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STF30NM60N

STMicroelectronics

STF30NM60N by STMicroelectronics

STF30NM60N by STMicroelectronics is an N-channel FET designed for efficient switching applications. It features a 600V breakdown voltage, 100A max pulsed drain current, and operates at up to 150 °C. Ideal for power management in various electronic devices.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Vyrian

USA . 7,972 parts In-Stock

1+ parts

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7,972

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Anansix

USA . 2,454 parts In-Stock

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2,454

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Digiode

USA . 2,436 parts In-Stock

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2,436

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Distributors (Availability)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

IDEA Electronic Components Group

UK . 1,899 parts In-Stock

1+ parts

$0.622

100+ parts

-

1k+ parts

$0.560

10k+ parts

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1,899

$0.622

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$0.560

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MKK Technologies

India . 1,087 parts In-Stock

1+ parts

$1.169

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1,087

$1.169

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DigiPath Technology Company

USA . 1,087 parts In-Stock

1+ parts

$1.169

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1,087

$1.169

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AZTECH Wire

Italy . 280 parts In-Stock

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$8.710

100+ parts

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280

$8.710

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A-Z Elektronik GmbH

Germany . 5,894 parts In-Stock

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5,894

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Alle Elektronik GmbH

Germany . 3,853 parts In-Stock

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3,853

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Parana Technologies

USA . 2,099 parts In-Stock

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$0.744

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2,099

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$0.744

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Corphita

USA . 958 parts In-Stock

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958

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Overview

Unlock the power of efficiency with the STF30NM60N from STMicroelectronics, a leader in innovation and reliability. This N-channel FET delivers outstanding switching performance, making it ideal for high-voltage applications while ensuring robust thermal management and enhanced durability. With ST's commitment to quality, enjoy reduced energy loss and increased system reliability, empowering your designs to achieve greater success with every switch.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy for the package body ensures excellent durability and resistance to environmental factors, making this FET suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically offer higher efficiency and faster switching speeds, making them ideal for high-performance applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode provides added protection and improves switching performance, which is beneficial in power management circuits.

Transistor Application: SWITCHING

Designed for switching applications, this FET can efficiently control power flow, making it suitable for power electronics and motor control.

Minimum DS Breakdown Voltage: 600 V

A high breakdown voltage ensures reliability and safe operation in high-voltage applications, enhancing overall performance.

Package Shape: RECTANGULAR

The rectangular package shape allows for efficient space utilization on PCBs, facilitating ease of integration into various designs.

Terminal Form: THROUGH-HOLE

Through-hole terminals provide strong mechanical stability and reliable electrical connections, making installation straightforward.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation leads to lower energy consumption during idle states, thereby improving overall efficiency in applications.

Maximum Pulsed Drain Current (IDM): 100 A

A high pulsed drain current capability allows this FET to handle significant transient loads, proving valuable in dynamic applications.

Avalanche Energy Rating (EAS): 900 mJ

A high avalanche energy rating enables the device to withstand transient spikes, ensuring robust protection in fluctuating electrical environments.

Maximum Drain Current (Abs) (ID): 25 A

The maximum continuous drain current of 25 A allows this FET to support a broad range of power applications, enhancing its versatility.

No. of Terminals: 3

With three terminals, this FET design simplifies connections while maintaining functionality and ease of use in circuits.

Maximum Power Dissipation (Abs): 40 W

A maximum power dissipation of 40 W allows for effective heat management, ensuring longevity and reliable operation under load.

Package Style (Meter): FLANGE MOUNT

The flange mount style supports reliable installation and is ideal for applications requiring robust mounting solutions.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology enhances switching speed and efficiency, making this FET a top choice for high-frequency applications.

Maximum Operating Temperature: 150 °C

A high maximum operating temperature ensures the FET can function reliably in demanding environments without risk of failure.

Transistor Element Material: SILICON

Silicon as the element material offers stability and reliability, commonly recognized for its excellent electrical characteristics.

Maximum Drain Current (ID): 25 A

Reiterating the maximum drain current capability reinforces its suitability for high-power applications in various industries.

Maximum Drain-Source On Resistance: 0.13 ohm

A low on-resistance ensures minimal power loss and heat generation, optimizing the efficiency of the device in power circuits.

Terminal Position: SINGLE

Single terminal positioning simplifies circuit design and allows for easier integration into both new and existing systems.

Case Connection: ISOLATED

An isolated case connection provides safety and prevents interference, making it suitable for sensitive applications.

Technical Specifications

Power Field Effect Transistors (FET) STF30NM60N attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

900 mJ

Case Connection:

ISOLATED

Minimum DS Breakdown Voltage:

600 V

Maximum Drain Current (Abs) (ID):

25 A

Maximum Drain Current (ID):

25 A

Maximum Drain-Source On Resistance:

.13 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-220AB

JESD-30 Code:

R-PSFM-T3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Peak Reflow Temperature (C):

NOT SPECIFIED

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

100 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

NOT SPECIFIED

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STF30NM60N Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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