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STP8NM60N

STMicroelectronics

STP8NM60N by STMicroelectronics

STP8NM60N by STMicroelectronics is an N-channel MOSFET ideal for switching applications. It features a 600V breakdown voltage, 28A pulsed drain current, and operates at up to 150 °C. Its compact design ensures efficient power management in various electronic circuits.

Median Price

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7

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1k+

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Chip Stock

USA . 4,737 parts In-Stock

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Vyrian

USA . 3,635 parts In-Stock

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Digiode

USA . 3,067 parts In-Stock

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Anansix

USA . 735 parts In-Stock

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ComSIT Distribution GmbH

Germany . 129 parts In-Stock

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PC Components Company LLC

USA . 50 parts In-Stock

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Bristol Electronics

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IDEA Electronic Components Group

UK . 1,821 parts In-Stock

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$0.296

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$0.267

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MKK Technologies

India . 158 parts In-Stock

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$0.557

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DigiPath Technology Company

USA . 158 parts In-Stock

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AZTECH Wire

Italy . 40 parts In-Stock

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$21.080

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Metaverse IC Inc.

Canada . 56,986 parts In-Stock

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Alle Elektronik GmbH

Germany . 4,178 parts In-Stock

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QUARKTWIN TECHNOLOGY LTD

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Authorized Procurement Solutions

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Corphita

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Parana Technologies

USA . 1,983 parts In-Stock

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Overview

Unlock exceptional performance with the STP8NM60N from STMicroelectronics, a leader in cutting-edge semiconductor solutions. This robust N-channel power FET delivers reliability and efficiency for various switching applications, making it ideal for power management systems. Experience reduced energy loss and enhanced device longevity while benefiting from ST's commitment to quality and innovation. Elevate your projects with this essential component that combines superior technology and trusted expertise!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy provides a lightweight and durable casing, ensuring reliability in various operating conditions.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically offer lower on-resistance and better drive capability, making them more efficient for high-power applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode enhances protection and simplifies the circuit design, making it easier to implement in switching applications.

Transistor Application: SWITCHING

Optimized for switching applications, this FET can efficiently control high currents, suitable for various power management tasks.

Minimum DS Breakdown Voltage: 600 V

A high breakdown voltage ensures that the FET can operate safely under high voltage conditions, enhancing system reliability.

Package Shape: RECTANGULAR

Rectangular packaging is space-efficient, allowing for compact designs in circuit boards without compromising performance.

Terminal Form: THROUGH-HOLE

Through-hole terminals provide secure mounting and stable electrical connections, ideal for high-reliability applications.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation allows for low gate drive requirements, providing flexibility and efficiency in circuit designs.

Maximum Pulsed Drain Current (IDM): 28 A

With a high pulsed current rating, this FET can handle transient loads effectively, making it suitable for dynamic power applications.

Avalanche Energy Rating (EAS): 200 mJ

A robust avalanche energy rating indicates strong resistance to voltage spikes, contributing to greater durability in harsh environments.

Maximum Drain Current (Abs) (ID): 7 A

High maximum drain current specification ensures that the FET can manage significant loads, crucial for heavy-duty applications.

No. of Terminals: 3

Three terminals simplify the device connection and integration into circuits, ensuring versatile application in various designs.

Maximum Power Dissipation (Abs): 70 W

A high power dissipation rating allows for efficient heat management, reducing the risk of thermal failure in demanding environments.

Package Style (Meter): FLANGE MOUNT

Flange mount design offers ease of installation and robust mechanical stability for reliable long-term performance.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOSFET technology provides high switching speeds and lower power consumption, making it ideal for energy-efficient applications.

Maximum Operating Temperature: 150 °C

Withstand high temperatures, this FET is suitable for applications in harsh environments without compromising reliability.

Transistor Element Material: SILICON

Silicon materials in FETs ensure superior performance and reliability, which are critical for long-term operation in power applications.

Terminal Finish: MATTE TIN

Matte tin terminal finishes provide excellent solderability, ensuring reliable connections and better overall device performance.

Maximum Drain Current (ID): 7 A

A second listing of the maximum drain current emphasizes the product's capacity to handle heavy loads efficiently.

Maximum Drain-Source On Resistance: 0.65 ohm

Low on-resistance translates to lower power losses when the device is in the 'on' state, enhancing overall system efficiency.

Terminal Position: SINGLE

Single terminal position allows straightforward integration into designs, making it easier for engineers to use in various applications.

Technical Specifications

Power Field Effect Transistors (FET) STP8NM60N attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Additional Features:

AVALANCHE RATED

Avalanche Energy Rating (EAS):

200 mJ

Minimum DS Breakdown Voltage:

600 V

Maximum Drain Current (Abs) (ID):

7 A

Maximum Drain Current (ID):

7 A

Maximum Drain-Source On Resistance:

.65 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-220AB

JESD-30 Code:

R-PSFM-T3

JESD-609 Code:

e3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

28 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

MATTE TIN

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STP8NM60N Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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