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STB200NF04L

STMicroelectronics

STB200NF04L by STMicroelectronics

STB200NF04L by STMicroelectronics is a high-performance N-channel FET designed for efficient switching applications. It features a max drain current of 120 A, a breakdown voltage of 40 V, and operates at up to 175 °C. Ideal for power management in compact designs.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

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Vyrian

USA . 7,866 parts In-Stock

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Digiode

USA . 358 parts In-Stock

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358

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Anansix

USA . 252 parts In-Stock

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252

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IDEA Electronic Components Group

UK . 534 parts In-Stock

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$0.917

100+ parts

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$0.826

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534

$0.917

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$0.826

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MKK Technologies

India . 637 parts In-Stock

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$1.725

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637

$1.725

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DigiPath Technology Company

USA . 637 parts In-Stock

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$1.725

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637

$1.725

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AZTECH Wire

Italy . 715 parts In-Stock

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$16.890

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715

$16.890

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Kepictronics

USA . 13,000 parts In-Stock

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13,000

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Perfect Parts

USA . 12,510 parts In-Stock

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Corphita

USA . 3,614 parts In-Stock

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Authorized Procurement Solutions

USA . 3,500 parts In-Stock

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3,500

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Alle Elektronik GmbH

Germany . 3,293 parts In-Stock

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3,293

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Parana Technologies

USA . 1,294 parts In-Stock

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$1.097

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1,294

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$1.097

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Overview

Unlock unparalleled performance with the STB200NF04L from STMicroelectronics, a leader in power technology. This N-channel FET is engineered for efficiency and reliability, making it ideal for high-demand applications like power management and automotive systems. Its compact design and exceptional power handling ensure seamless integration into your projects, while ST's commitment to quality guarantees durability and peace of mind. Elevate your designs with this robust solution!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy ensures lightweight and durable construction, making it suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically provide higher efficiency and better performance, making them ideal for high-speed switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode enhances protection and reduces PCB space requirements, simplifying design and improving reliability.

Transistor Application: SWITCHING

Optimized for switching applications, this FET can handle fast transitions, making it excellent for modern power management systems.

Surface Mount: YES

Surface mount capability allows for compact designs and automated assembly, contributing to cost-effective manufacturing.

Minimum DS Breakdown Voltage: 40 V

A minimum breakdown voltage of 40 V provides ample margin for safeguarding against voltage spikes in various circuits.

Package Shape: RECTANGULAR

The rectangular package shape is conducive for better thermal management and efficient PCB layout.

Terminal Form: GULL WING

Gull wing terminals facilitate easy soldering and provide reliable connections, reducing assembly time.

Operating Mode: ENHANCEMENT MODE

The enhancement mode allows for improved electrical characteristics, leading to better performance in power applications.

Maximum Pulsed Drain Current (IDM): 480 A

A high pulsed drain current capability (480 A) ensures that this FET can handle demanding transient situations without failure.

Avalanche Energy Rating (EAS): 1400 mJ

A high avalanche energy rating provides improved reliability under fault conditions, making it suitable for robust applications.

Maximum Drain Current (Abs) (ID): 120 A

With a maximum drain current rating of 120 A, this FET is suitable for high-power applications and ensures reliable performance.

No. of Terminals: 2

With only two terminals, this design minimizes signal path lengths, enhancing performance in switching applications.

Maximum Power Dissipation (Abs): 300 W

The ability to dissipate up to 300 W of power ensures that this transistor can handle significant loads without overheating.

Package Style (Meter): SMALL OUTLINE

The small outline package style optimizes space on the PCB, allowing for more compact circuit designs.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology enables high input impedance and low power consumption, which are critical in modern electronics.

Maximum Operating Temperature: 175 °C

A high maximum operating temperature of 175 °C ensures reliability in harsh conditions, making this FET suitable for a wide range of applications.

Transistor Element Material: SILICON

Silicon is the most widely used semiconductor material, providing a favorable balance of performance, cost, and availability.

Terminal Finish: MATTE TIN

The matte tin finish enhances solderability and corrosion resistance, leading to improved connection reliability.

Maximum Drain Current (ID): 120 A

Reiterating the robust capabilities with a rated maximum drain current of 120 A, enhancing suitability for high-demand applications.

Maximum Drain-Source On Resistance: 0.0046 ohm

A low on-resistance ensures minimal power loss and heat generation during operation, improving overall efficiency.

Terminal Position: SINGLE

Single terminal positioning simplifies layout and design, making this FET suitable for space-constrained applications.

Technical Specifications

Power Field Effect Transistors (FET) STB200NF04L attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

1400 mJ

Minimum DS Breakdown Voltage:

40 V

Maximum Drain Current (Abs) (ID):

120 A

Maximum Drain Current (ID):

120 A

Maximum Drain-Source On Resistance:

.0046 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

480 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

MATTE TIN

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STB200NF04L Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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