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FW812

Onsemi

FW812 by Onsemi

FW812 by Onsemi is a N-CHANNEL Power FET with 35V DS Breakdown Voltage, ideal for SWITCHING applications. It features 2 ELEMENTS with BUILT-IN DIODE in a RECTANGULAR package, capable of handling up to 52A IDM. Utilizes METAL-OXIDE SEMICONDUCTOR tech and has 0.017 ohm Drain-Source On Resistance for efficient operation.

Median Price

-

Lifecycle Status

Suppliers In-Stock

2

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Digiode

USA . 1,654 parts In-Stock

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1,654

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Vyrian

USA . 389 parts In-Stock

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389

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Kulean Microsystems

USA . 5,862 parts In-Stock

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5,862

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SupplyDigital Components

Austria . 3,701 parts In-Stock

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Northwest PG Solutions

USA . 2,248 parts In-Stock

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$4.481

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$4.481

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Corphita

USA . 1,874 parts In-Stock

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1,874

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Problanco Electronics

Mexico . 1,592 parts In-Stock

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1,592

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TANS Electronics

Latvia . 631 parts In-Stock

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UHIMA Technologies

Türkiye . 162 parts In-Stock

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Native Components

USA . 76 parts In-Stock

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$4.435

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Corohmni

South Africa . 73 parts In-Stock

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Overview

Enhance your electronic devices with the FW812 by Onsemi, a high-quality Power FET that offers unmatched performance and reliability. Manufactured by Onsemi, a trusted industry leader, this N-channel transistor is perfect for switching applications. With a maximum pulsed drain current of 52A and a minimum DS breakdown voltage of 35V, this transistor provides exceptional power handling capabilities. Upgrade your designs with the FW812 and experience superior efficiency and functionality like never before.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy material used for the package body provides durability and protection for the internal components of the transistor.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically have higher electron mobility and lower on-resistance, making them suitable for high-efficiency applications.

Configuration: SEPARATE, 2 ELEMENTS WITH BUILT-IN DIODE

The built-in diode allows for efficient switching and protection against voltage spikes in the circuit.

Transistor Application: SWITCHING

Being designed for switching applications, this FET can turn on and off rapidly, making it suitable for power control and conversion.

Surface Mount: YES

Surface mount technology allows for easy and efficient PCB assembly, saving space and improving thermal performance.

Minimum DS Breakdown Voltage: 35 V

The high breakdown voltage ensures reliable operation in higher voltage circuits, making it versatile for various applications.

Maximum Pulsed Drain Current (IDM): 52 A

The high pulsed drain current rating allows for handling sudden peak currents without damaging the transistor.

Maximum Drain Current (ID): 10 A

The high drain current rating makes the FET suitable for applications requiring high power handling capabilities.

Maximum Drain-Source On Resistance: 0.017 ohm

The low on-resistance ensures minimal power loss and heat generation during operation, contributing to high efficiency.

Technical Specifications

Power Field Effect Transistors (FET) FW812 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Minimum DS Breakdown Voltage:

35 V

Maximum Drain Current (ID):

10 A

Maximum Drain-Source On Resistance:

.017 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PDSO-G8

No. of Elements:

2

No. of Terminals:

8

Operating Mode:

ENHANCEMENT MODE

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Maximum Pulsed Drain Current (IDM):

52 A

Surface Mount:

YES

Terminal Form:

GULL WING

Terminal Position:

DUAL

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

FW812 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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