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STB14NM65N

STMicroelectronics

STB14NM65N by STMicroelectronics

STB14NM65N by STMicroelectronics is a robust N-channel FET designed for efficient switching applications. It features a 650V breakdown voltage, 12A max drain current, and operates at up to 150 °C. Ideal for power management in compact electronic devices.

Median Price

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Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Vyrian

USA . 4,200 parts In-Stock

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4,200

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Digiode

USA . 3,552 parts In-Stock

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3,552

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Anansix

USA . 2,197 parts In-Stock

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2,197

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Distributors (Availability)

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IDEA Electronic Components Group

UK . 8 parts In-Stock

1+ parts

$1.387

100+ parts

-

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$1.249

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8

$1.387

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$1.249

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MKK Technologies

India . 1,506 parts In-Stock

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$2.609

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1,506

$2.609

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DigiPath Technology Company

USA . 1,506 parts In-Stock

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$2.609

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1,506

$2.609

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AZTECH Wire

Italy . 293 parts In-Stock

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$20.110

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293

$20.110

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A-Z Elektronik GmbH

Germany . 7,413 parts In-Stock

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Kepictronics

USA . 5,000 parts In-Stock

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Corphita

USA . 4,941 parts In-Stock

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4,941

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Alle Elektronik GmbH

Germany . 3,211 parts In-Stock

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3,211

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Perfect Parts

USA . 1,900 parts In-Stock

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1,900

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Parana Technologies

USA . 1,349 parts In-Stock

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$1.659

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1,349

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$1.659

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Overview

Unlock the power of efficiency with the STB14NM65N by STMicroelectronics—a robust N-channel power FET designed for superior performance in demanding applications. Renowned for its quality and reliability, STMicroelectronics ensures that this versatile transistor excels in switching operations across various industries. With its compact design and built-in diode, it delivers exceptional power management, empowering your projects with unmatched durability and efficiency. Choose STB14NM65N for a smarter, more reliable solution!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of durable plastic/epoxy in the package ensures reliable performance and protection against environmental factors.

Polarity or Channel Type: N-CHANNEL

N-channel FETs generally offer higher electron mobility, resulting in better efficiency and performance in switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode enhances the device's versatility and simplifies circuit design by eliminating the need for additional components.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET is optimized for fast on/off operations, making it ideal for power management.

Surface Mount: YES

Surface mount capability allows for compact designs and automated assembly, reducing manufacturing costs and increasing reliability.

Minimum DS Breakdown Voltage: 650 V

A high breakdown voltage of 650V ensures that the transistor can handle high voltage applications, providing reliability in demanding conditions.

Package Shape: RECTANGULAR

The rectangular package shape optimizes space utilization on PCB layouts, facilitating efficient circuit designs.

Terminal Form: GULL WING

Gull wing terminals offer easy handling and excellent solderability, simplifying the assembly process.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation enables better control of the channel, leading to improved conductivity and efficiency.

Maximum Pulsed Drain Current (IDM): 48 A

A maximum pulsed drain current of 48A allows for high performance in transient conditions, ensuring stable operation in peak load scenarios.

Avalanche Energy Rating (EAS): 300 mJ

A high avalanche energy rating suggests robust protection against voltage spikes, enhancing the overall durability of the device.

Maximum Drain Current (Abs) (ID): 12 A

The maximum absolute drain current of 12A supports a range of applications, balancing current handling with thermal efficiency.

No. of Terminals: 2

The simple 2-terminal design reduces complexity in circuit layout while providing essential electrical connections.

Maximum Power Dissipation (Abs): 125 W

A maximum power dissipation of 125W allows for effective heat management, minimizing thermal stress during operation.

Package Style (Meter): SMALL OUTLINE

The small outline package style contributes to space-saving designs, making it suitable for compact electronic devices.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology results in lower on-resistance and higher efficiency, making it ideal for low-power and high-speed applications.

Maximum Operating Temperature: 150 °C

With a maximum operating temperature of 150 °C, the transistor can perform reliably in high-temperature environments.

Transistor Element Material: SILICON

Silicon as the element material provides good thermal conductivity and stability, ensuring consistent performance.

Terminal Finish: MATTE TIN

A matte tin finish enhances solderability and protects against oxidation, ensuring reliable electrical connections.

Maximum Drain-Source On Resistance: 0.38 ohm

Low on-resistance helps minimize power losses, improving overall efficiency and thermal management in applications.

Terminal Position: SINGLE

The single terminal position simplifies device integration into circuits and assists in achieving high-density layouts.

Maximum Time At Peak Reflow Temperature: 30 s

Supported peak reflow temperature and time allow for compatibility with standard soldering processes, ensuring reliable assembly.

Peak Reflow Temperature: 245 °C

The high peak reflow temperature indicates robust thermal capability, ensuring that the device withstands manufacturing processes without damage.

Technical Specifications

Power Field Effect Transistors (FET) STB14NM65N attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

300 mJ

Minimum DS Breakdown Voltage:

650 V

Maximum Drain Current (Abs) (ID):

12 A

Maximum Drain Current (ID):

12 A

Maximum Drain-Source On Resistance:

.38 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-263AB

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

245

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

48 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

MATTE TIN

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STB14NM65N Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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