliability in electrical connections.

Maximum Drain Current (ID): 9 A

Reiterating the maximum drain current at 9 A confirms this FET's robust capabilities in handling requisite electrical loads.

Maximum Drain-Source On Resistance: 0.48 ohm

A low on-resistance improves efficiency by minimizing power losses during conduction, making it an energy-efficient option for power applications.

Terminal Position: SINGLE

A single terminal position simplifies circuit design and integration, which is advantageous for compact layouts.

Maximum Time At Peak Reflow Temperature (s): 30

The specification ensures compatibility with modern assembly processes by accommodating standard reflow soldering techniques.

Peak Reflow Temperature °C: 260

A high peak reflow temperature indicates resilience during assembly, enabling the FET to withstand common manufacturing conditions without performance loss.

Technical Specifications

Power Field Effect Transistors (FET) STU10NM65N attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

300 mJ

Minimum DS Breakdown Voltage:

650 V

Maximum Drain Current (Abs) (ID):

9 A

Maximum Drain Current (ID):

9 A

Maximum Drain-Source On Resistance:

.48 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-251AA

JESD-30 Code:

R-PSIP-T3

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

IN-LINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

36 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

Matte Tin (Sn) - annealed

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STU10NM65N Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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