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BLF1046,135

NXP Semiconductors

BLF1046,135 by NXP Semiconductors

BLF1046,135 by NXP Semiconductors is an N-channel MOSFET designed for high-performance applications. It supports a max drain current of 4.5 A and operates at temperatures up to 200 °C. Ideal for power management in various electronic devices, it ensures efficient energy control.

Median Price

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Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

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Vyrian

USA . 11,202 parts In-Stock

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Digiode

USA . 3,616 parts In-Stock

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Anansix

USA . 2,320 parts In-Stock

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2,320

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AZTECH Wire

Italy . 847 parts In-Stock

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$15.230

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847

$15.230

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One Stop Electronics

USA . 1,183 parts In-Stock

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$40.050

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Corphita

USA . 4,380 parts In-Stock

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4,380

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UNI Independent Distributors

Spain . 3,359 parts In-Stock

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Northwest PG Solutions

USA . 1,513 parts In-Stock

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Native Components

USA . 887 parts In-Stock

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Overview

Elevate your designs with the BLF1046,135 by NXP Semiconductors—a powerhouse in N-channel FETs. Renowned for their quality and reliability, NXP ensures that you benefit from robust performance even in demanding environments. This versatile transistor excels in a range of applications, delivering superior efficiency and thermal stability, making it perfect for amplifiers and power management solutions. Experience unmatched value and innovation that empowers your projects to thrive!

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically provide better performance in terms of switching speed and lower on-resistance, making them ideal for applications requiring efficient power management.

Configuration: SINGLE

A single configuration simplifies circuit design and reduces the chances of failure, making this transistor easy to integrate into a variety of applications.

Maximum Drain Current (Abs) (ID): 4.5 A

With a maximum drain current of 4.5 A, this FET can drive high loads efficiently, making it suitable for power applications and reducing the need for multiple devices.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology provides excellent scalability and reduced power consumption, ensuring reliability and efficiency in both high-speed switching and low-power applications.

Maximum Operating Temperature: 200 °C

With a maximum operating temperature of 200 °C, this FET is well-suited for demanding environments and applications that require higher thermal tolerance.

Maximum Drain Current (ID): 4.5 A

Repeating the capability of handling up to 4.5 A, this FET is efficient for both standard and high-load operations, ensuring robust performance in diverse applications.

Technical Specifications

Power Field Effect Transistors (FET) BLF1046,135 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from NXP Semiconductors

Specs

Configuration:

Maximum Drain Current (Abs) (ID):

4.5 A

Maximum Drain Current (ID):

4.5 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

No. of Elements:

1

Maximum Operating Temperature:

200 Cel

Polarity or Channel Type:

Sub-Category:

FET General Purpose Power

Trade Compliance

BLF1046,135 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

NXP Semiconductors

NXP is a leading semiconductor company that creates cutting-edge technology to power secure connections in a smarter world. Founded in 2006, they have grown to become one of the top five global semiconductor companies and serve their customers in over 70 countries around the world.

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Management team

Executive Director, President, CEO

Kurt Sievers

Executive VP, CFO

Bill Betz

Executive VP, Chief Sales Officer

Ron Martino

Manufacturer fab locations 7

Fab name Location Fab Initiation Wafer Capacity

ICN8

Fabrication

Fab Initiation

1996

Netherlands

Nijmegen

Wafer Capacity

55,000

1996

55,000

ATMC (Austin Tech & Mfg Center)

Fabrication

Fab Initiation

1995

USA

Austin

Wafer Capacity

30,000

1995

30,000

N/A

Fabrication

Fab Initiation

1989

Germany

Boeblingen

Wafer Capacity

1989

CHD

Fabrication

Fab Initiation

1993

USA

Chandler

Wafer Capacity

30,000

1993

30,000

OHTC

Fabrication

Fab Initiation

1991

USA

Austin

Wafer Capacity

24,000

1991

24,000

New Expansion Fab

Fabrication

Fab Initiation

2026

USA

Austin

Wafer Capacity

2026

ECHO

Fabrication

Fab Initiation

2020

USA

Chandler

Wafer Capacity

10,000

2020

10,000

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