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STS12NH3LL

STMicroelectronics

STS12NH3LL by STMicroelectronics

STS12NH3LL by STMicroelectronics is an N-channel MOSFET designed for efficient switching applications. It features a max drain current of 12 A, a breakdown voltage of 30 V, and operates at up to 150 °C. Ideal for compact power management in electronic devices.

Median Price

$0.288

Lifecycle Status

Suppliers In-Stock

8

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Bristol Electronics

USA . 7,584 parts In-Stock

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NexGen Digital

USA . 2,660 parts In-Stock

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2,660

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Vyrian

USA . 2,489 parts In-Stock

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2,489

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Anansix

USA . 1,543 parts In-Stock

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1,543

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Dan-Mar Components

USA . 1,479 parts In-Stock

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1,479

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Linux4Media Gmbh

Germany . 620 parts In-Stock

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$0.288

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620

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Digiode

USA . 251 parts In-Stock

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Electronics Depot

USA . 50 parts In-Stock

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50

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IDEA Electronic Components Group

UK . 2,189 parts In-Stock

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$0.846

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$0.762

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$0.762

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MKK Technologies

India . 1,428 parts In-Stock

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$1.592

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$1.592

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DigiPath Technology Company

USA . 1,428 parts In-Stock

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$1.592

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1,428

$1.592

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AZTECH Wire

Italy . 802 parts In-Stock

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$20.260

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802

$20.260

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Alle Elektronik GmbH

Germany . 3,145 parts In-Stock

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Kepictronics

USA . 2,442 parts In-Stock

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Assy Fe

Spain . 2,442 parts In-Stock

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Parana Technologies

USA . 1,192 parts In-Stock

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$1.012

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Corphita

USA . 1,014 parts In-Stock

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Overview

Elevate your projects with the STS12NH3LL from STMicroelectronics, a leader in innovative semiconductor solutions. This N-Channel Power FET is designed for superior efficiency and reliability in switching applications, ensuring optimal performance in compact designs. Crafted with precision, its robust features promise durability under high demands, making it ideal for everything from consumer electronics to industrial controls. Experience enhanced value and peace of mind with ST's trusted quality, empowering you to bring your visions to life!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of PLASTIC/EPOXY enhances durability and provides good insulation, making it suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-CHANNEL FETs are known for better efficiency and higher speed, making this product ideal for high-performance applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode simplifies design and provides protection against reverse polarity inadvertently applied in circuits.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET ensures fast operation and effective control in various electronic circuits.

Surface Mount: YES

Surface mount technology allows for compact designs and easy integration into modern electronic devices.

Minimum DS Breakdown Voltage: 30 V

A minimum breakdown voltage of 30V makes this FET suitable for various applications requiring reliable voltage handling.

Package Shape: RECTANGULAR

The rectangular package shape allows for efficient layout and placement on circuits, optimizing space and performance.

Terminal Form: GULL WING

Gull wing terminals facilitate easy soldering and ensure secure connections during assembly.

Operating Mode: ENHANCEMENT MODE

Enhancement mode provides higher efficiency and is preferred in applications where dynamic performance is critical.

Maximum Pulsed Drain Current (IDM): 48 A

A high pulsed drain current capacity makes this FET suitable for high-demand applications, ensuring reliable operation under stress.

Maximum Drain Current (Abs) (ID): 12 A

With a maximum drain current of 12 A, it can handle significant loads, making it versatile for power applications.

No. of Terminals: 8

Having 8 terminals provides versatile connection options, enhancing circuit design flexibility.

Maximum Power Dissipation (Abs): 2.5 W

With a power dissipation rating of 2.5 W, this FET can manage heat effectively, contributing to overall reliability.

Package Style (Meter): SMALL OUTLINE

The small outline package style is ideal for space-constrained applications, making it a good choice for modern devices.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

This technology ensures lower power consumption and better performance compared to other transistor types.

Maximum Operating Temperature: 150 °C

A high maximum operating temperature makes this product effective in demanding environments without performance degradation.

Transistor Element Material: SILICON

Silicon is a standard material offering excellent electrical characteristics and reliability, making this transistor a trustworthy choice.

Terminal Finish: NICKEL PALLADIUM GOLD

The nickel-palladium-gold finish enhances corrosion resistance and ensures better solderability, ensuring long-term performance.

Maximum Drain Current (ID): 12 A

Reiterating the maximum drain current of 12 A ensures adequate capacity for various power applications.

Maximum Drain-Source On Resistance: 0.013 ohm

A low on-resistance characteristic minimizes power loss in the transistor, leading to higher efficiency in switch applications.

Terminal Position: DUAL

Dual terminal positioning allows for improved design configurations, offering flexibility in circuit design.

Maximum Time At Peak Reflow Temperature (s): 40

This specification ensures compatibility with modern soldering processes, facilitating reliable assembly in production.

Peak Reflow Temperature °C: 260

A peak reflow temperature of 260 °C indicates high thermal resilience, ensuring the component can withstand soldering processes without damage.

Technical Specifications

Power Field Effect Transistors (FET) STS12NH3LL attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Additional Features:

LOW THRESHOLD

Minimum DS Breakdown Voltage:

30 V

Maximum Drain Current (Abs) (ID):

12 A

Maximum Drain Current (ID):

12 A

Maximum Drain-Source On Resistance:

.013 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PDSO-G8

JESD-609 Code:

e4

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

8

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

48 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

NICKEL PALLADIUM GOLD

Terminal Form:

GULL WING

Terminal Position:

DUAL

Maximum Time At Peak Reflow Temperature (s):

40

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STS12NH3LL Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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