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BLL6H0514LS-130

NXP Semiconductors

BLL6H0514LS-130 by NXP Semiconductors

BLL6H0514LS-130 by NXP Semiconductors is an N-channel RF power FET designed for amplifier applications. It features a 100V min DS breakdown voltage, operates in enhancement mode, and supports L-band frequencies. This flatpack device offers high performance with a max drain current of 18A.

Median Price

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Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

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Digiode

USA . 3,724 parts In-Stock

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Vyrian

USA . 1,535 parts In-Stock

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Anansix

USA . 1,505 parts In-Stock

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Native Components

USA . 563 parts In-Stock

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$1.033

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Northwest PG Solutions

USA . 909 parts In-Stock

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$1.136

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909

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One Stop Electronics

USA . 1,495 parts In-Stock

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$60.050

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$60.050

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UNI Independent Distributors

Spain . 4,585 parts In-Stock

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Corphita

USA . 1,816 parts In-Stock

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Overview

Unlock unparalleled performance with the BLL6H0514LS-130 from NXP Semiconductors, a leader in innovation and quality. This N-channel RF Power FET is designed to elevate your amplifying applications in various sectors, ensuring reliability and efficiency. With its robust ceramic-metal sealed package and superior breakdown voltage, it offers exceptional durability and performance at high frequencies. Experience the advantage of trusted technology that drives your projects forward with precision!

Feature Benefit Bullets

Package Body Material: CERAMIC, METAL-SEALED COFIRED

The ceramic, metal-sealed co-fired package provides excellent thermal stability and reliability, making it ideal for high-performance RF applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically offer higher efficiency and faster switching speeds, making them suitable for high-frequency amplification.

Configuration: SINGLE

Single configuration simplifies design and integration into various electronic circuits, allowing for easier implementation in applications.

Transistor Application: AMPLIFIER

Designed specifically for amplification, this FET is ideal for use in RF amplifiers, ensuring clean and strong signal enhancement.

Surface Mount: YES

Surface mount capability allows for compact designs and easier assembly processes, making it suitable for modern electronics.

Minimum DS Breakdown Voltage: 100 V

With a minimum drain-source breakdown voltage of 100V, this FET can handle substantial voltage levels, ensuring robustness in high-voltage applications.

Package Shape: SQUARE

The square package shape helps in efficient space utilization on PCBs, facilitating better design flexibility.

Terminal Form: FLAT

Flat terminals provide reliable connections and are advantageous for thermal performance, enhancing the overall reliability of the component.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation allows for low quiescent current and improved efficiency in power applications, benefiting energy-saving designs.

Highest Frequency Band: L BAND

Operating in the L band makes this FET suitable for various communication and radar applications, increasing its versatility.

No. of Terminals: 2

With only two terminals, this FET offers a simple design, reducing complexity and potential points of failure in circuits.

Package Style (Meter): FLATPACK

The flatpack style promotes better heat dissipation and is easier to incorporate into space-constrained designs.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology enables high input impedance and low power consumption, making this FET efficient for various applications.

Transistor Element Material: SILICON

Silicon as the element material ensures good electrical performance and thermal stability, which is crucial for RF applications.

Maximum Drain Current (ID): 18 A

The capacity to handle a maximum drain current of 18 A allows this FET to be used in high-power applications while maintaining performance.

Terminal Position: DUAL

Dual terminal position simplifies the layout and routing in circuit designs, facilitating easier integration into systems.

Case Connection: SOURCE

A source case connection enhances the thermal stability and performance of the FET, which is essential for efficient operation.

Technical Specifications

RF Power Field Effect Transistors (FET) BLL6H0514LS-130 attributes and parameters. Explore more RF Power Field Effect Transistors (FET) devices from NXP Semiconductors

Specs

Case Connection:

SOURCE

Configuration:

Minimum DS Breakdown Voltage:

100 V

Maximum Drain Current (ID):

18 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Highest Frequency Band:

L BAND

JESD-30 Code:

S-CDFP-F2

Moisture Sensitivity Level (MSL):

NOT APPLICABLE

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Package Body Material:

CERAMIC, METAL-SEALED COFIRED

Package Shape:

SQUARE

Package Style (Meter):

FLATPACK

Peak Reflow Temperature (C):

NOT SPECIFIED

Polarity or Channel Type:

Qualification:

Not Qualified

Surface Mount:

YES

Terminal Form:

FLAT

Terminal Position:

DUAL

Maximum Time At Peak Reflow Temperature (s):

NOT SPECIFIED

Transistor Application:

AMPLIFIER

Transistor Element Material:

SILICON

Trade Compliance

BLL6H0514LS-130 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

NXP Semiconductors

NXP is a leading semiconductor company that creates cutting-edge technology to power secure connections in a smarter world. Founded in 2006, they have grown to become one of the top five global semiconductor companies and serve their customers in over 70 countries around the world.

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Management team

Executive Director, President, CEO

Kurt Sievers

Executive VP, CFO

Bill Betz

Executive VP, Chief Sales Officer

Ron Martino

Manufacturer fab locations 7

Fab name Location Fab Initiation Wafer Capacity

ICN8

Fabrication

Fab Initiation

1996

Netherlands

Nijmegen

Wafer Capacity

55,000

1996

55,000

ATMC (Austin Tech & Mfg Center)

Fabrication

Fab Initiation

1995

USA

Austin

Wafer Capacity

30,000

1995

30,000

N/A

Fabrication

Fab Initiation

1989

Germany

Boeblingen

Wafer Capacity

1989

CHD

Fabrication

Fab Initiation

1993

USA

Chandler

Wafer Capacity

30,000

1993

30,000

OHTC

Fabrication

Fab Initiation

1991

USA

Austin

Wafer Capacity

24,000

1991

24,000

New Expansion Fab

Fabrication

Fab Initiation

2026

USA

Austin

Wafer Capacity

2026

ECHO

Fabrication

Fab Initiation

2020

USA

Chandler

Wafer Capacity

10,000

2020

10,000

Category top products 20

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