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3N211

Texas Instruments

3N211 by Texas Instruments

3N211 by Texas Instruments is a N-CHANNEL RF FET with 27V DS Breakdown Voltage and 24dB Power Gain. Ideal for AMPLIFIER applications in VERY HIGH FREQUENCY BAND, it operates in DUAL GATE, DEPLETION MODE with 0.05A Drain Current and 0.36W Power Dissipation.

Median Price

$17.804

Lifecycle Status

Suppliers In-Stock

14

In-Stock Inventory

1k+

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Freelance Electronics

USA . 2 parts In-Stock

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$9.988

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American Microsemiconductor Inc.

USA . 1,089 parts In-Stock

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$25.620

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Vyrian

USA . 4,881 parts In-Stock

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Digiode

USA . 4,644 parts In-Stock

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Electronic Expediters

USA . 772 parts In-Stock

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Bristol Electronics

USA . 533 parts In-Stock

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Holdelec - ElecDif-Pro

France . 200 parts In-Stock

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LWI Electronics Inc

India . 184 parts In-Stock

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LittleDiode

UK . 18 parts In-Stock

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MISTER SPROCKETS

USA . 12 parts In-Stock

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Prism Electronics

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Manoshevitz Elec. Sales

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Mil-Aero Solutions, Inc.

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Sinequanon

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Parana Technologies

USA . 2,050 parts In-Stock

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$1.354

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$2.080

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$1.354

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DigiPath Technology Company

USA . 1,631 parts In-Stock

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$1.491

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$1.371

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ChromeModa Solutions

Germany . 5,597 parts In-Stock

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$1.521

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$1.247

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IDEA Electronic Components Group

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AZTECH Wire

Italy . 544 parts In-Stock

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One Stop Electronics

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$29.050

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Native Components

USA . 167 parts In-Stock

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$43.730

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$41.981

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Northwest PG Solutions

USA . 1,996 parts In-Stock

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Corphita

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RTC Component Inc.

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Assy Fe

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Overview

Elevate your RF amplifier designs with the high-quality 3N211 by Texas Instruments. This N-channel FET offers exceptional performance in the very high-frequency band, making it ideal for a wide range of applications. With a single configuration and dual gate operation, this transistor delivers a power gain of 24 dB and a minimum DS breakdown voltage of 27V. Experience reliable and efficient amplification with the 3N211, backed by the trusted reputation of Texas Instruments. Unlock new possibilities and enhance your projects with this cutting-edge semiconductor technology.

Feature Benefit Bullets

Package Body Material: METAL

Provides durability and ensures good heat dissipation, increasing the lifespan and performance of the transistor.

Polarity or Channel Type: N-CHANNEL

N-Channel FETs typically have higher electron mobility, making them suitable for high-frequency applications.

Configuration: SINGLE

Simplifies circuit design and makes the transistor easier to integrate into a system.

Transistor Application: AMPLIFIER

Designed specifically for amplification purposes, ensuring optimal performance in amplifier circuits.

Minimum DS Breakdown Voltage: 27 V

Provides a safety margin for voltage spikes, protecting the transistor from damage.

Minimum Power Gain (Gp): 24 dB

Indicates high amplification capability, making it suitable for signal amplification applications.

Maximum Operating Temperature: 200 °C

Can operate at high temperatures without compromising performance, suitable for industrial applications.

Technical Specifications

RF Small Signal Field Effect Transistors (FET) 3N211 attributes and parameters. Explore more RF Small Signal Field Effect Transistors (FET) devices from Texas Instruments

Specs

Case Connection:

SOURCE AND SUBSTRATE

Configuration:

Minimum DS Breakdown Voltage:

27 V

Maximum Drain Current (Abs) (ID):

.05 A

Maximum Drain Current (ID):

.05 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Maximum Feedback Capacitance (Crss):

.05 pF

Highest Frequency Band:

VERY HIGH FREQUENCY BAND

JEDEC-95 Code:

TO-72

JESD-30 Code:

O-MBCY-W4

No. of Elements:

1

No. of Terminals:

4

Operating Mode:

DUAL GATE, DEPLETION MODE

Maximum Operating Temperature:

200 Cel

Package Body Material:

METAL

Package Shape:

ROUND

Package Style (Meter):

CYLINDRICAL

Peak Reflow Temperature (C):

NOT SPECIFIED

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Minimum Power Gain (Gp):

24 dB

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Form:

WIRE

Terminal Position:

BOTTOM

Maximum Time At Peak Reflow Temperature (s):

NOT SPECIFIED

Transistor Application:

AMPLIFIER

Transistor Element Material:

SILICON

Trade Compliance

3N211 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

NSN

5961-01-217-9261, 5961012179261, 5961-01-085-0516, 5961010850516, 5961-99-655-1403, 5961996551403, 5961-99-654-2646, 5961996542646

NIIN

012179261, 010850516, 996551403, 996542646

Manufacturer Highlights

Texas Instruments

Texas Instruments Inc. (TI) is one of the world's leading semiconductor companies and a global leader in analog and digital signal processing technology. The company has had a major impact on the electronics industry for over 80 years, manufacturing integrated circuits (ICs), software and subsystems that leverage high-performance computing capabilities. It offers an extensive portfolio of solutions for a wide range of industries, from aerospace to medical devices and consumer products to communication systems. Over its long history, TI has become synonymous with quality, reliability and innovation. Today, TI is one of the largest semiconductor companies in the world with operations in more than 30 countries across six continents.

The material and information contained is this video is for educational and general information purposes. All rights remain with respective rightsholders. Fair Use Statement

Management team

President, CEO

Haviv Ilan

Chairman

Richard K. Templeton

Senior VP, CFO

Rafael R. Lizardi

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

M - Fab

Fabrication

Fab Initiation

1997

USA

South Portland

Wafer Capacity

32,000

1997

32,000

D - FAB

Fabrication

Fab Initiation

1966

USA

Dallas

Wafer Capacity

42,000

1966

42,000

D MOS - 6

Fabrication

Fab Initiation

2002

USA

Dallas

Wafer Capacity

25,000

2002

25,000

D MOS - 5

Fabrication

Fab Initiation

1995

USA

Dallas

Wafer Capacity

75,000

1995

75,000

Miho - 8

Fabrication

Fab Initiation

1980

Japan

Inashiki

Wafer Capacity

43,000

1980

43,000

S FAB 1

Fabrication

Fab Initiation

1966

USA

Sherman

Wafer Capacity

91,000

1966

91,000

F - FAB

Fabrication

Fab Initiation

2001

Germany

Freising

Wafer Capacity

37,000

2001

37,000

R Fab 1

Fabrication

Fab Initiation

2010

USA

Richardson

Wafer Capacity

40,000

2010

40,000

D HC Line

Fabrication

Fab Initiation

1999

USA

Dallas

Wafer Capacity

2,000

1999

2,000

JV3

Fabrication

Fab Initiation

2001

Japan

Aizu Wakamatsu

Wafer Capacity

45,000

2001

45,000

C - FAB

Fabrication

Fab Initiation

2007

China

Chengdu

Wafer Capacity

30,000

2007

30,000

L - Fab

Fabrication

Fab Initiation

2015

USA

Lehi

Wafer Capacity

70,000

2015

70,000

R - Fab 2

Fabrication

Fab Initiation

2022

USA

Richardson

Wafer Capacity

2022

S - FAB 2

Fabrication

Fab Initiation

2025

USA

Sherman

Wafer Capacity

2025

S - FAB 3

Fabrication

Fab Initiation

2028

USA

Sherman

Wafer Capacity

2028

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