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STL80N3LLH6

STMicroelectronics

STL80N3LLH6 by STMicroelectronics

STL80N3LLH6 by STMicroelectronics is an N-channel FET designed for efficient switching applications. It features a max drain current of 80 A, a breakdown voltage of 30 V, and operates at up to 150 °C. Ideal for compact power management in modern electronics.

Median Price

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Lifecycle Status

Suppliers In-Stock

4

In-Stock Inventory

1k+

Distributors (In-Stock)

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Vyrian

USA . 7,949 parts In-Stock

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7,949

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Digiode

USA . 4,713 parts In-Stock

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4,713

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R&J Components

USA . 2,900 parts In-Stock

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2,900

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Anansix

USA . 2,228 parts In-Stock

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IDEA Electronic Components Group

UK . 1,908 parts In-Stock

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$0.293

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$0.264

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1,908

$0.293

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$0.264

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MKK Technologies

India . 388 parts In-Stock

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$0.552

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388

$0.552

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DigiPath Technology Company

USA . 388 parts In-Stock

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$0.552

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388

$0.552

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AZTECH Wire

Italy . 887 parts In-Stock

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$11.590

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887

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Perfect Parts

USA . 6,385 parts In-Stock

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A-Z Elektronik GmbH

Germany . 5,409 parts In-Stock

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Alle Elektronik GmbH

Germany . 4,448 parts In-Stock

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Authorized Procurement Solutions

USA . 3,000 parts In-Stock

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Corphita

USA . 925 parts In-Stock

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Parana Technologies

USA . 504 parts In-Stock

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$0.351

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Kepictronics

USA . 100 parts In-Stock

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Overview

Elevate your designs with the STL80N3LLH6 from STMicroelectronics, a trusted leader in semiconductor technology. This powerful N-channel FET combines exceptional efficiency with robust performance, ideal for high-speed switching applications. Its compact design ensures seamless integration into various systems, while built-in reliability enhances longevity. Choose STL80N3LLH6 to unlock superior energy savings and unparalleled quality that enhances your projects' success.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy material offers durability and protection against environmental factors, making it ideal for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs are generally more efficient, allowing for better switching and higher performance, particularly in power management applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode simplifies circuit design and protects against damage from reverse polarity, enhancing reliability.

Transistor Application: SWITCHING

Designed for switching applications, this FET enables fast and efficient control of power, suitable for modern electronics.

Surface Mount: YES

The surface mount capability allows for reduced PCB space and makes the FET suitable for compact and high-density designs.

Minimum DS Breakdown Voltage: 30 V

A minimum breakdown voltage of 30V ensures robustness in high-voltage applications, making it reliable under various conditions.

Package Shape: RECTANGULAR

The rectangular package shape is commonly used, providing ease of integration into standard circuit layouts.

Terminal Form: NO LEAD

No-lead terminals improve thermal performance and provide a smaller footprint, facilitating efficient space utilization on PCBs.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation allows for higher off-state resistance, contributing to lower leakage currents and better energy efficiency.

Maximum Pulsed Drain Current (IDM): 84 A

The high pulsed drain current rating allows for handling large transient loads, making it suitable for demanding applications.

Maximum Drain Current (Abs) (ID): 80 A

An absolute maximum drain current of 80A indicates the FET can deliver significant power, suitable for high-performance applications.

No. of Terminals: 5

Five terminals provide flexibility in circuit design and connection options, supporting a variety of applications.

Maximum Power Dissipation (Abs): 60 W

The capability to dissipate up to 60W of power ensures effective heat management, vital for high-performance switching applications.

Package Style (Meter): SMALL OUTLINE

The small outline package style enhances compactness, making this FET suitable for space-constrained designs.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology provides excellent control of electrical conductivity, leading to high efficiency and switching speed.

Maximum Operating Temperature: 150 °C

A maximum operating temperature of 150 °C allows for reliable performance in high-temperature environments, extending application range.

Transistor Element Material: SILICON

Silicon offers excellent semiconductor properties, leading to reliable and cost-effective performance in a wide range of applications.

Terminal Finish: MATTE TIN

Matte tin finish ensures good solderability and corrosion resistance, contributing to long-term reliability and performance.

Maximum Drain Current (ID): 21 A

A maximum drain current of 21A supports reliable operation in medium-current applications, enhancing versatility.

Maximum Drain-Source On Resistance: 0.0076 ohm

Low on-resistance reduces power loss and increases efficiency, making it an ideal choice for power management.

Terminal Position: DUAL

Dual terminal positioning allows better layout options on PCB, providing flexibility in circuit design.

Case Connection: DRAIN

Direct drain connection facilitates efficient power delivery from device to load, improving overall system performance.

Maximum Time At Peak Reflow Temperature (s): 30

The ability to withstand reflow temperatures for up to 30 seconds aids in effective soldering processes without damage.

Peak Reflow Temperature °C: 260

A peak reflow temperature capability of 260 °C ensures compatibility with various soldering processes and enhances assembly reliability.

Technical Specifications

Power Field Effect Transistors (FET) STL80N3LLH6 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

30 V

Maximum Drain Current (Abs) (ID):

80 A

Maximum Drain Current (ID):

21 A

Maximum Drain-Source On Resistance:

.0076 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PDSO-N5

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

5

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

84 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

MATTE TIN

Terminal Form:

NO LEAD

Terminal Position:

DUAL

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STL80N3LLH6 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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