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FDD5N50FTM-WS

Onsemi

FDD5N50FTM-WS by Onsemi

FDD5N50FTM-WS by Onsemi is a N-channel power FET with 500V DS breakdown voltage, ideal for switching applications. It features a single configuration with built-in diode, 14A max pulsed drain current, and 1.55ohm max drain-source resistance. Suitable for enhancement mode operation in high-power electronics.

Median Price

$1.060

Lifecycle Status

Suppliers In-Stock

5

In-Stock Inventory

1k+

Distributors (Authorized)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Mouser Electronics

USA . 165 parts In-Stock

1+ parts

$1.500

100+ parts

$0.627

1k+ parts

$0.446

10k+ parts

$0.408

165

$1.500

$0.627

$0.446

$0.408

Rochester

USA . 37 parts In-Stock

1+ parts

-

100+ parts

$0.621

1k+ parts

$0.515

10k+ parts

$0.459

37

-

$0.621

$0.515

$0.459

Distributors (In-Stock)

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Digiode

USA . 469 parts In-Stock

1+ parts

$0.484

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-

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469

$0.484

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Flip Electronics

USA . 25,000 parts In-Stock

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25,000

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Vyrian

USA . 4,420 parts In-Stock

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4,420

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Corphita

USA . 1,850 parts In-Stock

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$0.458

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-

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1,850

$0.458

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Corohmni

South Africa . 318 parts In-Stock

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$0.509

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-

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318

$0.509

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Perfect Parts

USA . 425,600 parts In-Stock

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425,600

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S.R.D Solutions

India . 100,000 parts In-Stock

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100,000

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SupplyDigital Components

Austria . 6,009 parts In-Stock

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6,009

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QUARKTWIN TECHNOLOGY LTD

USA . 5,806 parts In-Stock

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5,806

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Kulean Microsystems

USA . 5,720 parts In-Stock

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Kepictronics

USA . 3,000 parts In-Stock

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Supply Digital

USA . 2,501 parts In-Stock

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Problanco Electronics

Mexico . 2,445 parts In-Stock

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Northwest PG Solutions

USA . 1,671 parts In-Stock

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TANS Electronics

Latvia . 847 parts In-Stock

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UHIMA Technologies

Türkiye . 596 parts In-Stock

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Authorized Procurement Solutions

USA . 500 parts In-Stock

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500

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Native Components

USA . 382 parts In-Stock

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382

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Overview

Unleash the power of innovation with the FDD5N50FTM-WS by Onsemi. As a leading manufacturer in the industry, Onsemi delivers top-quality Power Field Effect Transistors that are designed for optimal performance in switching applications. This N-CHANNEL transistor offers a unique configuration with a built-in diode, making it versatile and efficient. With a high DS Breakdown Voltage of 500V and a Maximum Power Dissipation of 40W, this transistor can handle demanding tasks with ease. Experience the reliability and precision that Onsemi products offer, and elevate your projects to new heights with the FDD5N50FTM-WS.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Plastic/Epoxy material provides durability and helps in protecting the internal components of the transistor.

Polarity or Channel Type: N-CHANNEL

N-channel transistors typically have better performance characteristics and lower resistance compared to P-channel transistors.

Transistor Application: SWITCHING

Designed specifically for switching applications, ensuring efficient operation in such scenarios.

Surface Mount: YES

Surface mount capability allows for easy and convenient installation on circuit boards.

Minimum DS Breakdown Voltage: 500 V

High breakdown voltage ensures reliable performance and protection against voltage spikes.

Maximum Pulsed Drain Current (IDM): 14 A

High pulsed drain current rating allows for handling sudden surges in current without damage.

Maximum Power Dissipation (Abs): 40 W

High power dissipation rating ensures the transistor can handle high power loads efficiently.

Maximum Operating Temperature: 150 °C

Wide temperature range allows for operation in various environmental conditions.

Peak Reflow Temperature °C: 260

Can withstand high peak reflow temperatures during manufacturing processes.

Technical Specifications

Power Field Effect Transistors (FET) FDD5N50FTM-WS attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

257 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

500 V

Maximum Drain Current (Abs) (ID):

3.5 A

Maximum Drain Current (ID):

3.5 A

Maximum Drain-Source On Resistance:

1.55 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Maximum Feedback Capacitance (Crss):

7.5 pF

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Minimum Operating Temperature:

-55 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

14 A

Surface Mount:

YES

Terminal Finish:

Matte Tin (Sn) - annealed

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Maximum Turn Off Time (toff):

116 ns

Maximum Turn On Time (ton):

90 ns

Trade Compliance

FDD5N50FTM-WS Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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