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STI30NM50N

STMicroelectronics

STI30NM50N by STMicroelectronics

STI30NM50N by STMicroelectronics is an N-channel FET ideal for switching applications, featuring a 500V breakdown voltage and 27A max drain current. It offers high efficiency with a low on-resistance of 0.115Ω and can handle up to 190W power dissipation. This versatile transistor operates in enhancement mode, suitable for various electronic circuits.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Vyrian

USA . 2,368 parts In-Stock

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2,368

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Digiode

USA . 1,585 parts In-Stock

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1,585

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Anansix

USA . 1,533 parts In-Stock

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1,533

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Distributors (Availability)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

IDEA Electronic Components Group

UK . 419 parts In-Stock

1+ parts

$0.746

100+ parts

-

1k+ parts

$0.672

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419

$0.746

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$0.672

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MKK Technologies

India . 472 parts In-Stock

1+ parts

$1.403

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472

$1.403

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DigiPath Technology Company

USA . 472 parts In-Stock

1+ parts

$1.403

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472

$1.403

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Parana Technologies

USA . 1,684 parts In-Stock

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$0.892

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1,684

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$0.892

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Corphita

USA . 694 parts In-Stock

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694

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Overview

Unlock unparalleled performance with the STI30NM50N from STMicroelectronics! Engineered for excellence, this N-channel Power FET delivers superior switching efficiency and reliability, making it ideal for demanding applications in power management and industrial systems. Trust in STMicroelectronics' legacy of innovation to enhance your designs, offering exceptional durability and thermal performance that translates to reduced costs and increased productivity. Elevate your projects with quality you can depend on!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy body material provides durability and resistance to environmental factors, making it suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs generally provide lower on-resistance and higher efficiency, making this transistor a good choice for power applications.

Configuration: SINGLE WITH BUILT-IN DIODE

Having a built-in diode enhances versatility, allowing for improved protection against reverse current and simplifying circuit design.

Transistor Application: SWITCHING

Designed for switching applications, this FET enables efficient control of power in various electronic circuits.

Minimum DS Breakdown Voltage: 500 V

A high breakdown voltage guarantees reliability and robustness in high-voltage applications.

Package Shape: RECTANGULAR

The rectangular package shape optimizes space on PCBs, facilitating compact designs without sacrificing performance.

Terminal Form: THROUGH-HOLE

Through-hole terminals provide stable connections that are ideal for high-power and high-current applications.

Operating Mode: ENHANCEMENT MODE

Enhancement mode allows for better control of the channel, contributing to lower power consumption during operation.

Maximum Pulsed Drain Current (IDM): 108 A

The high pulsed drain current capacity enhances this FET's ability to handle peak loads efficiently.

Avalanche Energy Rating (EAS): 900 mJ

A high avalanche energy rating ensures protection against transient voltage spikes, improving device reliability.

Maximum Drain Current (Abs) (ID): 27 A

Supporting a maximum drain current of 27 A keeps this FET effective for high-power applications.

No. of Terminals: 3

The 3-terminal configuration simplifies the circuit design while ensuring efficient control and signal processing.

Maximum Power Dissipation (Abs): 190 W

With a high power dissipation rating, this FET manages thermal performance exceptionally well, extending operational life.

Package Style (Meter): IN-LINE

The in-line package style offers ease of installation and integration into various systems, enhancing versatility.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology provides advantages like low power consumption and high-speed switching, making this FET highly efficient.

Maximum Operating Temperature: 150 °C

Operating at high temperatures allows for use in demanding environments without performance degradation.

Transistor Element Material: SILICON

Silicon as the element material ensures reliability and excellent electrical performance, being the standard choice in power transistors.

Terminal Finish: Matte Tin (Sn)

The matte tin finish enhances solderability and provides good corrosion resistance, ensuring longevity in various applications.

Maximum Drain Current (ID): 27 A

Consistent maximum drain current specifications highlight the FET's capability in handling power efficiently.

Maximum Drain-Source On Resistance: 0.115 ohm

The low on-resistance translates to improved power efficiency and reduced heat generation during operation.

Terminal Position: SINGLE

A single terminal position facilitates straightforward connections, which is crucial for simpler circuit designs.

Case Connection: ISOLATED

Isolated case connections prevent short circuits and improve overall safety in high-voltage applications.

Technical Specifications

Power Field Effect Transistors (FET) STI30NM50N attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

900 mJ

Case Connection:

ISOLATED

Minimum DS Breakdown Voltage:

500 V

Maximum Drain Current (Abs) (ID):

27 A

Maximum Drain Current (ID):

27 A

Maximum Drain-Source On Resistance:

.115 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-262AA

JESD-30 Code:

R-PSIP-T3

JESD-609 Code:

e3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

IN-LINE

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

108 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

Matte Tin (Sn)

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STI30NM50N Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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