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STV160NF03L

STMicroelectronics

STV160NF03L by STMicroelectronics

STV160NF03L by STMicroelectronics is a high-performance N-channel FET designed for efficient switching applications. It features a max drain current of 160 A, a breakdown voltage of 30 V, and operates at up to 175 °C. Its compact surface mount design ensures versatility in various electronic circuits.

Median Price

$6.220

Lifecycle Status

Suppliers In-Stock

6

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

American Microsemiconductor Inc.

USA . 20 parts In-Stock

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$6.220

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20

$6.220

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Digiode

USA . 3,620 parts In-Stock

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3,620

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Vyrian

USA . 3,002 parts In-Stock

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3,002

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Anansix

USA . 294 parts In-Stock

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294

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Elcom Components

USA . 226 parts In-Stock

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226

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Bristol Electronics

USA . 212 parts In-Stock

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212

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Distributors (Availability)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

IDEA Electronic Components Group

UK . 1,100 parts In-Stock

1+ parts

$0.467

100+ parts

-

1k+ parts

$0.421

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1,100

$0.467

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$0.421

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MKK Technologies

India . 25 parts In-Stock

1+ parts

$0.879

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25

$0.879

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DigiPath Technology Company

USA . 25 parts In-Stock

1+ parts

$0.879

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25

$0.879

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Corphita

USA . 4,270 parts In-Stock

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4,270

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Parana Technologies

USA . 856 parts In-Stock

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$0.559

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856

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$0.559

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Perfect Parts

USA . 94 parts In-Stock

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94

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Overview

Elevate your designs with the STV160NF03L from STMicroelectronics, a leader in high-quality semiconductor solutions. This N-channel power FET combines exceptional performance with reliability, offering unmatched switching efficiency for diverse applications like power management and motor control. With its robust construction and advanced features, it ensures optimal operation even in demanding environments, delivering not just power but peace of mind.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Durable plastic/epoxy construction ensures long-lasting performance and protection against environmental factors.

Polarity or Channel Type: N-CHANNEL

N-channel configuration allows for higher efficiency and better conductance, making it suitable for high-performance applications.

Configuration: SINGLE WITH BUILT-IN DIODE

Built-in diode helps prevent reverse current, enhancing reliability in applications that require protection against voltage spikes.

Transistor Application: SWITCHING

Optimized for switching applications, which makes this FET ideal for power management and control in various devices.

Surface Mount: YES

Surface mount technology enables compact design and easy integration into PCB layouts, saving space and simplifying manufacturing.

Minimum DS Breakdown Voltage: 30 V

A minimum breakdown voltage of 30 V provides suitability for a wide range of applications without compromising safety.

Package Shape: RECTANGULAR

Rectangular package shape allows efficient placement and thermal management on circuit boards.

Terminal Form: GULL WING

Gull wing terminals provide excellent mechanical stability and facilitate easy soldering, ensuring reliable connections.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation allows for improved performance in low power applications by minimizing leakage current.

Maximum Pulsed Drain Current (IDM): 640 A

With a high pulsed drain current rating, this FET can handle temporary surges in power, making it robust for dynamic load conditions.

Avalanche Energy Rating (EAS): 1000 mJ

A high avalanche energy rating indicates strong resistance to voltage transients, enhancing durability in harsh environments.

Maximum Drain Current (Abs) (ID): 160 A

Capable of handling a maximum of 160 A ensures this FET can power demanding applications without overheating.

No. of Terminals: 10

Ten terminals provide flexibility in design and connectivity options, allowing complex circuit configurations.

Maximum Power Dissipation (Abs): 160 W

A high power dissipation capability makes this FET suitable for handling substantial power loads without failure.

Package Style (Meter): SMALL OUTLINE

The small outline package style is ideal for space-constrained applications while maintaining excellent performance.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology provides high input impedance and low power consumption, making the FET efficient for diverse applications.

Maximum Operating Temperature: 175 °C

A high maximum operating temperature allows for reliable performance in extreme conditions, extending the product's application range.

Transistor Element Material: SILICON

Silicon material ensures excellent electron mobility and thermal conductivity, enhancing overall device efficiency.

Maximum Drain Current (ID): 160 A

Reiterated maximum drain current rating underscores the FET's reliability and robustness in high-current applications.

Maximum Drain-Source On Resistance: 0.0038 ohm

Low on-resistance reduces power losses in the form of heat, improving overall system efficiency.

Terminal Position: DUAL

Dual terminal positioning enables versatile PCB layout options, making it easy to integrate into existing designs.

Case Connection: DRAIN

DRAIN connection is optimal for high-efficiency designs, allowing for better thermal management and current flow.

Technical Specifications

Power Field Effect Transistors (FET) STV160NF03L attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Additional Features:

ULTRA-LOW RESISTANCE

Avalanche Energy Rating (EAS):

1000 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

30 V

Maximum Drain Current (Abs) (ID):

160 A

Maximum Drain Current (ID):

160 A

Maximum Drain-Source On Resistance:

.0038 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PDSO-G10

No. of Elements:

1

No. of Terminals:

10

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

640 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Form:

GULL WING

Terminal Position:

DUAL

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STV160NF03L Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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