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FQD4P25TM-WS

Onsemi

FQD4P25TM-WS by Onsemi

FQD4P25TM-WS by Onsemi is a P-CHANNEL Power FET with 250V DS Breakdown Voltage, 12.4A IDM, and 2.1 ohm RDS(on). Ideal for SWITCHING applications, it operates in ENHANCEMENT MODE with a max power dissipation of 45W. Suitable for surface mount with a temperature range of -55 to 150°C.

Median Price

$0.370

Lifecycle Status

Suppliers In-Stock

8

In-Stock Inventory

1k+

Distributors (Authorized)

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Arrow

USA . 2,500 parts In-Stock

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$0.370

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2,500

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$0.370

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Nova Conductors

Japan . 315 parts In-Stock

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$0.600

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$0.600

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Flip Electronics

USA . 32,500 parts In-Stock

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Chip Stock

USA . 23,500 parts In-Stock

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Digiode

USA . 2,950 parts In-Stock

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Vyrian

USA . 2,074 parts In-Stock

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Bristol Electronics

USA . 150 parts In-Stock

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Atlantic Semiconductor

USA . 150 parts In-Stock

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Semicontronic

India . 4,601 parts In-Stock

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$0.315

100+ parts

$0.307

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$0.306

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4,601

$0.315

$0.307

$0.306

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Ampacity Inc.

Singapore . 4,486 parts In-Stock

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$0.315

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$0.315

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Aranea Global

USA . 100 parts In-Stock

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$0.588

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$0.564

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Continental Prestige Electronics

USA . 9,263 parts In-Stock

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$0.600

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$0.588

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Argo Parts USA

USA . 4,709 parts In-Stock

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$0.600

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$0.582

4,709

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Advanced Electronics

New Zealand . 200 parts In-Stock

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$0.611

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$0.611

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$0.611

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200

$0.611

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$0.611

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Aztec Data Supply Inc.

USA . 2,265 parts In-Stock

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$1.196

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Corohmni

South Africa . 171 parts In-Stock

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$1.468

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AZTECH Wire

Italy . 796 parts In-Stock

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$13.830

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Lucentia Tech

USA . 46,510 parts In-Stock

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$1.152

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$1.129

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$1.129

Perfect Parts

USA . 6,997 parts In-Stock

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SupplyDigital Components

Austria . 5,202 parts In-Stock

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Authorized Procurement Solutions

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TANS Electronics

Latvia . 2,825 parts In-Stock

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Kulean Microsystems

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Corphita

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Problanco Electronics

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Supply Digital

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Robosynatics

Brazil . 150 parts In-Stock

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UHIMA Technologies

Türkiye . 83 parts In-Stock

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Overview

Experience the power of innovation with the FQD4P25TM-WS by Onsemi. As a leading manufacturer in the industry, Onsemi delivers top-notch Power Field Effect Transistors (FET) like no other. Ideal for switching applications, this P-CHANNEL transistor offers enhanced performance and reliability. With its built-in diode, you can trust this transistor to deliver exceptional results every time. Say goodbye to inefficiencies and hello to seamless operations with the FQD4P25TM-WS. Elevate your projects with this high-quality product that guarantees maximum power dissipation and superior functionality. Choose Onsemi for excellence, choose the FQD4P25TM-WS for unmatched performance.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Plastic/Epoxy package provides good insulation and protection for the internal components of the FET.

Polarity or Channel Type: P-CHANNEL

P-channel FETs are suitable for high-side switching applications, making this product versatile for various circuit designs.

Configuration: SINGLE WITH BUILT-IN DIODE

Built-in diode helps protect against reverse voltage spikes, enhancing the reliability of the switching operation.

Transistor Application: SWITCHING

Designed specifically for switching applications, ensuring efficient performance in controlling power flow.

Surface Mount: YES

Surface mount capability allows for easy integration onto circuit boards, saving space and reducing assembly time.

Minimum DS Breakdown Voltage: 250 V

With a high breakdown voltage, this FET can handle potentially high voltage levels, increasing its versatility in different applications.

Operational Mode: ENHANCEMENT MODE

Enhancement mode FETs are easier to control and can achieve lower on-resistance, providing better efficiency in switching operations.

Maximum Pulsed Drain Current (IDM): 12.4 A

High pulsed drain current rating allows for handling short-term pulse loads, making this FET suitable for high-power applications.

Technical Specifications

Power Field Effect Transistors (FET) FQD4P25TM-WS attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

280 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

250 V

Maximum Drain Current (Abs) (ID):

3.1 A

Maximum Drain Current (ID):

3.1 A

Maximum Drain-Source On Resistance:

2.1 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Minimum Operating Temperature:

-55 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

12.4 A

Sub-Category:

Other Transistors

Surface Mount:

YES

Terminal Finish:

MATTE TIN

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

FQD4P25TM-WS Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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