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NTJS4405NT4

Onsemi

NTJS4405NT4 by Onsemi

NTJS4405NT4 by Onsemi is a N-CHANNEL FET with 25V DS breakdown voltage, 0.35 ohm RDS(on), and 1A ID. Ideal for switching applications, it features a built-in diode, GULL WING terminals, and operates in enhancement mode. This small outline transistor has 6 terminals and peak reflow temp of 235 °C.

Median Price

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Digiode

USA . 341 parts In-Stock

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Vyrian

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Component Stockers USA

USA . 281 parts In-Stock

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Perfect Parts

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Kulean Microsystems

USA . 5,061 parts In-Stock

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Problanco Electronics

Mexico . 2,554 parts In-Stock

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SupplyDigital Components

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Corphita

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TANS Electronics

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UHIMA Technologies

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Overview

Unlock the potential of your electronic devices with the NTJS4405NT4 by Onsemi. Crafted with precision and quality, this Small Signal Field Effect Transistor (FET) offers unparalleled performance in switching applications. With a built-in diode and N-CHANNEL configuration, this transistor delivers reliability and efficiency like no other. Say goodbye to limitations and hello to innovation with the NTJS4405NT4. Elevate your projects with the best in semiconductor technology from Onsemi.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Provides good protection for the internal components and ensures durability.

Polarity or Channel Type: N-CHANNEL

Allows for efficient flow of electrons, suitable for many applications.

Configuration: SINGLE WITH BUILT-IN DIODE

Simplifies the circuit design by including a diode, making it convenient for use.

Transistor Application: SWITCHING

Designed for switching applications, providing fast response times.

Surface Mount: YES

Easy to mount on a circuit board, saving space and facilitating automated assembly.

Minimum DS Breakdown Voltage: 25 V

Can handle higher voltages, offering a wide operating range.

Package Shape: RECTANGULAR

Compact shape for efficient placement on a PCB.

Terminal Form: GULL WING

Allows for easy soldering onto the circuit board.

Operating Mode: ENHANCEMENT MODE

Enhances performance by allowing control over the output current.

No. of Terminals: 6

Provides multiple connection points for versatile circuit configurations.

Package Style (Meter): SMALL OUTLINE

Compact design suitable for space-constrained applications.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Offers reliable performance and efficiency in various applications.

Transistor Element Material: SILICON

Known for its high conductivity and reliability in electronic devices.

Terminal Finish: TIN LEAD

Provides good connectivity and resistance to corrosion.

Maximum Drain Current (ID): 1 A

Can handle higher current loads, suitable for various applications.

Maximum Drain-Source On Resistance: 0.35 ohm

Offers low resistance, improving efficiency and reducing heat dissipation.

Terminal Position: DUAL

Allows for versatile installation options in a circuit.

Peak Reflow Temperature °C: 235

Can withstand high temperatures during soldering and reflow processes.

Maximum Feedback Capacitance (Crss): 12 pF

Low feedback capacitance for improved stability and performance.

Technical Specifications

Small Signal Field Effect Transistors (FET) NTJS4405NT4 attributes and parameters. Explore more Small Signal Field Effect Transistors (FET) devices from Onsemi

Specs

Minimum DS Breakdown Voltage:

25 V

Maximum Drain Current (ID):

1 A

Maximum Drain-Source On Resistance:

.35 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Maximum Feedback Capacitance (Crss):

12 pF

JESD-30 Code:

R-PDSO-G6

JESD-609 Code:

e0

No. of Elements:

1

No. of Terminals:

6

Operating Mode:

ENHANCEMENT MODE

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

235

Polarity or Channel Type:

Qualification:

Not Qualified

Surface Mount:

YES

Terminal Finish:

TIN LEAD

Terminal Form:

GULL WING

Terminal Position:

DUAL

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTJS4405NT4 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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