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STW55N10

STMicroelectronics

STW55N10 by STMicroelectronics

STW55N10 from STMicroelectronics is a powerful N-channel MOSFET designed for high-efficiency applications. It supports a max drain current of 55 A and power dissipation of 200 W, operating up to 150 °C. Ideal for switching and amplification in power management systems.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Vyrian

USA . 4,219 parts In-Stock

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4,219

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Anansix

USA . 2,335 parts In-Stock

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2,335

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Digiode

USA . 980 parts In-Stock

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980

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Distributors (Availability)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

IDEA Electronic Components Group

UK . 1,021 parts In-Stock

1+ parts

$0.871

100+ parts

-

1k+ parts

$0.784

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1,021

$0.871

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$0.784

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MKK Technologies

India . 2,306 parts In-Stock

1+ parts

$1.638

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2,306

$1.638

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DigiPath Technology Company

USA . 2,306 parts In-Stock

1+ parts

$1.638

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2,306

$1.638

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Corphita

USA . 3,299 parts In-Stock

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3,299

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Parana Technologies

USA . 1,756 parts In-Stock

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$1.042

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1,756

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$1.042

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Overview

Unlock the power of efficiency with the STW55N10 from STMicroelectronics, a leader in semiconductor innovation. This N-channel Power FET seamlessly combines high performance with reliability, making it ideal for demanding applications like automotive systems and industrial automation. With robust thermal management and impressive current handling, it ensures your designs are not only powerful but also energy-efficient—delivering lasting value for your projects. Choose STMicroelectronics for unmatched quality and expertise that drives success!

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically offer higher electron mobility than P-channel devices, resulting in faster switching speeds and lower on-resistance, making this product ideal for high-efficiency applications.

Configuration: SINGLE

The single configuration allows for simpler circuit designs, reducing complexity and potentially lowering costs in applications that do not require multiple transistors.

Operating Mode: ENHANCEMENT MODE

Enhancement mode transistors provide excellent off-state characteristics, which minimizes leakage current in the off state, thus improving overall efficiency in power management applications.

Maximum Drain Current (Abs) (ID): 55 A

With a high maximum drain current rating, this transistor can handle substantial loads, making it suitable for applications like power converters and motor drives.

Maximum Power Dissipation (Abs): 200 W

A high power dissipation rating means this FET can operate at elevated power levels without overheating, ensuring reliability under heavy load conditions.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Using MOS technology, this FET provides high input impedance and fast switching capabilities, making it optimal for digital and analog applications.

Maximum Operating Temperature: 150 °C

The ability to operate at higher temperatures enhances reliability and performance in demanding environments, expanding the range of applications for this FET.

Terminal Finish: Matte Tin (Sn)

The matte tin finish provides excellent solderability and corrosion resistance, ensuring reliable connections during assembly and operation.

Maximum Drain Current (ID): 55 A

Reiterating its impressive drain current capacity, this FET is capable of driving high loads efficiently, reinforcing its suitability for high-performance applications.

Technical Specifications

Power Field Effect Transistors (FET) STW55N10 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Configuration:

Maximum Drain Current (Abs) (ID):

55 A

Maximum Drain Current (ID):

55 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-609 Code:

e3

No. of Elements:

1

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

Matte Tin (Sn)

Trade Compliance

STW55N10 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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