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STF30NM60ND

STMicroelectronics

STF30NM60ND by STMicroelectronics

STF30NM60ND by STMicroelectronics is an N-channel FET designed for switching applications, featuring a 600V breakdown voltage and 100A max pulsed drain current. It operates in enhancement mode with a max power dissipation of 40W. Ideal for high-efficiency power management solutions.

Median Price

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Lifecycle Status

Suppliers In-Stock

4

In-Stock Inventory

1k+

Distributors (In-Stock)

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Vyrian

USA . 12,139 parts In-Stock

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12,139

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Digiode

USA . 4,905 parts In-Stock

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4,905

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Anansix

USA . 311 parts In-Stock

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311

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LittleDiode

UK . 1 parts In-Stock

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IDEA Electronic Components Group

UK . 1,693 parts In-Stock

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$0.938

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$0.845

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1,693

$0.938

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$0.845

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MKK Technologies

India . 2,327 parts In-Stock

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$1.765

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2,327

$1.765

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DigiPath Technology Company

USA . 2,327 parts In-Stock

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$1.765

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2,327

$1.765

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AZTECH Wire

Italy . 1,121 parts In-Stock

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$11.290

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$11.290

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Component Stockers USA

USA . 602 parts In-Stock

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$99.990

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RC Electronics

USA . 8,820 parts In-Stock

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8,820

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A-Z Elektronik GmbH

Germany . 6,707 parts In-Stock

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Alle Elektronik GmbH

Germany . 4,746 parts In-Stock

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Authorized Procurement Solutions

USA . 4,000 parts In-Stock

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Corphita

USA . 2,339 parts In-Stock

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2,339

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Parana Technologies

USA . 1,138 parts In-Stock

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$1.122

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$1.122

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Overview

Unlock unparalleled performance with the STF30NM60ND from STMicroelectronics, a leader in innovative semiconductor solutions. Designed for reliable switching applications, this N-channel Power FET ensures exceptional efficiency and robustness, making it ideal for various industrial and consumer electronics. Trust in STMicroelectronics’ commitment to quality and excellence, empowering your designs with superior thermal management and long-lasting reliability—experience the difference today!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy for the package body ensures durability and resistance to environmental factors, making it suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs generally offer better performance in terms of efficiency and lower on-resistance, making them ideal for high-power applications.

Configuration: SINGLE WITH BUILT-IN DIODE

A built-in diode increases versatility by allowing for better protection and improved functionality in various switching applications.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET provides quick response times, which is essential for modern electronic circuits.

Minimum DS Breakdown Voltage: 600 V

A high breakdown voltage ensures reliability in high-voltage applications, providing peace of mind for circuit designers.

Package Shape: RECTANGULAR

The rectangular shape is space-efficient and allows for easy mounting in various electronic devices, optimizing layout designs.

Terminal Form: THROUGH-HOLE

Through-hole design allows for strong mechanical connections and is excellent for high-power applications, ensuring durability and stability.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs are favored for their high efficiency in the 'off' state, making them energy-efficient and ideal for switching applications.

Maximum Pulsed Drain Current (IDM): 100 A

High pulsed drain current rating allows for strong performance in transient conditions, making this FET suitable for demanding applications.

Avalanche Energy Rating (EAS): 900 mJ

A high avalanche energy rating enhances the robustness of the FET against unexpected voltage spikes, ensuring reliable operation.

Maximum Drain Current (Abs) (ID): 25 A

This maximum current rating indicates the FET can handle substantial loads, making it suitable for high-power applications.

No. of Terminals: 3

With three terminals, this transistor allows for easy integration into various circuit designs, providing flexibility for engineers.

Maximum Power Dissipation (Abs): 40 W

High power dissipation capabilities ensure the transistor can handle significant power loads without overheating, suitable for high-performance applications.

Package Style (Meter): FLANGE MOUNT

The flange mount style facilitates secure installation, enhancing thermal management and stability within electronic assemblies.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology offers advantages such as lower power consumption and higher speed, making this FET a competitive option in modern circuits.

Maximum Operating Temperature: 150 °C

A high operating temperature rating allows for diverse applications, especially in environments where heat management is critical.

Transistor Element Material: SILICON

Silicon as a base material provides excellent electronic properties, contributing to the FET’s efficiency and effectiveness in various applications.

Maximum Drain Current (ID): 25 A

Consistent current handling capabilities bolster the FET's reliability in demanding performance scenarios.

Maximum Drain-Source On Resistance: 0.385 ohm

Low on-resistance reduces power losses during operation, enhancing the overall efficiency and performance of the electronic circuit.

Terminal Position: SINGLE

A single terminal position simplifies design and integration into circuits, making it easier for engineers to work with.

Case Connection: ISOLATED

Isolated case connections are pivotal in preventing electrical interference, ensuring safe and reliable operation in sensitive electronic systems.

Technical Specifications

Power Field Effect Transistors (FET) STF30NM60ND attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

900 mJ

Case Connection:

ISOLATED

Minimum DS Breakdown Voltage:

600 V

Maximum Drain Current (Abs) (ID):

25 A

Maximum Drain Current (ID):

25 A

Maximum Drain-Source On Resistance:

.385 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-220AB

JESD-30 Code:

R-PSFM-T3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

100 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STF30NM60ND Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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