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STB40N20

STMicroelectronics

STB40N20 by STMicroelectronics

STB40N20 by STMicroelectronics is a robust N-channel FET designed for efficient switching applications. It features a max drain current of 40 A, breakdown voltage of 200 V, and power dissipation up to 160 W. Ideal for high-performance power management in compact designs.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Vyrian

USA . 3,451 parts In-Stock

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3,451

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Anansix

USA . 1,964 parts In-Stock

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1,964

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Digiode

USA . 947 parts In-Stock

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947

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Distributors (Availability)

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IDEA Electronic Components Group

UK . 1,931 parts In-Stock

1+ parts

$1.010

100+ parts

-

1k+ parts

$0.909

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1,931

$1.010

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$0.909

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MKK Technologies

India . 1,842 parts In-Stock

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$1.900

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1,842

$1.900

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DigiPath Technology Company

USA . 1,842 parts In-Stock

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$1.900

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1,842

$1.900

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AZTECH Wire

Italy . 1,176 parts In-Stock

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$14.950

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1,176

$14.950

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Component Stockers USA

USA . 316 parts In-Stock

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$99.990

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316

$99.990

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Kepictronics

USA . 13,000 parts In-Stock

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13,000

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A-Z Elektronik GmbH

Germany . 6,315 parts In-Stock

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6,315

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Alle Elektronik GmbH

Germany . 3,659 parts In-Stock

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3,659

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Parana Technologies

USA . 1,537 parts In-Stock

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$1.208

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1,537

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$1.208

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Corphita

USA . 867 parts In-Stock

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867

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Overview

Elevate your projects with the STB40N20 from STMicroelectronics, a trusted leader in semiconductor innovation. This powerful N-channel FET delivers outstanding performance for switching applications, ensuring reliability in demanding environments. With its robust design and efficient energy management, the STB40N20 minimizes losses while maximizing output, making it ideal for industrial and consumer electronics. Choose STMicroelectronics for quality you can depend on!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy ensures excellent durability and protection against environmental factors, making this FET suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel transistors are generally preferred for their efficiency and lower on-resistance, helping to improve power management in circuits.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode enhances the transistor's versatility by providing protection against reverse polarity in switching applications.

Transistor Application: SWITCHING

Designed for switching applications, this FET offers fast response times, making it ideal for power control in electronic devices.

Surface Mount: YES

Surface mount technology allows for compact designs and automated assembly, leading to lower manufacturing costs and better performance in dense applications.

Minimum DS Breakdown Voltage: 200 V

A high breakdown voltage increases reliability, allowing the FET to operate effectively in high-voltage environments.

Package Shape: RECTANGULAR

The rectangular shape facilitates easy integration into circuit boards, optimizing layout and space efficiency.

Terminal Form: GULL WING

Gull wing terminals provide stable solder connections, ensuring reliable electrical performance and mechanical robustness.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs offer high input impedance and low power consumption, contributing to efficient circuit designs.

Maximum Pulsed Drain Current (IDM): 160 A

With a high pulsed drain current capability, this FET can handle demanding transient loads, making it suitable for high-power applications.

Avalanche Energy Rating (EAS): 230 mJ

A good avalanche energy rating indicates that the FET can handle energy spikes without breakdown, enhancing system reliability.

Maximum Drain Current (Abs) (ID): 40 A

This high maximum drain current allows for robust performance in applications requiring substantial load handling.

No. of Terminals: 2

A simple two-terminal design promotes ease of use and integration into various circuit topologies.

Maximum Power Dissipation (Abs): 160 W

High power dissipation capacity means that this FET can manage significant thermal loads, contributing to overall system longevity.

Package Style (Meter): SMALL OUTLINE

Small outline packages save space, allowing more compact designs in electronic systems.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology provides high efficiency and versatility, making this FET suitable for a range of applications.

Maximum Operating Temperature: 150 °C

A high maximum operating temperature allows the FET to function in demanding environments, increasing its application range.

Transistor Element Material: SILICON

Silicon offers good electrical properties and is widely available, making it a reliable choice for power transistors.

Terminal Finish: Matte Tin (Sn)

The matte tin finish enhances solderability and improves long-term reliability in various operating conditions.

Maximum Drain Current (ID): 40 A

This reputable current rating supports versatility in various applications requiring reliable power switching.

Maximum Drain-Source On Resistance: 0.045 ohm

Low on-resistance minimizes power loss when the FET is in operation, improving efficiency and thermal performance.

Terminal Position: SINGLE

A single terminal position simplifies circuit design and reduces the complexity of PCB layout.

Case Connection: DRAIN

DRAIN case connection simplifies integration into circuits targeting efficient power routing.

Technical Specifications

Power Field Effect Transistors (FET) STB40N20 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

230 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

200 V

Maximum Drain Current (Abs) (ID):

40 A

Maximum Drain Current (ID):

40 A

Maximum Drain-Source On Resistance:

.045 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

160 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

Matte Tin (Sn)

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STB40N20 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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