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FDD5N50NZ

Onsemi

FDD5N50NZ by Onsemi

FDD5N50NZ by Onsemi is a N-CHANNEL Power FET with 500V DS Breakdown Voltage, ideal for SWITCHING applications. It features 16A Max Pulsed Drain Current and 1.5Ω Max DS On Resistance, making it suitable for high-power operations in ENHANCEMENT MODE. This PLASTIC/EPOXY transistor in GULL WING package offers reliable performance in various industrial settings.

Median Price

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Lifecycle Status

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2

In-Stock Inventory

1k+

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Vyrian

USA . 2,447 parts In-Stock

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Digiode

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Problanco Electronics

Mexico . 6,725 parts In-Stock

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TANS Electronics

Latvia . 6,005 parts In-Stock

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SupplyDigital Components

Austria . 4,397 parts In-Stock

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Authorized Procurement Solutions

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Kulean Microsystems

USA . 3,235 parts In-Stock

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Supply Digital

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Corphita

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Native Components

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Northwest PG Solutions

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UHIMA Technologies

Türkiye . 109 parts In-Stock

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Corohmni

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Overview

Discover the FDD5N50NZ by Onsemi, a top-quality Power Field Effect Transistor that offers unmatched performance and reliability. Manufactured by Onsemi, a trusted name in semiconductor technology, this N-CHANNEL transistor is designed for switching applications with a built-in diode for added convenience. With a 500V minimum breakdown voltage and 16A maximum pulsed drain current, this transistor delivers exceptional power. Ideal for a wide range of applications, the FDD5N50NZ provides customers with unparalleled value and efficiency. Upgrade your projects with this high-performance transistor today!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Provides durability and protection to the internal components of the FET, making it reliable for long-term use.

Polarity or Channel Type: N-CHANNEL

N-channel FETs are commonly used in power electronics applications due to their high efficiency and fast switching speeds.

Configuration: SINGLE WITH BUILT-IN DIODE

Built-in diode helps to protect the FET from voltage spikes and reverse current flow, increasing its reliability.

Transistor Application: SWITCHING

Designed specifically for switching applications, ensuring efficient and precise control of power flow.

Surface Mount: YES

Allows for easy and convenient installation on circuit boards, saving space and reducing assembly time.

Minimum DS Breakdown Voltage: 500 V

Can handle high voltages, making it suitable for applications where voltage spikes may occur.

Package Shape: RECTANGULAR

Rectangular shape allows for efficient placement on circuit boards and optimal use of space.

Terminal Form: GULL WING

Gull wing terminals provide secure and reliable connections, ensuring stable performance.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs offer high input impedance and low power consumption, making them ideal for energy-efficient applications.

Maximum Pulsed Drain Current (IDM): 16 A

Capable of handling high current pulses, making it suitable for power applications with surges in current.

Avalanche Energy Rating (EAS): 304 mJ

High avalanche energy rating ensures reliable performance under stress conditions, protecting the FET from damage.

No. of Terminals: 2

Simple and straightforward design with minimal terminals, making it easy to integrate into circuit boards.

Package Style (Meter): SMALL OUTLINE

Compact size allows for efficient use of space on circuit boards, making it suitable for compact electronic devices.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Metal-oxide semiconductor technology offers high efficiency and reliability, ensuring stable performance.

Transistor Element Material: SILICON

Silicon-based FETs offer excellent performance characteristics and are commonly used in power electronics applications.

Maximum Drain Current (ID): 4 A

Able to handle moderate levels of current, suitable for a wide range of power applications.

Maximum Drain-Source On Resistance: 1.5 ohm

Low on-resistance minimizes power losses and heat generation, improving efficiency and performance.

Terminal Position: SINGLE

Single terminal position simplifies installation and connection, reducing the risk of errors.

Case Connection: DRAIN

Drain connection offers easy integration into power circuits, ensuring efficient power flow.

Technical Specifications

Power Field Effect Transistors (FET) FDD5N50NZ attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

304 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

500 V

Maximum Drain Current (ID):

4 A

Maximum Drain-Source On Resistance:

1.5 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-252AA

JESD-30 Code:

R-PSSO-G2

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Maximum Pulsed Drain Current (IDM):

16 A

Surface Mount:

YES

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

FDD5N50NZ Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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