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STW55NE10

STMicroelectronics

STW55NE10 by STMicroelectronics

STW55NE10 by STMicroelectronics is an N-channel FET designed for efficient switching applications. It features a max drain current of 55 A, a breakdown voltage of 100 V, and operates at up to 175 °C. Ideal for high-power circuits with low on-resistance (0.027 Ω).

Median Price

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Lifecycle Status

Suppliers In-Stock

9

In-Stock Inventory

1k+

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Vyrian

USA . 3,880 parts In-Stock

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Digiode

USA . 3,200 parts In-Stock

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R&J Components

USA . 964 parts In-Stock

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Bristol Electronics

USA . 507 parts In-Stock

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Flex Direct, LLC

USA . 507 parts In-Stock

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Anansix

USA . 415 parts In-Stock

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ComSIT Distribution GmbH

Germany . 95 parts In-Stock

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PC Components Company LLC

USA . 40 parts In-Stock

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Sunrise Surplus Inc.

USA . 9 parts In-Stock

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IDEA Electronic Components Group

UK . 1,316 parts In-Stock

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$1.458

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$1.312

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MKK Technologies

India . 1,473 parts In-Stock

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$2.742

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DigiPath Technology Company

USA . 1,473 parts In-Stock

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Kepictronics

USA . 10,000 parts In-Stock

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Authorized Procurement Solutions

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Corphita

USA . 829 parts In-Stock

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Parana Technologies

USA . 619 parts In-Stock

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Assy Fe

Spain . 44 parts In-Stock

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Overview

Experience unmatched reliability and performance with the STW55NE10 from STMicroelectronics, a leader in semiconductor innovation. This powerful N-channel FET is engineered for exceptional efficiency in demanding switching applications, offering remarkable durability and high current handling capabilities. Enhance your designs with this versatile component, ensuring optimal operation in everything from industrial automation to renewable energy systems. Trust in STMicroelectronics for quality that elevates your projects!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The durable plastic/epoxy packaging ensures reliability and protection against environmental factors, making it suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs are typically more efficient and offer lower on-resistance, making this product ideal for high-speed switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode helps in preventing reverse current, enhancing the safety and functionality of the overall circuit.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET delivers high performance and speed in applications such as power supplies and motor control.

Minimum DS Breakdown Voltage: 100 V

With a high breakdown voltage, this device can handle substantial voltage loads, making it suitable for various high-voltage applications.

Package Shape: RECTANGULAR

The rectangular shape facilitates easy integration into circuit designs and optimizes space on printed circuit boards.

Terminal Form: THROUGH-HOLE

Through-hole design provides stable electrical connections and is ideal for prototyping and robust applications.

Operating Mode: ENHANCEMENT MODE

Enhancement mode allows for efficient control of current flow, providing better performance in low-power applications.

Maximum Pulsed Drain Current (IDM): 220 A

Rated for high pulsed drain current, this FET is capable of handling short-term high loads, ideal for pulsed power applications.

Avalanche Energy Rating (EAS): 350 mJ

A high avalanche energy rating indicates robustness and ensures reliability in dynamic conditions, protecting against transient events.

Maximum Drain Current (Abs) (ID): 55 A

The ability to handle 55 A nominally makes this FET suitable for high-current applications without overheating issues.

No. of Terminals: 3

With three terminals, this FET is versatile and can easily integrate into various circuit designs with minimal complexity.

Maximum Power Dissipation (Abs): 200 W

High power dissipation capability enables efficient thermal management, ensuring reliable operation under demanding conditions.

Package Style (Meter): FLANGE MOUNT

Flange mount style offers stable mounting options, increasing the reliability of the connection and reducing vibration risk.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology provides high efficiency and faster switching abilities, making this transistor suitable for modern electronic applications.

Maximum Operating Temperature: 175 °C

Operating at high temperatures enhances reliability and expands the application range in harsh environments.

Transistor Element Material: SILICON

Silicon offers excellent electrical properties and is a standard in FET technology, ensuring good performance and stability.

Terminal Finish: TIN LEAD

Tin-lead finish aids in good solderability, improving connection durability and reliability in assembled circuits.

Maximum Drain Current (ID): 55 A

Having a maximum drain current rating of 55 A ensures it can manage high loads, making it appropriate for various power applications.

Maximum Drain-Source On Resistance: 0.027 ohm

A low on-resistance decreases power loss during operation, enhancing efficiency and thermal performance in power circuits.

Terminal Position: SINGLE

Single terminal positioning simplifies connection and reduces the chance of miswiring, providing ease of use for engineers.

Technical Specifications

Power Field Effect Transistors (FET) STW55NE10 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

350 mJ

Minimum DS Breakdown Voltage:

100 V

Maximum Drain Current (Abs) (ID):

55 A

Maximum Drain Current (ID):

55 A

Maximum Drain-Source On Resistance:

.027 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-247

JESD-30 Code:

R-PSFM-T3

JESD-609 Code:

e0

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

220 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

TIN LEAD

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STW55NE10 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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