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STS3C2F80

STMicroelectronics

STS3C2F80 by STMicroelectronics

STS3C2F80 by STMicroelectronics is a versatile N-Channel and P-Channel FET designed for switching applications. It features an 80V breakdown voltage, max drain current of 3A, and operates at up to 150 °C. Ideal for compact electronic designs with its surface mount capability.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Digiode

USA . 4,770 parts In-Stock

1+ parts

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4,770

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Anansix

USA . 1,795 parts In-Stock

1+ parts

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1,795

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Vyrian

USA . 442 parts In-Stock

1+ parts

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442

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Distributors (Availability)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

IDEA Electronic Components Group

UK . 1,040 parts In-Stock

1+ parts

$1.648

100+ parts

-

1k+ parts

$1.483

10k+ parts

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1,040

$1.648

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$1.483

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MKK Technologies

India . 1,551 parts In-Stock

1+ parts

$3.098

100+ parts

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1,551

$3.098

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DigiPath Technology Company

USA . 1,551 parts In-Stock

1+ parts

$3.098

100+ parts

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1,551

$3.098

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Corphita

USA . 3,171 parts In-Stock

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3,171

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Parana Technologies

USA . 1,787 parts In-Stock

1+ parts

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100+ parts

$1.970

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1,787

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$1.970

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Overview

Unlock the potential of your designs with the STS3C2F80 from STMicroelectronics! This cutting-edge small signal FET delivers exceptional performance for switching applications, ensuring reliability and efficiency in every task. With a robust 80V breakdown voltage and high-temperature resilience, it excels where others falter. Partnering with a trusted leader like STMicroelectronics means you gain access to top-tier technology that enhances your products, driving innovation and value. Elevate your projects today!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy in the package ensures durability and protection from environmental factors, enhancing product longevity.

Polarity or Channel Type: N-CHANNEL AND P-CHANNEL

Having both N-channel and P-channel configurations allows for versatile applications in various circuit designs.

Configuration: SEPARATE, 2 ELEMENTS WITH BUILT-IN DIODE

The separate configuration with built-in diodes provides enhanced performance and simplifies circuit design.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET is optimized for reliable on/off control in electronic circuits.

Surface Mount: YES

Being surface mount compatible, it allows for efficient PCB space utilization and automated assembly processes.

Minimum DS Breakdown Voltage: 80 V

A breakdown voltage of 80V makes this product suitable for a variety of high-voltage applications.

Package Shape: RECTANGULAR

The rectangular shape is space-efficient, making it easier to integrate into compact designs.

Terminal Form: GULL WING

Gull wing terminals facilitate easy soldering, improving assembly reliability and reducing potential manufacturing issues.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation results in high efficiency and performance, making it suitable for modern applications.

No. of Elements: 2

Having two elements in a single package allows for more compact designs without sacrificing functionality.

Maximum Drain Current (Abs) (ID): 2 A

A maximum drain current capability of 2A allows the FET to handle higher loads suitable for various electronic applications.

No. of Terminals: 8

With 8 terminals, the FET provides ample connectivity options for various circuit configurations.

Maximum Power Dissipation (Abs): 2.5 W

The capability of dissipating up to 2.5W ensures the product operates reliably under demanding conditions.

Package Style (Meter): SMALL OUTLINE

A small outline package style contributes to a compact footprint, ideal for space-constrained applications.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Utilizing MOS technology offers high input impedance and low power consumption, enhancing circuit efficiency.

Maximum Operating Temperature: 150 °C

With a high maximum operating temperature, this FET is suitable for use in harsh environments without compromising performance.

Transistor Element Material: SILICON

Silicon as an element material guarantees good thermal stability and predictable performance characteristics.

Terminal Finish: NICKEL PALLADIUM GOLD

The nickel palladium gold finish ensures excellent electrical connectivity and resistance to corrosion, enhancing product reliability.

Maximum Drain Current (ID): 3 A

A maximum drain current of 3A makes this FET suitable for high-demand applications without risk of damage.

Maximum Drain-Source On Resistance: 0.08 ohm

With low on-resistance, this FET minimizes power losses and improves efficiency in switching applications.

Terminal Position: DUAL

Dual terminal positioning allows for flexible design options, accommodating various layout requirements.

Technical Specifications

Small Signal Field Effect Transistors (FET) STS3C2F80 attributes and parameters. Explore more Small Signal Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Minimum DS Breakdown Voltage:

80 V

Maximum Drain Current (Abs) (ID):

2 A

Maximum Drain Current (ID):

3 A

Maximum Drain-Source On Resistance:

.08 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PDSO-G8

JESD-609 Code:

e4

Moisture Sensitivity Level (MSL):

1

No. of Elements:

2

No. of Terminals:

8

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Qualification:

Not Qualified

Sub-Category:

Other Transistors

Surface Mount:

YES

Terminal Finish:

NICKEL PALLADIUM GOLD

Terminal Form:

GULL WING

Terminal Position:

DUAL

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STS3C2F80 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

Category top products 20

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