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FCP099N60E

Onsemi

FCP099N60E by Onsemi

FCP099N60E by Onsemi is a N-CHANNEL Power FET with 600V DS Breakdown Voltage. It has a Max IDM of 111A and EAS of 809mJ, ideal for SWITCHING applications. Operating in ENHANCEMENT MODE, it offers 0.099 ohm RDS(ON), making it suitable for high-power tasks up to 357W at temperatures ranging from -55 to 150°C.

Median Price

$4.618

Lifecycle Status

Suppliers In-Stock

9

In-Stock Inventory

1k+

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Arrow

USA . 20 parts In-Stock

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$2.611

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$2.611

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Chip1Stop

Japan . 46 parts In-Stock

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$3.985

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$3.985

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Mouser Electronics

USA . 1,123 parts In-Stock

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$5.250

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$3.000

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$2.800

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$5.250

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DigiKey

USA . 243 parts In-Stock

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$6.640

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$3.256

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Flip Electronics (Authorized)

USA . 3,200 parts In-Stock

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Verical

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Vyrian

USA . 1,647 parts In-Stock

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$2.862

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Digiode

USA . 1,618 parts In-Stock

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$3.786

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Flip Electronics

USA . 2,400 parts In-Stock

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Corohmni

South Africa . 195 parts In-Stock

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$2.862

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Component Stockers USA

USA . 2,263 parts In-Stock

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$3.040

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$2.800

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Corphita

USA . 1,288 parts In-Stock

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$3.586

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Native Components

USA . 370 parts In-Stock

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$11.150

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Northwest PG Solutions

USA . 1,881 parts In-Stock

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$12.265

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$11.038

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Microchip USA

USA . 3,023 parts In-Stock

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$17.556

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RC Electronics

USA . 44,952 parts In-Stock

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$2.750

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$2.510

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$2.430

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$2.430

A-Z Elektronik GmbH

Germany . 5,048 parts In-Stock

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Kulean Microsystems

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TANS Electronics

Latvia . 3,970 parts In-Stock

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Alle Elektronik GmbH

Germany . 3,365 parts In-Stock

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Perfect Parts

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Supply Digital

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Problanco Electronics

Mexico . 2,059 parts In-Stock

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UHIMA Technologies

Türkiye . 963 parts In-Stock

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Authorized Procurement Solutions

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Overview

Discover the power and reliability of the Onsemi FCP099N60E Power Field Effect Transistor. With a high voltage breakdown, single configuration, and built-in diode, this transistor is perfect for switching applications. Onsemi's proven track record of quality and innovation guarantees superior performance and durability. Experience enhanced efficiency and control with the FCP099N60E, offering a maximum pulsing drain current of 111A and a low on-resistance of 0.099 ohm. Trust in Onsemi for cutting-edge technology that delivers unmatched value and benefits to customers across various industries.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

PLASTIC/EPOXY material ensures durability and reliability, making this FET suitable for long-term use in various applications.

Polarity or Channel Type: N-CHANNEL

N-CHANNEL design allows for efficient current flow and high performance in switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

Built-in diode provides protection against reverse current flow, enhancing the overall reliability of the FET.

Transistor Application: SWITCHING

Specifically designed for switching applications, ensuring fast and efficient performance in controlling electronic circuits.

Minimum DS Breakdown Voltage: 600 V

High breakdown voltage enables the FET to handle high-voltage applications without the risk of damage or failure.

Maximum Drain Current (ID): 37 A

High drain current rating allows for the FET to handle high current loads, making it suitable for power applications.

Maximum Power Dissipation (Abs): 357 W

High power dissipation capability ensures the FET can handle high-power applications without overheating.

Maximum Operating Temperature: 150 °C

Wide operating temperature range makes this FET suitable for use in various environmental conditions.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Metal-Oxide Semiconductor technology offers high performance and efficiency in the FET, making it a reliable choice for electronic circuits.

Technical Specifications

Power Field Effect Transistors (FET) FCP099N60E attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

809 mJ

Minimum DS Breakdown Voltage:

600 V

Maximum Drain Current (Abs) (ID):

37 A

Maximum Drain Current (ID):

37 A

Maximum Drain-Source On Resistance:

.099 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Maximum Feedback Capacitance (Crss):

20 pF

JEDEC-95 Code:

TO-220AB

JESD-30 Code:

R-PSFM-T3

JESD-609 Code:

e3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Minimum Operating Temperature:

-55 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Peak Reflow Temperature (C):

NOT SPECIFIED

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

111 A

Surface Mount:

NO

Terminal Finish:

Matte Tin (Sn) - annealed

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

NOT SPECIFIED

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Maximum Turn Off Time (toff):

248 ns

Maximum Turn On Time (ton):

114 ns

Trade Compliance

FCP099N60E Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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