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STU11NM60ND

STMicroelectronics

STU11NM60ND by STMicroelectronics

STU11NM60ND from STMicroelectronics is a powerful N-channel FET designed for switching applications. It features a 600V breakdown voltage, 10A max drain current, and operates at up to 150 °C. Ideal for high-efficiency power management in various electronic devices.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Vyrian

USA . 4,177 parts In-Stock

1+ parts

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4,177

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Anansix

USA . 2,447 parts In-Stock

1+ parts

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2,447

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Digiode

USA . 1,584 parts In-Stock

1+ parts

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1,584

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Distributors (Availability)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

IDEA Electronic Components Group

UK . 2,019 parts In-Stock

1+ parts

$0.543

100+ parts

-

1k+ parts

$0.489

10k+ parts

-

2,019

$0.543

-

$0.489

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MKK Technologies

India . 1,689 parts In-Stock

1+ parts

$1.021

100+ parts

-

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1,689

$1.021

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DigiPath Technology Company

USA . 1,689 parts In-Stock

1+ parts

$1.021

100+ parts

-

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10k+ parts

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1,689

$1.021

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AZTECH Wire

Italy . 315 parts In-Stock

1+ parts

$19.860

100+ parts

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315

$19.860

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Alle Elektronik GmbH

Germany . 3,863 parts In-Stock

1+ parts

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3,863

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Parana Technologies

USA . 1,300 parts In-Stock

1+ parts

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100+ parts

$0.649

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1,300

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$0.649

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Corphita

USA . 1,272 parts In-Stock

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1,272

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Overview

Unlock the power of efficiency with the STU11NM60ND from STMicroelectronics, a leader in innovative semiconductor solutions. This high-performance N-channel power FET excels in switching applications, delivering unparalleled reliability and robust performance. Ideal for demanding environments, it ensures optimized energy management in various industrial systems. Trust in STMicroelectronics’ commitment to quality and innovation, making this transistor a smart choice for your next project!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

This material provides durability and effective insulation, making the FET suitable for various environments.

Polarity or Channel Type: N-CHANNEL

N-channel FETs are typically more efficient than P-channel types, allowing for better performance in switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode simplifies circuit design, enabling protection against reverse current without additional components.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET ensures fast and reliable operation in various electronic circuits.

Minimum DS Breakdown Voltage: 600 V

A high breakdown voltage makes this FET suitable for high-voltage applications, ensuring safety and reliability.

Package Shape: RECTANGULAR

The rectangular shape aids in efficient space utilization on circuit boards, making it easier to incorporate into designs.

Terminal Form: THROUGH-HOLE

Through-hole terminals provide robust mechanical stability and ease of soldering, ensuring a strong connection.

Operating Mode: ENHANCEMENT MODE

Enhancement mode allows for lower power consumption and increases switching speed, making this FET efficient in operation.

Maximum Pulsed Drain Current (IDM): 40 A

The ability to handle high pulsed currents makes this FET suitable for dynamic load applications.

Avalanche Energy Rating (EAS): 200 mJ

A high avalanche energy rating indicates robustness against transient events, ensuring durability under unexpected conditions.

Maximum Drain Current (Abs) (ID): 10 A

This current handling capability ensures that the FET can manage substantial loads, optimizing performance in high-current applications.

No. of Terminals: 3

Having three terminals simplifies the design and wiring, reducing complexity in circuit layout.

Maximum Power Dissipation (Abs): 90 W

With high power dissipation, this FET can efficiently manage heat, reducing risks of overheating in high-power applications.

Package Style (Meter): IN-LINE

In-line package style facilitates easy integration into automated assembly processes.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOSFET technology provides high efficiency and lower gate drive power requirements, enhancing overall circuit performance.

Maximum Operating Temperature: 150 °C

A high operating temperature rating ensures reliability in harsh environments, making it suitable for a variety of applications.

Transistor Element Material: SILICON

Silicon is a well-established material for FETs, known for its excellent conductivity and reliability in semiconductor applications.

Maximum Drain Current (ID): 10 A

This specification reaffirms the ability of the FET to handle substantial current loads, ensuring effective functionality.

Maximum Drain-Source On Resistance: 0.45 ohm

Low on-resistance minimizes power loss during operation, enhancing energy efficiency in circuits.

Terminal Position: SINGLE

A single terminal position ensures straightforward circuit designs, streamlining the manufacturing process.

Technical Specifications

Power Field Effect Transistors (FET) STU11NM60ND attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

200 mJ

Minimum DS Breakdown Voltage:

600 V

Maximum Drain Current (Abs) (ID):

10 A

Maximum Drain Current (ID):

10 A

Maximum Drain-Source On Resistance:

.45 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-251

JESD-30 Code:

R-PSIP-T3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

IN-LINE

Peak Reflow Temperature (C):

NOT SPECIFIED

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

40 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

NOT SPECIFIED

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STU11NM60ND Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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