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VNV35N07-E

STMicroelectronics

VNV35N07-E by STMicroelectronics

VNV35N07-E by STMicroelectronics is a robust N-channel FET designed for high-efficiency applications. It features a max drain current of 35 A, breakdown voltage of 60 V, and low on-resistance of 0.035 Ω. Ideal for power management in automotive and industrial systems.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Vyrian

USA . 6,562 parts In-Stock

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Digiode

USA . 3,358 parts In-Stock

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3,358

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Anansix

USA . 2,114 parts In-Stock

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2,114

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Distributors (Availability)

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IDEA Electronic Components Group

UK . 1,222 parts In-Stock

1+ parts

$1.639

100+ parts

-

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$1.475

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1,222

$1.639

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$1.475

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MKK Technologies

India . 298 parts In-Stock

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$3.081

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298

$3.081

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DigiPath Technology Company

USA . 298 parts In-Stock

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$3.081

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298

$3.081

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AZTECH Wire

Italy . 659 parts In-Stock

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$12.990

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659

$12.990

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Microchip USA

USA . 434 parts In-Stock

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$21.456

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434

$21.456

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Corphita

USA . 4,647 parts In-Stock

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Authorized Procurement Solutions

USA . 3,000 parts In-Stock

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3,000

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Parana Technologies

USA . 1,936 parts In-Stock

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$1.959

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1,936

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$1.959

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Overview

Elevate your projects with the VNV35N07-E from STMicroelectronics, a prime choice in power FETs that exemplifies quality and reliability. With its robust design and superior performance, this N-channel transistor seamlessly integrates into various applications—ensuring efficiency in automotive, industrial, and consumer electronics. Trust in STMicroelectronics' legacy of innovation as you harness unparalleled power management, enhancing system stability while reducing energy loss. Experience the difference!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy for the package body enhances durability and resistance to environmental factors, making it suitable for a variety of applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically have higher electron mobility, leading to better performance in switching applications and power efficiency.

Configuration: COMPLEX

A complex configuration allows for advanced circuit designs, making this FET suitable for a wide range of electronic applications.

Surface Mount: YES

Being a surface mount device allows for quicker installation and assembly in compact circuits, saving space on PCBs.

Minimum DS Breakdown Voltage: 60 V

A minimum breakdown voltage of 60 V ensures the transistor can operate safely in high-voltage environments, providing stability in demanding applications.

Package Shape: RECTANGULAR

The rectangular shape is optimal for efficient heat dissipation and facilitates easy layout integration on PCBs.

Terminal Form: GULL WING

Gull wing terminals provide excellent mechanical strength and ease of soldering, enhancing overall reliability.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation means that the transistor stays off until a gate voltage is applied, leading to lower power consumption in off states.

Maximum Drain Current (Abs) (ID): 35 A

The ability to handle a maximum drain current of 35 A makes this FET ideal for high power applications, ensuring robust performance.

No. of Terminals: 10

Having 10 terminals allows for versatile connectivity options in circuit design, making it adaptable to various applications.

Maximum Power Dissipation (Abs): 125 W

A power dissipation capability of 125 W enables this FET to handle substantial amounts of power without overheating, ensuring reliability in high-load scenarios.

Package Style (Meter): SMALL OUTLINE

A small outline package style contributes to space efficiency on the PCB, suitable for compact electronic devices.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

The use of MOS technology means lower gate power consumption and high-speed switching capabilities, making it efficient in many applications.

Transistor Element Material: SILICON

Silicon as the element material provides a well-established, reliable performance in diverse operating conditions.

Maximum Turn On Time (ton): 800 ns

A fast turn-on time of 800 ns allows for quick response in switching applications, increasing overall system efficiency.

Maximum Turn Off Time (toff): 1350 ns

This FET's turn-off time of 1350 ns provides adequate switching speed for applications requiring fast operation.

Maximum Drain-Source On Resistance: 0.035 ohm

A low on-resistance of 0.035 ohm reduces conduction losses, enhancing overall efficiency in power applications.

Terminal Position: DUAL

Dual terminal positioning offers flexible layout options for PCB design, accommodating various circuit configurations.

Reference Standard: AEC-Q101

Compliance with AEC-Q101 signifies quality and reliability in automotive applications, assuring users of its performance in critical environments.

Technical Specifications

Power Field Effect Transistors (FET) VNV35N07-E attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Configuration:

Minimum DS Breakdown Voltage:

60 V

Maximum Drain Current (Abs) (ID):

35 A

Maximum Drain-Source On Resistance:

.035 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PDSO-G10

No. of Elements:

1

No. of Terminals:

10

Operating Mode:

ENHANCEMENT MODE

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

NOT SPECIFIED

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Reference Standard:

AEC-Q101

Surface Mount:

YES

Terminal Form:

GULL WING

Terminal Position:

DUAL

Maximum Time At Peak Reflow Temperature (s):

NOT SPECIFIED

Transistor Element Material:

SILICON

Maximum Turn Off Time (toff):

1350 ns

Maximum Turn On Time (ton):

800 ns

Trade Compliance

VNV35N07-E Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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