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STF4N150

STMicroelectronics

STF4N150 by STMicroelectronics

STF4N150 by STMicroelectronics is an N-channel FET designed for switching applications. It features a 1500V breakdown voltage, 12A max pulsed drain current, and operates at up to 150 °C. Ideal for high-power circuits, it ensures efficient performance in compact designs.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Vyrian

USA . 2,879 parts In-Stock

1+ parts

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2,879

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Anansix

USA . 2,827 parts In-Stock

1+ parts

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2,827

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Digiode

USA . 2,066 parts In-Stock

1+ parts

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2,066

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Distributors (Availability)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

IDEA Electronic Components Group

UK . 1,851 parts In-Stock

1+ parts

$1.486

100+ parts

-

1k+ parts

$1.337

10k+ parts

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1,851

$1.486

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$1.337

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MKK Technologies

India . 1,721 parts In-Stock

1+ parts

$2.794

100+ parts

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1,721

$2.794

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DigiPath Technology Company

USA . 1,721 parts In-Stock

1+ parts

$2.794

100+ parts

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10k+ parts

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1,721

$2.794

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Corphita

USA . 1,321 parts In-Stock

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1,321

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Parana Technologies

USA . 845 parts In-Stock

1+ parts

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100+ parts

$1.776

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845

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$1.776

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Overview

Unlock unparalleled efficiency with the STF4N150 from STMicroelectronics, a leader in innovative semiconductor solutions. This high-performance power FET delivers exceptional reliability and robust performance for your switching applications. Engineered with precision, it excels in demanding environments, offering superior voltage handling and thermal stability. Trust in STMicroelectronics to enhance your projects with cutting-edge technology that drives value and maximizes productivity.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy for the package body ensures durability and reliability in various environmental conditions, making it suitable for a wide range of applications.

Polarity or Channel Type: N-CHANNEL

N-channel configuration allows for better electron mobility, leading to improved efficiency and performance in switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

Having a built-in diode provides additional protection and simplifies circuit design, making it easier to use in applications that require fast switching.

Transistor Application: SWITCHING

Designed specifically for switching applications ensures optimal performance in high-speed electronic systems.

Minimum DS Breakdown Voltage: 1500 V

With a high breakdown voltage, this FET can handle significant voltage levels, thus enhancing reliability in high-voltage applications.

Package Shape: RECTANGULAR

The rectangular package shape is ideal for efficient thermal dissipation and optimization in circuit layouts.

Terminal Form: THROUGH-HOLE

Through-hole terminals provide strong mechanical stability and are easier to solder, making the assembly process more straightforward.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation allows for lower power consumption in idle states, contributing to overall energy efficiency in the circuit.

Maximum Pulsed Drain Current (IDM): 12 A

The ability to handle a higher pulsed drain current enhances versatility and can accommodate peak demands in various applications.

Maximum Drain Current (Abs) (ID): 4 A

With a maximum drain current rating of 4 A, the FET can operate effectively in typical applications without overheating.

No. of Terminals: 3

Having three terminals allows for straightforward connections in a variety of circuit designs, facilitating easier integration.

Maximum Power Dissipation (Abs): 40 W

A high power dissipation rating ensures that the transistor can handle significant power loads without failure, making it suitable for robust applications.

Package Style (Meter): FLANGE MOUNT

Flange mount style allows for stable mounting options, ensuring secure placement in systems and improved heat management.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

The MOS technology utilized in this FET provides high input impedance and low power consumption, elevating performance in precision circuits.

Maximum Operating Temperature: 150 °C

A high maximum operating temperature indicates that the FET can function reliably even in demanding environments.

Transistor Element Material: SILICON

Silicon as the base material offers excellent electrical properties, ensuring optimal performance and durability in various applications.

Maximum Drain Current (ID): 4 A

This repeating spec reinforces the ability to handle up to 4 A, confirming suitability for reliable performance in many standard applications.

Maximum Drain-Source On Resistance: 7 ohm

A low on-resistance value reduces power losses during operation, contributing to improved efficiency and thermal management in circuits.

Terminal Position: SINGLE

The single terminal position simplifies circuit design and layout, making it user-friendly for engineers and designers.

Technical Specifications

Power Field Effect Transistors (FET) STF4N150 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Minimum DS Breakdown Voltage:

1500 V

Maximum Drain Current (Abs) (ID):

4 A

Maximum Drain Current (ID):

4 A

Maximum Drain-Source On Resistance:

7 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-220AB

JESD-30 Code:

R-PSFM-T3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

12 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STF4N150 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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