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NTLTD7900NR2G

Onsemi

NTLTD7900NR2G by Onsemi

NTLTD7900NR2G by Onsemi is an N-CHANNEL FET with 20V DS breakdown voltage, 30A IDM, and 0.026 ohm RDS(on). Commonly used for switching applications in a small outline package style.

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2

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1k+

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Vyrian

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Digiode

USA . 1,063 parts In-Stock

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TANS Electronics

Latvia . 6,098 parts In-Stock

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Kulean Microsystems

USA . 4,059 parts In-Stock

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Problanco Electronics

Mexico . 3,986 parts In-Stock

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Corphita

USA . 1,132 parts In-Stock

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SupplyDigital Components

Austria . 770 parts In-Stock

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Corohmni

South Africa . 339 parts In-Stock

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UHIMA Technologies

Türkiye . 18 parts In-Stock

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Overview

Power up your devices with the NTLTD7900NR2G by Onsemi, a high-quality Power Field Effect Transistor designed for switching applications. With its common drain configuration, built-in diode and resistor, this N-CHANNEL transistor offers unparalleled performance and reliability. Perfect for a wide range of electronic applications, this surface-mount transistor provides a maximum pulsing drain current of 30A and a minimum DS breakdown voltage of 20V. Trust in Onsemi's reputation for excellence and elevate your projects with the NTLTD7900NR2G today.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy material used in the package body provides durability and protects the internal components of the transistor, making it ideal for long-term use in various applications.

Polarity or Channel Type: N-CHANNEL

The N-channel polarity allows for efficient switching and control of current flow, making this transistor suitable for a wide range of power electronics applications.

Configuration: COMMON DRAIN, 2 ELEMENTS WITH BUILT-IN DIODE AND RESISTOR

The common drain configuration, along with the built-in diode and resistor elements, offers enhanced performance and reliability in switching applications, making it a versatile choice for various circuit designs.

Transistor Application: SWITCHING

Designed specifically for switching applications, this transistor provides fast and efficient current handling capabilities, making it a reliable choice for power control and management in electronic circuits.

Surface Mount: YES

Being surface mountable simplifies the assembly process and allows for compact and space-efficient circuit designs, making this transistor suitable for use in modern electronic devices with limited space constraints.

Maximum Drain-Source On Resistance: 0.026 ohm

The low on-resistance of 0.026 ohm results in minimal power loss and improved efficiency during operation, making this transistor an excellent choice for high-performance power management applications.

Maximum Operating Temperature: 150 °C

With a high maximum operating temperature of 150 °C, this transistor can withstand elevated temperatures without compromising performance, ensuring reliable operation in demanding environments.

Technical Specifications

Power Field Effect Transistors (FET) NTLTD7900NR2G attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

20 V

Maximum Drain Current (Abs) (ID):

6 A

Maximum Drain Current (ID):

6 A

Maximum Drain-Source On Resistance:

.026 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PDSO-N8

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

2

No. of Terminals:

8

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

30 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

TIN

Terminal Form:

NO LEAD

Terminal Position:

DUAL

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTLTD7900NR2G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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