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STK32N4LLH5

STMicroelectronics

STK32N4LLH5 by STMicroelectronics

STK32N4LLH5 from STMicroelectronics is an N-channel FET designed for efficient switching applications. It features a max drain current of 32 A, a breakdown voltage of 40 V, and operates at up to 150 °C. Ideal for compact power management in modern electronics.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Digiode

USA . 3,350 parts In-Stock

1+ parts

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3,350

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Anansix

USA . 2,165 parts In-Stock

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2,165

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Vyrian

USA . 1,932 parts In-Stock

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1,932

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Distributors (Availability)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

IDEA Electronic Components Group

UK . 92 parts In-Stock

1+ parts

$1.818

100+ parts

-

1k+ parts

$1.636

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92

$1.818

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$1.636

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MKK Technologies

India . 688 parts In-Stock

1+ parts

$3.418

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688

$3.418

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DigiPath Technology Company

USA . 688 parts In-Stock

1+ parts

$3.418

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688

$3.418

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Parana Technologies

USA . 2,125 parts In-Stock

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$2.174

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2,125

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$2.174

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Corphita

USA . 345 parts In-Stock

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345

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Overview

Unlock unparalleled efficiency with the STK32N4LLH5 from STMicroelectronics, a leader in semiconductor innovation. This robust N-channel power FET delivers exceptional switching performance while maximizing energy savings, making it ideal for advanced applications in automotive, industrial, and consumer electronics. With its compact design and built-in diode, you can trust in its reliability and superior quality, ensuring seamless integration into your next project. Experience the difference with STMicroelectronics—where cutting-edge technology meets exceptional value!

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-channel FETs are typically more efficient and faster than P-channel devices, making this product suitable for high-speed switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode provides additional protection against reverse currents, enhancing reliability in various applications.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET ensures optimal performance and efficiency in switching circuits.

Surface Mount: YES

Surface mount capability allows for compact designs and easier integration into modern circuit boards, saving space in applications.

Minimum DS Breakdown Voltage: 40 V

The high breakdown voltage increases the versatility of this FET, enabling it to handle a wide range of voltages safely.

Package Shape: RECTANGULAR

The rectangular package shape facilitates easier placement and soldering on circuit boards, enhancing assembly efficiency.

Terminal Form: NO LEAD

No-lead design reduces the inductance and improves electrical performance, particularly suitable for high-frequency applications.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation allows for lower power consumption during low or idle states, making it energy efficient.

Maximum Pulsed Drain Current (IDM): 128 A

High pulsed current rating provides excellent capacity for handling transient loads, increasing reliability in demanding applications.

Maximum Drain Current (Abs) (ID): 32 A

The 32 A continuous drain current ensures robust performance in various applications, including power management systems.

No. of Terminals: 4

Four terminals offer versatility in circuit design, allowing for better connection options and layout flexibility.

Maximum Power Dissipation (Abs): 5.2 W

The ability to dissipate power effectively means reduced thermal stress and increased longevity for reliable operation over time.

Package Style (Meter): SMALL OUTLINE

The small outline package allows for space-constrained designs, making this FET ideal for compact and portable electronic devices.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology enhances the efficiency and speed of switching, which is critical for modern electronic applications.

Maximum Operating Temperature: 150 °C

A maximum operating temperature of 150 °C ensures reliability in high-temperature environments, suitable for industrial and automotive applications.

Transistor Element Material: SILICON

Silicon is the most common material used in FETs, providing a reliable and well-understood performance characteristic.

Terminal Finish: MATTE TIN

Matte tin terminal finish enhances solderability and prevents corrosion, leading to better long-term performance and reliability.

Maximum Drain Current (ID): 32 A

With a maximum drain current of 32 A, this FET can handle significant loads, making it suitable for various electronic applications.

Maximum Drain-Source On Resistance: 0.0034 ohm

A low on-resistance increases efficiency by minimizing power losses during operation, making it ideal for high-efficiency designs.

Terminal Position: DUAL

Dual terminal position provides flexible mounting options and makes it easier to integrate into various PCB designs.

Case Connection: DRAIN

Having the drain as the case connection allows for better thermal management and improved overall performance of the FET.

Technical Specifications

Power Field Effect Transistors (FET) STK32N4LLH5 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

40 V

Maximum Drain Current (Abs) (ID):

32 A

Maximum Drain Current (ID):

32 A

Maximum Drain-Source On Resistance:

.0034 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-XDSO-N4

JESD-609 Code:

e3

No. of Elements:

1

No. of Terminals:

4

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

UNSPECIFIED

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

128 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

MATTE TIN

Terminal Form:

NO LEAD

Terminal Position:

DUAL

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STK32N4LLH5 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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