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STU100N3LF3

STMicroelectronics

STU100N3LF3 by STMicroelectronics

STU100N3LF3 by STMicroelectronics is an N-channel FET designed for efficient switching applications. It features a max drain current of 80 A, a breakdown voltage of 30 V, and operates at up to 175 °C. Ideal for high-power circuits with low on-resistance (0.0055 Ω).

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Vyrian

USA . 4,844 parts In-Stock

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4,844

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Anansix

USA . 1,751 parts In-Stock

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1,751

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Digiode

USA . 1,319 parts In-Stock

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1,319

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Distributors (Availability)

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IDEA Electronic Components Group

UK . 367 parts In-Stock

1+ parts

$1.069

100+ parts

-

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$0.962

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367

$1.069

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$0.962

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MKK Technologies

India . 725 parts In-Stock

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$2.010

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725

$2.010

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DigiPath Technology Company

USA . 725 parts In-Stock

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$2.010

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725

$2.010

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Parana Technologies

USA . 921 parts In-Stock

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$1.278

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921

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$1.278

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Corphita

USA . 186 parts In-Stock

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186

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Overview

Unleash the power of innovation with the STU100N3LF3 from STMicroelectronics! This high-performance N-channel FET excels in reliability and efficiency, making it ideal for a wide range of applications, from automotive to industrial systems. With its robust design and built-in diode, it ensures rapid switching and outstanding thermal management. Trust in STMicroelectronics' legacy of quality and performance to elevate your projects and drive success!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The durable plastic/epoxy body material ensures reliability and protection against environmental factors, making it suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically offer better performance in terms of speed and efficiency, making this transistor ideal for high-speed switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode provides additional protection and functionality, reducing component count and simplifying circuit design.

Transistor Application: SWITCHING

Optimized for switching applications, this FET can handle rapid on/off cycles effectively, making it perfect for power management in electronic devices.

Minimum DS Breakdown Voltage: 30 V

A minimum breakdown voltage of 30 V allows the transistor to be used safely in various applications, providing a buffer against voltage spikes.

Package Shape: RECTANGULAR

The rectangular package shape aids in efficient PCB layout and optimizes space utilization within devices.

Terminal Form: THROUGH-HOLE

Through-hole terminals enhance mechanical stability and reliability during soldering, making the product easier to handle in manufacturing.

Operating Mode: ENHANCEMENT MODE

The enhancement mode operation in this FET enables it to operate with lower gate voltages, conserving power and improving efficiency in the circuit.

Maximum Pulsed Drain Current (IDM): 320 A

A high pulsed drain current capability of 320 A allows the FET to handle transient loads, making it suitable for high-performance applications.

Avalanche Energy Rating (EAS): 500 mJ

With an avalanche energy rating of 500 mJ, this FET can manage energy transients effectively, ensuring durability and reliability in demanding environments.

Maximum Drain Current (Abs) (ID): 80 A

An absolute maximum drain current of 80 A enhances versatility in power applications, allowing the FET to handle substantial load currents.

No. of Terminals: 3

The three-terminal configuration provides flexibility in circuit design, simplifying integration into various systems and reducing layout complexity.

Maximum Power Dissipation (Abs): 110 W

A maximum power dissipation of 110 W ensures this FET can operate in high-power environments without overheating, thus extending its lifespan.

Package Style (Meter): IN-LINE

The in-line package style is suitable for compact designs, allowing for efficient assembly and optimal space usage on printed circuit boards.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology ensures high efficiency, low power operation, and minimal heat generation, making this FET ideal for energy-sensitive applications.

Maximum Operating Temperature: 175 °C

A maximum operating temperature of 175 °C provides robust performance in high-temperature environments, making it suitable for rugged applications.

Transistor Element Material: SILICON

Silicon materials offer excellent thermal and electrical properties, ensuring reliable performance and longevity in diverse environments.

Maximum Drain Current (ID): 80 A

The maximum drain current rating of 80 A allows for substantial current handling, making this transistor suitable for high-power applications.

Maximum Drain-Source On Resistance: 0.0055 ohm

A low on-resistance of 0.0055 ohm translates to reduced power loss and enhanced efficiency during operation, contributing to overall system performance.

Terminal Position: SINGLE

Single terminal position facilitates straightforward integration into circuit designs, making it easier to work with during assembly and maintenance.

Case Connection: DRAIN

The drain connection configuration helps in good thermal management and easier layout on PCBs, contributing to improved device reliability.

Technical Specifications

Power Field Effect Transistors (FET) STU100N3LF3 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

500 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

30 V

Maximum Drain Current (Abs) (ID):

80 A

Maximum Drain Current (ID):

80 A

Maximum Drain-Source On Resistance:

.0055 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-251AA

JESD-30 Code:

R-PSIP-T3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

IN-LINE

Peak Reflow Temperature (C):

NOT SPECIFIED

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

320 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

NOT SPECIFIED

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STU100N3LF3 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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