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FDD5N60NZ

Onsemi

FDD5N60NZ by Onsemi

FDD5N60NZ by Onsemi is a N-CHANNEL Power FET with 600V DS Breakdown Voltage and 16A IDM. Ideal for SWITCHING applications, it features a built-in DIODE, 216mJ EAS rating, and operates in ENHANCEMENT MODE. This RECTANGULAR package has GULL WING terminals and low 2 ohm RDS(on).

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USA . 6,036 parts In-Stock

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Problanco Electronics

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SupplyDigital Components

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Corphita

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Corohmni

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Overview

Unlock the power of innovation with the FDD5N60NZ by Onsemi, a top-tier manufacturer of high-quality Power Field Effect Transistors (FET). Designed for switching applications, this N-channel transistor offers a breakthrough in performance and reliability. With a minimum DS breakdown voltage of 600V and a maximum pulsed drain current of 16A, this transistor provides unmatched efficiency and durability. Whether you're in the automotive, industrial, or consumer electronics industry, this single with built-in diode configuration will elevate your products to new heights. Experience the value and benefits that Onsemi's FDD5N60NZ brings to your designs today.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Provides durability and protection for the components inside the package, ensuring longer lifespan and reliability.

Polarity or Channel Type: N-CHANNEL

Allows for efficient switching and control of current flow in the circuit.

Configuration: SINGLE WITH BUILT-IN DIODE

Simplifies circuit design and saves space by integrating a diode within the transistor package.

Transistor Application: SWITCHING

Designed specifically for switching applications, offering high performance and efficiency in controlling power flow.

Surface Mount: YES

Enables easy and convenient installation on a PCB, saving assembly time and reducing overall footprint.

Minimum DS Breakdown Voltage: 600 V

Provides a high breakdown voltage to handle large voltage spikes and protect the circuit from damage.

Package Shape: RECTANGULAR

Allows for efficient placement on a PCB and easy integration into existing circuit designs.

Terminal Form: GULL WING

Facilitates easy soldering onto the PCB, ensuring a strong and reliable connection.

Operating Mode: ENHANCEMENT MODE

Offers enhanced control over the current flow, allowing for optimized performance in various applications.

Maximum Pulsed Drain Current (IDM): 16 A

Capable of handling high current pulses, making it suitable for applications with sudden power surges.

Avalanche Energy Rating (EAS): 216 mJ

Provides protection against avalanche breakdown, ensuring reliability in harsh operating conditions.

No. of Terminals: 2

Simplifies the connection and installation process, reducing the chances of wiring errors.

Package Style (Meter): SMALL OUTLINE

Compact package size saves space on the PCB and allows for dense circuit layouts.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Offers high performance and efficiency, making it suitable for various power management applications.

Transistor Element Material: SILICON

Provides stability and reliability, ensuring consistent performance over a wide range of operating conditions.

Maximum Drain Current (ID): 4 A

Capable of handling high continuous current flow, making it suitable for power management applications.

Maximum Drain-Source On Resistance: 2 ohm

Low on-state resistance minimizes power losses and improves efficiency in various switching applications.

Terminal Position: SINGLE

Simplifies the connection process and reduces the chances of wiring errors on the PCB.

Case Connection: DRAIN

Provides a convenient and reliable connection point for the drain terminal, ensuring efficient power flow.

Technical Specifications

Power Field Effect Transistors (FET) FDD5N60NZ attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

216 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

600 V

Maximum Drain Current (ID):

4 A

Maximum Drain-Source On Resistance:

2 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-252AA

JESD-30 Code:

R-PSSO-G2

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

NOT SPECIFIED

Polarity or Channel Type:

Maximum Pulsed Drain Current (IDM):

16 A

Surface Mount:

YES

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

NOT SPECIFIED

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

FDD5N60NZ Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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